The FIB-SEM facility in the Department of the Geophysical Sciences at the University of Chicago features a TESCAN LYRA3 field-emission scanning electron microscope (FESEM) with a focused ion beam (FIB). Our FIB-SEM is one of the many Core Facilities of the Physical Sciences Division.
TESCAN LYRA3
(Image credit: Department of Geophysical Sciences)
All-in-one FIB, SEM, EDS, WDS, EBSD, TEM
Training is required before use.
Academic pricing is $75/hr instrument time with an additional $75/hr for user assistance.
Common SEM applications include high- and low-resolution imaging (cm to nm sizes), chemical analysis and mapping, and structural analysis by EBSD or TKD. Common FIB applications include TEM sample preparation, tomography, manipulation of small samples (i.e., controlled isolation/removal of material, controlled deposition of C or Pt), EDS analysis of thin sections for enhanced lateral resolution.
The SEM can operate at high vacuum for conducting samples or coated insulators and at low vacuum for insulating samples, and is equipped with the following detectors and other capabilities:
Everhart-Thornley secondary electron (SE) detector, for topographic imaging at high vacuum
Scintillator-type backscattered electron (BSE) detector, for compositional imaging at low and high vacuum
In-column SE detector for high resolution topographic imaging
In-column BSE detector for high resolution compositional imaging
Scanning transmission electron microscopy (STEM) detector with bright-field and dark-field capability
Beam deceleration for high resolution imaging at low incident electron energy
Two Oxford Instruments X-Max-80 silicon drift x-detectors (SDD), for rapid chemical mapping and quantitative chemical analysis
An Oxford Instruments Wave 500 wavelength-dispersive spectrometer (WDS) for low-concentration chemical analyses
An Oxford Instruments NordlysMax2 electron backscatter diffraction (EBSD) detector for determination of crystal structures and study of textures
The LYRA3 is equipped with a Cobra liquid metal ion gun that emits a focused beam of gallium ions. The current of the gallium beam can be varied between ~30 nA and <1 pA. It is currently used for milling, imaging, and controlled deposition of carbon and platinum. The latter is achieved using an Oxford Instruments OmniGIS II gas injection system. An Oxford Instruments OP-400 micromanipulator can be used to lift out small milled samples. The OmniGIS II is currently set up for carbon and platinum deposition, but can also be equipped for deposition of tungsten, and for enhanced milling with reactive gases.
