The rapid growth of nanotechnology has increased the need for fast nanoscale imaging. X-ray Free Electron Laser (XFEL) facilities currently provide such coherent sources of directional and high brilliance x-ray radiation. These facilities require large financial investments for development, maintenance and manpower and thus only a few exist worldwide. XMMaS aims to the development of a table-top prototype system of ultrafast soft X-ray multispectral microscopy imaging for nanostructured materials with enormous potential and a broad range of applications in up-to date technologies. The special characteristics of the extreme-UV source (XUV) provide a very high added value to the final prototype system and cover imaging aspects unachievable by the existing conventional coherent light sources.
For more info visit the XMMaS webpage
Important note: Job openings with increased interest in Masters and PhD students. Students interested in should contact Assoc. Prof. Emmanouil Benis.