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Organic-Inorganic Hybrid Resists via SIS
Organic-Inorganic Hybrid Resists via SIS
RESEARCH SCOPE
Hybridize conventional polymer resists with inorganic components via SIS
Tailor radiation response, sensitivity, and etch resistance
Establish chemistry–structure–lithographic performance relationships
CORE RESEARCH TOPICS
Hybrid Resist Design for Advanced Lithography
Resolution-LER-Sensitivity Trade-off Optimization
Resist Engineering for High-Resolution Patterning
Etch Resistance & Pattern Transfer Performance
MECHANISTIC FOCUS
Bond Cleavage & Radical Formation
Radiation-Induced Crosslinking
Role of Inorganic Motifs
Network Formation & Insolubilization
Atomic Layer Etching of Functional Materials
Atomic Layer Etching of Functional Materials
RESEARCH SCOPE
Develop self-limiting ALE chemistries for functional materials
Control etch rate and selectivity in complex 3D structures
Establish relationships among surface chemistry, material structure, and etch behavior
CORE RESEARCH TOPICS
Atomic-Scale Etch Control for 3D Structures
Selective Etching of High-k & Functional Materials
High-Aspect-Ratio Process Integration
Nanoscale Semiconductor Patterning & Integration
MECHANISTIC FOCUS
Surface Fluorination
Ligand-Exchange Reactions
Material-Dependent Reactivity
Structure-Dependent Surface Reactivity
PEALD of Functional Nitride Thin Films
PEALD of Functional Nitride Thin Films
RESEARCH SCOPE
Develop PEALD processes for functional nitride thin films with precise composition and thickness control
Engineer ferroelectric, conductive, and superconducting properties via composition, structure, and interface control
Enable conformal integration of nitride materials into advanced semiconductor devices
CORE RESEARCH TOPICS
Ferroelectric Nitride Materials
Conducting & Superconducting Nitride Materials
High-Aspect-Ratio Conformal Deposition
Composition & Interface Engineering for Device Integration
MECHANISTIC FOCUS
Plasma-Surface Reaction Chemistry
Precursor Adsorption & Ligand Elimination
Composition, Defects & Phase Evolution
Structure-Electrical Property Relationships
Advanced Characterization of Nanoscale Materials
Advanced Characterization of Nanoscale Materials
RESEARCH SCOPE
Integrate in situ and ex situ characterization across multiple length scales
Resolve nanoscale composition, interfaces, and chemical states using complementary analytical techniques
Establish process–structure–property relationships in functional nanoscale materials
CORE RESEARCH TOPICS
Correlative In Situ-Ex Situ Characterization
3D Nanoscale Compositional Mapping
Interface & Defect Characterization
Process-Induced Chemical & Structural Evolution
MECHANISTIC & METROLOGY FOCUS
Reaction Pathways in SIS, ALE & PEALD
Interface, Defect & Composition Evolution
Cross-Modal Chemical-Structural Correlation
Quantitative Metrology for Nanoscale Processing
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