Atomic layer deposition (ALD) and plasma-enhanced ALD (PEALD) enable atomic-scale control of film thickness, composition, and interfaces through sequential self-limiting surface reactions. Our research focuses on understanding growth mechanisms and developing advanced deposition processes for functional thin films used in next-generation electronic, photonic, and energy devices.
Key research directions include:
Metal oxide and nitride thin films for semiconductor and energy applications
Plasma-assisted surface reactions and low-temperature thin-film growth
Area-selective deposition and conformal coating of complex nanostructures
Process–structure–property relationships in functional thin films
Sequential infiltration synthesis (SIS) extends ALD chemistry into polymeric materials, enabling the fabrication of organic–inorganic hybrid materials with tailored composition, structure, and functionality. Our research aims to understand precursor infiltration mechanisms and develop SIS-enabled materials for advanced nanomanufacturing.
Key research directions include:
Organic–inorganic hybrid materials and nanocomposites
Hybrid resist platforms for advanced lithography
Nanoporous materials derived from polymer templates
Controlled infiltration and diffusion of precursors in polymer systems
Atomic layer etching (ALE) and plasma-enhanced ALE (PEALE) provide atomic-scale precision in material removal through sequential self-limiting surface reactions. Our research focuses on developing highly controllable etching processes and understanding the fundamental mechanisms that govern selective and damage-minimized material removal.
Key research directions include:
Thermal and plasma ALE of metal oxides and nitrides
Surface reaction mechanisms and atomic-scale process control
Selective etching strategies for advanced device architectures
Integration of deposition and etching processes for nanoscale fabrication
A fundamental understanding of materials processing requires direct observation of chemical reactions and structural evolution at the nanoscale. Our research integrates advanced characterization techniques with thin-film synthesis and etching processes to uncover the mechanisms governing material growth, infiltration, and removal.
Key research directions include:
Real-time investigation of surface reactions using in situ FTIR spectroscopy
Three-dimensional nanoscale compositional analysis using atom probe tomography (APT) through collaborative studies
Mechanistic understanding of process–structure–property relationships in functional thin films and organic–inorganic hybrid materials