Publications
<< 2024 >>
48. Dong-Geon Lee, Hyun-Seung Ryu, Mi-Jin Jin, Doo-Seung Um* & Chang-Il Kim*; Diverse Texturing Characteristics Through Metal-Assisted Plasma Etching with Silver Nanowires, Plasma Chem. Plasma Process., 2024. (SCIE, IF3.6, Q1)
47. Qiang Liu, Ji-Yeop Kim, Mi-Jin Jin, Doo-Seung Um*, Chang-Il Kim*; "Transition of Cu film to Cu2O film through oxygen plasma treatment", Mater. Chem. Phys., 2024, 316, 129090. (SCIE, IF4.6, Q2)
46. Dong-Geon Lee, Kyeong-Keun Choi, Deok-kee Kim, Doo-Seung Um*, Chang-Il Kim*; "Nanohole texturing to improve the performance of a microscopic photodetector", Mater. Sci. Semicond. Process, 2024,169, 107915. (SCIE, IF4.1, Q2)
<< 2023 >>
45. Ji-Yeop Kim, Mi-Jin Jin, Bo Hou, Minsoo P. Kim, Doo-Seung Um*, Chang-Il Kim*; "Reducing the oxygen vacancy concentration in SrTiO3-δ thin films via an optimized O2 plasma treatment for enhancing device properties", Appl. Surf. Sci., 2023, 639, 158271. (SCIE, IF6.7, Q1, 97.6%)
44. Young-Hee Joo, Jae-Won Choi, Bo Hou, Hyuck-In Kwon, Doo-Seung Um*, Chang-Il Kim*, "Etching characteristics and surface modification of InGaSnO thin films under Cl2/Ar plasma", Plasma Sci. Technol., 2023, 25 (10), 105502.
43. Han Byeol Lee, Young-Hee Joo, Harshada Patil, Gwan-Ha Kim, Insu Kang, Bo Hou, Deok-kee Kim, Doo-Seung Um*, Chang-Il Kim*, "Plasma etching and surface characteristics depending on the crystallinity of the BaTiO3 thin film", Mater. Res. Express, 2023, 10 (1), 016401.
<< 2022 >>
42. Wenhui Yu, Jeong Geun Lee, Young-Hee Joo, Bo Hou, Doo-Seung Um*, Chang-Il Kim*, "Etching characteristics and surface properties of fuorine‑doped tin oxide thin flms under CF4‑based plasma treatment", Appl. Phys. A-Mater. Sci. Process., 2022, 128, 942.
41. Mi-Jin Jin, Doo-Seung Um*, Osarenkhoe Ogbeide, Chang-Il Kim, Jung-Woo Yoo, J. W. A. Robinson*, "Crossover from weak anti-localization to weak localization in inkjet-printed Ti3C2TX MXene thin-film", Adv. Nano Res., 2022, 13, 259-267.
40. Jong-Chang Woo, Doo-Seung Um*, "The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions", Micromachines, 2022, 13, 1556.
39. Young-Hee Joo, Gwan-Ha Kim, Doo-Seung Um*, Chang-Il Kim*, "Surface properties of Al-doped ZnO thin film before and after CF4/Ar plasma etching", Plasma Sci. Technol., 2022, 24, 075504.
<< 2021 >>
38. Young-Hee Joo, Doo-Seung Um*, Chang-Il Kim*, "Tunable physical properties of Al-doped ZnO thin films by O2 and Ar plasma treatments", Mater. Res. Express, 2021, 8, 126402.
37. Mi-Jin Jin, Doo-Seung Um, Kohei Ohnishi, Sachio Komori, Nadia Stelmashenko, Daeseong Choe, Jung-Woo Yoo, and Jason W. A. Robinson*, "Pure Spin Currents Driven by Colossal Spin–Orbit Coupling on Two-Dimensional Surface Conducting SrTiO3", Nano Lett., 2021, 21, 6511-6517. (SCIE, IF11.238, Q1, 89.7%)
36. Chea-Young Lee, Young-Hee Joo, Minsoo P. Kim, Doo-Seung Um*, Chang-Il Kim*, "Etching Characteristics and Changes in Surface Properties of IGZO Thin Films by O2 Addition in CF4/Ar Plasma", Coatings, 2021, 11, 906.
35. Shania Rehman, Honggyun Kim, Harshada Patil, Kalyani D. Kadam, Rizwan Ur Rehman Sagar, Jamal Aziz, Doo-Seung Um, Muhammad Farooq Khan*, Deok-kee Kim*; "Current Rectification, Resistive Switching, and Stable NDR Effect in BaTiO3/CeO2 Heterostructure Devices", Adv. Electron. Mater., 2021, 7, 2001237.
34. Young-Hee Joo, Mi-Jin Jin, Sung Kyun Kim, Doo-Seung Um*, Chang-Il Kim*; "BCl3/Ar plasma etching for the performance enhancement of Al-doped ZnO thin films", Appl. Surf. Sci., 2021, 561, 149957. (SCIE, IF6.707, Q1, 97.62%)
33. Doo-Seung Um, Mi-Jin Jin, Jong-Chang Woo, Dong-Pyo Kim, Jungmin Park, Younghun Jo and Gwan-Ha Kim*; "Electrical Properites and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method", Crystals, 2021, 11 (4), 351.
32. Minsoo P. Kim, Doo-Seung Um, Young-Eun Shin and Hyunhyub Ko*; "High-Performance Triboelectric Devices via Dielectric Polarization: A Review", Nanoscale Res. Lett., 2021, 16, 35.
<< 2020 >>
31. Young-Hee Joo, Jae-Hyung Wi, Woo-Jung Lee, Yong-Duck Chung, Dae-Hyung Cho, Saewon Kang, Doo-Seung Um* and Chang-Il Kim*; "Work Function Tuning of Zinc–Tin Oxide Thin Films Using High-Density O2 Plasma Treatment", Coatings, 2020, 10, 1026.
30. Liting Zhang, Young-Hee Joo, Doo-Seung Um, Chang-Il Kim*; "High-density plasma etching characteristics of aluminum-doped zinc oxide thin films in Cl2/Ar plasma", Mater. Res. Express, 2020, 7, 106301.
29. Doo-Seung Um, Youngsu Lee, Taehyo Kim, Seongdong Lim, Hochan Lee, Minjeong Ha, Ziyauddin Khan, Saewon Kang, Minsoo P. Kim, Jin Young Kim*, and Hyunhyub Ko*; "High-Resolution Filtration Patterning of Silver Nanowire Electrodes for Flexible and Transparent Optoelectronic Devices", ACS Appl. Mater. Interfaces, 2020, 12, 32154-32162.
28. Xiaoxi Zhu, Leonard W. T. Ng, Guohua Hu, Tien‐Chun Wu, Doo‐Seung Um, Nasiruddin Macadam, Tawfique Hasan*; "Hexagonal Boron Nitride–Enhanced Optically Transparent Polymer Dielectric Inks for Printable Electronics", Adv. Funct. Mater., 2020, 30, 2002339.
<< 2019 >>
27. Tien-Chun Wu, Andrea De Luca, Qinyu Zhong, Xiaoxi Zhu, Osarenkhoe Ogbeide, Doo-Seung Um, Guohua Hu, Tom Albrow-Owen, Florin Udrea, Tawfique Hasan*; “Inkjet-printed CMOS-integrated graphene–metal oxide sensors for breath analysis”, npj 2D Materials and Applications, 2019, 3:42.
26. Leonard Wei Tat Ng, Xiaoxi Zhu, Guohua Hu, Nasiruddin Macadam, Dooseung Um, Tien-Chun Wu, Frederic Le Moal, Chris Jones, and Tawfique Hasan*; “Conformal Printing of Graphene for Single- and Multilayered Devices onto Arbitrarily Shaped 3D Surfaces”, Adv. Funct. Mater., 2019, 1807933.
25. Youngsu Lee, Doo-Seung Um, Seongdong Lim, Hochan Lee, Minsoo P. Kim, Tzu-Yi Yang, Yu-Lun Chueh, Hyung-jun Kim, and Hyunhyub Ko*; “Gate-Tunable and Programmable n‑InGaAs/Black Phosphorus Heterojunction Diodes”, ACS Appl. Mater. Interfaces, 2019, 11 (26), 23382-23391.
<< 2018 >>
24. Saewon Kang, Seungse Cho, Ravi Shanker, Hochan Lee, Jonghwa Park, Doo-Seung Um, Youngoh Lee, Hyunhyub Ko*; “Transparent and conductive nanomembranes with orthogonal silver nanowire arrays for skin-attachable loudspeakers and microphones”, Sci. Adv., 2018, 4 (8), eaas8772.
<< 2017 >>
23. Seongdong Lim, Doo-Seung Um, Minjeong Ha, Qianpeng Zhang, Youngsu Lee, Yuanjing Lin, Zhiyong Fan, and Hyunhyub Ko*; “Broadband omnidirectional light detection in flexible and hierarchical ZnO/Si heterojunction photodiodes”, Nano Res., 2017, 10 (1), 22-36.
<< 2016 >>
22. Doo-Seung Um, Youngsu Lee, Seongdong Lim, Seungyoung Park, Hochan Lee, and Hyunhyub Ko*; “High-Performance MoS2/CuO 2D-on-1D Heterojunction Photodetectors”, ACS Appl. Mater. Interfaces, 2016, 8 (49), 33955-33962.
21. Doo-Seung Um, Youngsu Lee, Seongdong Lim, Jonghwa Park, Wen-Chun Yen, Yu-Lun Chueh, Hyung-jun Kim, and Hyunhyub Ko*; “InGaAs Nanomembrane/Si van der Waals Heterojunction Photodiodes with Broadband and High Photoresponsivity”, ACS Appl. Mater. Interfaces, 2016, 8 (39), 26105–26111.
20. Hochan Lee†, Doo-Seung Um†, Youngsu Lee, Seongdong Lim, Hyung-jun Kim, and Hyunhyub Ko*; “Octopus-Inspired Smart Adhesive Pads for Transfer Printing of Semiconducting Nanomembranes”, Adv. Mater., 2016, 28 (34), 7457–7465. [†: equal contribution]
<< 2015 >>
19. Minjeong Ha, Seongdong Lim, Jonghwa Park, Doo-Seung Um, Youngoh Lee, and Hyunhyub Ko*; “Bioinspired Interlocked and Hierarchical Design of ZnO Nanowire Arrays for Static and Dynamic Pressure-Sensitive Electronic Skins”, Adv. Funct. Mater., 2015, 25 (19), 2841–2849.
<< 2014 >>
18. Yun-Suk Yang†, Doo-Seung Um†, Youngsu Lee, JaeKyun Shin, Joonyeon Chang, Hyun Cheol Koo, Hyunhyub Ko*, and Hyung-jun Kim*, "Spin injection and detection in In0.53Ga0.47As nanomembrane channels transferred onto Si substrates", Appl. Phys. Express, 2014, 7 (9), 093004. [†: equal contribution]
17. Doo-Seung Um, Seongdong Lim, Youngsu Lee, Hochan Lee, Hyung-jun Kim, Wen-Chun Yen, Yu-Lun Chueh, and Hyunhyub Ko*, "Vacumm-Induced Wrinkle Arrays of InGaAs Semiconductor Nanomembranes on Polydimethylsiloxane Microwell Arrays", ACS Nano, 2014, 8 (3), 3080–3087.
<< 2013 >>
16. Kyung-Ho Kim†, Doo-Seung Um†, Hochan Lee, Seongdong Lim, Joonyeon Chang, Hyun Cheol Koo, Min-Wook Oh, Hyunhyub Ko*, and Hyung-jun Kim*, "Gate-Controlled Spin-Orbit Interaction in InAs High-Electron Mobility Transistor Layers Epitaxially Transferred onto Si Substrates", ACS Nano, 2013, 7 (10), 9106–9114. [†: equal contribution]
<< 2010 >>
15. Doo-Seung Um, Jong-Chang Woo, and Chang-Il Kim*, "Etching characteristics of TaN thin film using an inductively coupeld plasma", Surf. Coat. Technol., 205, 2010.
14. Doo-Seung Um, Jong-Chang Woo, Xue Yang and Chang-Il Kim*, "The Etch Characteristics of the CoFe Thin Film Using an Inductively Coupled Plasma System", Ferroelectrics, 406(1), 2010.
13. Xeng Yang, Jong-Chang Woo, Doo-Seung Um, and Chang-Il Kim*, "Dry Etching of Al2O3 Thin Films in O2/BCl3/Ar Inductively Coupled Plasma", Trans. Electr. Electron. Mater., 11(5), 2010.
12. Xue-Yang, Doo-Seung Um, Chang-Il Kim*, "The etching characteristics of Al2O3 thin films in an inductively coupled plasma", Thin Solid Films, 518, 2010.
11. Jae-Hyung Wi, Jong-Chang Woo, Doo-Seung Um, JunSeong Kim and Chang-Il Kim*, "Surface properties of etched ITO thin films using high density plasma", Thin Solid Films, 518, 2010.
<< 2009 >>
10. Dong-Pyo Kim, Xue-Yang, Jong-Chang Woo, Doo-Seung Um, and Chang-Il Kim*, "Dry-etching properties of TiN for metal/high-k gate stack using BCl3-based inductively coupled plasma", J. Vac. Sci. Technol. A, 27(6), 2009.
9. Jong-Chang Woo, Gwan-Ha Kim, Dong-Pyo Kim, Doo-Seung Um, and Chang-Il Kim*, "Etch Characteristics of ZrO2 Thin Films in High Density Plasma", Jpn. J. Appl. Phys., 48, 2009.
8. Xue-Yang, Dong-Pyo Kim, Doo-Seung Um, Gwan-Ha Kim, Chang-Il Kim*, "Temperature dependence on dry etching of Al2O3 thin films in BCl3/Cl2/Ar plasma", J. Vac. Sci. Technol. A, 27(4), 2009.
7. Doo-Seung Um, Dong-Pyo Kim, Jong-Chang Woo, Chang-Il Kim*, Sung-Kwon Lee, Tae-Woo Jung, Seung-Chan Moon, "Dry etching of CoFe films using a CH4/Ar inductively coupled plasma for magnetic random access memory application", J. Vac. Sci. Technol. A, 27(4), 2009.
6. Jong-Chang Woo, Gwan-Ha Kim, Dong-Pyo Kim, Doo-Seung Um, and Chang-Il Kim*, "Improving the Etch Selectivity of ZrO2 Thin Films over Si by Using High Density Plasma", Ferroelectrics, 384(1), 2009.
5. Xue-Yang, Dong-Pyo Kim, Gwan-Ha Kim, Jong-Chang Woo, Doo-Seung Um, Chang-Il Kim*, "The Etching Properties of Al2O3 Thin Films in BCl3/Cl2/Ar Plasma", Ferroelectrics, 384(1), 2009.
4. Doo-Seung Um, Dong-Pyo Kim,Jong-Chang Woo, and Chang-Il Kim*, "Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma", Ferroelectrics, 384(1), 2009.
3. Dong-Pyo Kim, Gwan-Ha Kim, Jong-Chang Woo, Xue-Yang, Doo-Seung Um, Chang-Il Kim*,"Etching Properties of HfO2 Thin Films in Cl2/Bcl3/Ar Plasma", Ferroelectrics, 381(1), 2009.
2. Doo-Seung Um, Dong-Pyo Kim, Gwan-Ha Kim, Jong-Chang Woo, and Chang-Il Kim*,"Surface Reaction of TaN Metal Gate Etching by using Inductively Coupled Plasma", J. Korean Phys. Soc., 54(3), 2009.
1. Chan-Min Kang, Dong-Pyo Kim, Doo-Seung Um, and Chang-Il Kim*,"Chemical Reaction on the Surface of As-Doped ZnO Thin Films during the Dry Etching Process", J. Korean Phys. Soc., 54(3), 2009.