Equipments

Dynamic flexural measurement system is a very sensitive detection technique to study vibrational motion of 1- or 2-dimensional materials using laser interferometry.

Raman spectrum imaging to observe vibrational, rotational, and other low-frequency modes in various systems can be carried out using confocal Raman microspectrometer, which provides diffraction limited lateral resolution (<300nm) imaging and 3D image generation Raman spectroscope

The high resolution(~2-3nm) data imaging(mapping) of Raman spectrum and photocurrent for various nanomaterials are simultaneously measurable through the confocal Raman microscope combined with home-made electrical measurement system.

Chemical vapor deposition (CVD) is used for synthesizing well crystallized Zinc Oxide nanowires.

IV 4-point probe station and Keithley 4200 (HP4145B) are provided for measuring various electrical properties using two and four point measurement technique.

IV 4-point probe station and Keithley 4200 (HP4145B) are provided for measuring various electrical properties using two and four point measurement technique in high vacuum at low temperature(~77K).

Ultrasonic Probe Sonicator is widely used in tissue processing and particle dispersion. Based on latest technology, these can be easily transferred from one batch to other with intermediatory operations like emptying, cleaning and refilling. The ultrasonic processor can easily be transported to various locations of sample operations.

It is a high frequency electrical energy that is converted into ultrasound waves by means of ultrasonic transducers, which are bonded on the base of water tank. The ultrasonic bath sonicator are high frequency sound waves that are created in the liquid countless, microscopic vacuum bubbles, which rapidly expand & collapse. Excessive scrubbing of cavitation cleans away all the dirt and soil from the object immersed and the object is effectively cleaned.

In our laboratory, simple position aligner developed using optical microscope and XYZ manipulators. Various low-dimentional micro- and nano- materials could be transferred to target substrate with high accuracy (~100nm)

Critical point drying process is a method for drying samples without collapsing or deforming the suspended structure during wet process.

A scanning electron microscope (SEM) is a type of electron microscope that produces images of a sample by scanning it with a focused beam ofelectrons. The electrons interact with atoms in the sample, producing various signals that can be detected and that contain information about the sample’s surface topography and composition.

Electron-beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (“exposing”). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (“developing”).

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.

When current flows in hot filament as a electron beam source, electron beam is generated. Electron beam is controllable using electromagnet by Lorentz force. Source materials(Au, Cr, Pd, Ti and etc.) collide with focused electron beam and it is enough heated to evaporate. A thin film is made of source materials on target substrates. Deposition speed and thickness are adjusted by controlling current flow rate and operating time.

Photolithography is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer ageometric pattern from a photomask to a light-sensitive chemical “photoresist” on the substrate. A series of chemical treatments then either engraves the exposure pattern into the material underneath the photo resist.

Optical microscope is type of microscope using visible light. The image from optical microscope is captured by CCD (Charge-Coupled Device) camera and send digital image to computer to analyze image. By various lens (from x5 to x100 objective lens), we can find very small size samples to several micrometers. Also we can transfer layer sample to another substrate on optical microscope stage.