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Welcome to the IEMCL
Welcome to the IEMCL
We conduct interdisciplinary research to understand and engineer atomic-scale synthesis, infiltration, and etching processes, integrating advanced characterization to develop functional thin films and hybrid materials for next-generation semiconductor technologies.
We conduct interdisciplinary research to understand and engineer atomic-scale synthesis, infiltration, and etching processes, integrating advanced characterization to develop functional thin films and hybrid materials for next-generation semiconductor technologies.
SIS Resist Engineering
SIS Resist Engineering
Radiation Chemistry
Crosslinking & Network Evolution
Organic-Inorganic Interactions
Atomic Layer Etching
Atomic Layer Etching
Surface Reaction Chemistry
Self-Limiting Etching
Structure-Dependent Reactivity
Functional Nitrides
Functional Nitrides
Precision & Conformal PEALD
Ferroelectric Nitrides
Conductive Nitrides
Advanced Characterization & Metrology
Correlative in situ-ex situ analysis linking process chemistry, nanoscale structure, and functional properties
We warmly welcome motivated graduate students to join our research group and grow together.
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