Prof. Kim provided  a recent seminar an in-depth discussion of characterization techniques essential for next-generation oxide TFT development. 

 The presentation covered advanced XPS analysis for surface chemical states, the impact of hydrogen incorporation on electrical and structural properties, and in-plane XRD methods for evaluating crystallographic orientation. The session highlighted how integrating these analytical approaches offers critical insights into optimizing oxide semiconductor films for high-performance device applications. 

  The seminar received positive feedback, with attendees noting that the integrated analysis approach offered clear and valuable insights for advancing oxide TFT research.