1) Atomic Layer Deposition (ALD)
3) Amorphous Oxide Semiconductor for Thin Film Transistor
- Layer-by-layer formation of nanomaterials
- An example of nanostructures enabled by ALD at 55 oC- SnO2 gyroid
- Amorphous oxide formation by ALD
- InGaZnO (IGZO), ZnSnO (ZTO), InSnO (ISO), etc.
2) Thin Film Solar Cells
- Cu(In,Ga)Se2 (CIGS), CdTe, CZTS, SnS, Cu2O p-type absorber layers
- ZnO, SnO2, (Zn,Sn)Ox, (Zn,Mg)Ox, (Zn,Ti)Ox n-type buffer layersÂ
4) Resistive Random-Access Memory (ReRAM)
- Bipolar resistive switching of Sb2O5