PUBLICATIONS

Journal List

"Dynamic control of synaptic plasticity by competing ferroelectric and trap-assisted switching in IGZO transistor with Al2O3/HfO2 dielectrics"

Submitted

"Oxidation Dynamics and Surface Chemistry of Iridium and Iridium Oxide Films Grown by Atomic Layer Deposition Using O2 and O3"

Submitted

"Effect of increasing deposition temperature of atomic layer deposited ZrO2 thin films: improvement of leakage current properties"

Submitted

106 "High energy storage performance of nanometer-thick Al-doped ZrO2 films with antiferroelectricity for electrostatic capacitors"

ACS Applied Nano Materials, accepted (2025). [link]

Seung Won Lee, Youkyoung Oh, Cheol Jun Kim, Bo Soo Kang , Ji-Hoon Ahn* 

105 "Atomic layer deposition of ZrO2 films at high temperature (>350℃) using modified cyclopentadienyl Zr precursor"

ACS Applied Materials & Interfaces, accepted (2025). [link]

 Jae Chan Park, Chang Ik Choi, Hongseok Jang, Suhyong Yun, Miso Kim, Ji-Hoon Ahn, Woo-Hee Kim, Bonggeun Shong*, Tae Joo Park*

104 "Enhancing InGaZnO transistor current through high-κ dielectrics and interface trap extraction using single-pulse charge pumping"

Scientific Reports, 15, 23113 (2025).  [link]

JaeHyeong Park, Hyo-Bae Kim, Sang Min Yu, Kihwan Kim, Ju Heyuck Baeck, Jiyong Noh, Kwon-Shik Park, Soo-Young Yoon, Ji-Hoon Ahn, Saeroonter Oh

103 "Oxidation-state-dependent selective atomic layer etching of metal oxides"

ACS Applied Materials & Interfaces, 17(26), 38608-38618 (2025).  [link]

 Jeongbin Lee, Jae-Hong Noh, Jung-Tae Kim, Dongjun Lee, Ji Hyeon Choi, Jeong-Min Lee, Ji-Hoon Ahn, Tae Joo Park, Woo-Hee Kim

102 "Effect of H2/N2 ratio on molybdenum nitride thin films deposited by plasma-enhanced atomic layer deposition: Applications for next-generation interconnects"

ACS Applied Nano Materials, 8(25), 13130-13138 (2025).  [link]

Min-Ji Ha, Na-Gyeong Kang, Eun-Su Chung, Ji-Hoon Ahn* 

101 "Unintended soft breakdown mechanism limiting ultrathin ferroelectric HZO films scaling"

ACS Applied Electronic Materials, 7(9), 4114-4124 (2025).  [link]

Wonwoo Kho, Hyunjoo Hwang, Hyo-Bae Kim, Gunho Kim,  Ji-Hoon Ahn, Seung-Eon Ahn*

1100 "High-performance negative capacitance field-effect transistors with synthetic monolayer MoS2"

ACS Nano, 19(18), 17503-17513 (2025). [link]

Moonyoung Jung†, Hyo-Bae Kim†, Yungyeong Park†, Jeongmin Park, Hyeonseo Lee, Seunghyun Oh, Ki Kang Kim, Ji-Hoon Ahn*, Yeonghun Lee*, Junhong Na*, Dongseok Suh* 

99 "Polarization dynamics of the ferroelectric hafnium zirconium oxide thin-film capacitor during the relaxation process"

Applied Physics Letters, 126, 102904 (2025).  [link]

Cheol Jun Kim, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Minu Kang, Hyeon Su Seong, Seung Jin Kang, Yoonchul Shin, Ji-Hoon Ahn, Bo Soo Kang 

98 “Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition"

STAR Protocols, 6(2), 103755 (2025). [link]

Soonyoung Cha, Hyeuk-Jin Han,  Ji-Hoon Ahn*, Gangtae Jin* 

97 “Area-selective deposition of MoS2 using self-assembled monolayers for high-precision patterning"

Materials Letters, 383 138014 (2025).  [link]

Jeong-Hun Choi†, Dong Geun Kim†, Seo-Hyun Lee, Kang Choi, Woo-Hee Kim, Chang Mo Yoon*,  Ji-Hoon Ahn*

96 “High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor"

Journal of Materials Chemistry C, 13, 1637-1645 (2025).  [link]

Jae Chan Park, Chang Ik Choi, Woong Pyo Jeon, Tran Thi Ngoc Van, Woo-Hee Kim, Ji-Hoon Ahn, Bonggeun Shong*, Tae Joo Park*

95 “Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists"

Applied Surface Science, 687 162240 (2025).  [link]

Dong Geun Kim, Kyungryul Ha, Hyekyung Kim, Woo-Hee Kim*, Tae Joo Park*,  Ji-Hoon Ahn*

94 “Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications"

Journal of Alloys and Compounds, 1010 177682 (2025).  [link]

Yeon-Ji Jeon, Seung Won Lee, Yoonchul Shin, Ji-Hwan Kim, Chang Mo Yoon, Ji-Hoon Ahn

93 “Area-selective deposition of lateral van der Waals semiconductor heterostructures"

Cell Reports Physical Science, 5(11) 102254 (2024).  [link]

Chang-Soo Lee, Hyeuk Jin Han, Ji-Hoon Ahn, Gangtae Jin

92 “Ultrathin metal films with low  resistivity via atomic layer deposition: Process pressure effect on initial growth behavior of Ru films"

Chemistry of Materials, 36(17) 8496-8503 (2024). (2024).  [link]

Na-Gyeong Kang, Min-Ji Ha, Ji-Hoon Ahn* 

91 “Pulse program for improving learning accuracy and reducing programming energy consumption of ferroelectric synaptic transistor"

Current Applied Physics, 67 93-100 (2024).   [link]

Jae Yeob Lee, Cheol Jun Kim, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Seung Won Lee, Yoonchul Shin, Ji-Hoon Ahn, Bo Soo Kang 

90 “First demonstration of 2T0C-FeDRAM: a-ITZO FET and double gate a-ITZO/a-IGZO FeFET with record-long multibit retention time of > 4-bit and > 2000 s"

Nanoscale, 16 16467-16476 (2024). [link]

Tae Hyeon Noh†, Simin Chen†, Hyo-Bae Kim, Taewon Jin, Seoung min Park, Seong Ui An, Xinkai Sun, Sang-Hyeon Kim, Jae-Hoon Han, Ji-Hoon Ahn* , Dae-Hwan Ahn*, Younghyun Kim* 

89 “Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition"

Journal of Vacuum Science & Technology A, 42(4) 042401 (2024). [link]

Min-Ji Ha, Na-Gyeong Kang,Woo-Hee Kim, Tae Joo Park, Tae-Eon Park , Ji-Hoon Ahn* 

88 “Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation"

Chemical Engineering Journal, 488 150760 (2024).   [link]

Hyo-Bae Kim†, Jeong-Min Lee†, Dougyong Sung, Ji-Hoon Ahn* , Woo-Hee Kim* 

87 “Optimization method for conductance modulation in ferroelectric transistor for a neuromorphic computing"

Advanced Electronic Materials, 10(5) 2300698 (2024). [link]

Cheol Jun Kim, Jae Yeob Lee, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Seung Won Lee,  Ji-Hoon Ahn, Bo Soo Kang 

86 “Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability"

Surfaces & Interfaces, 42 Part B 103499 (2023). [link]

Seung Won Lee, Hyunchang Kim,  Ji-Hoon Ahn* 

85 “Spike optimization to improve properties of ferroelectric tunnel junction synaptic devices for neuromorphic computing system applications"

Nanomaterials, 13(19) 2704 (2023).  [link]

Jisu Byun, Wonwoo Kho, Hyunjoo Hwang, Yoomi Kang, Minjeong Kang, Taewan Noh, Hoseong Kim, Jimin Lee, Hyo-Bae Kim, Ji-Hoon Ahn, Seung-Eon Ahn* 

84 “Implementation of rutile-TiO2 thin films on TiN without post-annealing through introduction of SnO2 and its improved electrical properties"

Surfaces & Interfaces, 42 Part A 103420 (2023).  [link]

Min Ji Jeong, Seung Won Lee, Yoonchul Shin, Jeong-Hun Choi,  Ji-Hoon Ahn* 

83 “Yttrium doping effects on ferroelectricity and electric properties of as-deposited Hf1-xZrxO2 thin films via atomic layer deposition"

Nanomaterials, 13(15) 2187 (2023).  [link]

Youkyoung Oh, Seung Won Lee, Jeong-Hun Choi, Seung-Eon Ahn, Hyo-Bae Kim*,  Ji-Hoon Ahn* 

82. “Microscale spectroscopic mapping of defect evolution in large-area growth of monolayer MoS2"

Applied Surface Science, 637, 157885 (2023). [link]

Taegeon Lee, Young-Gui Yoon*, Seung Won Lee,  Ji-Hoon Ahn, Heesuk Rho* 

81. “Low-temperature growth of 2D-MoS2 thin films by plasma-enhanced atomic layer deposition using a new molybdenum precursor and applicability to gas sensors"

ACS Applied Nano Materials, 6(13) 12132-12139 (2023). [link]

Jeong-Hun Choi, Min-Ji Ha, Dong Geun Kim, Ji-Min Lee,  Ji-Hoon Ahn 

80. “High-quality SiNx thin film growth at 300 C using atomic layer deposition with hollow cathode plasma"

Journal of Materials Chemistry C, 11, 9107-9113 (2023). [link]

Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim,  Ji-Hoon Ahn, Woo-Hee Kim, Tae Joo Park 

79. “Enhanced dielectric and energy storage performances of Hf0.6Zr0.4O2 thin films by Al doping"

Ceramics International, 49(11), 18055-18060 (2023). [link]

Seung Won Lee†, Min Ji Jeong†, Youkyoung Oh, Hyo-Bae Kim, Tae-Eon Park,  Ji-Hoon Ahn 

78. “Advanced atomic layer deposition (ALD): Controlling reaction kinetics and nucleation of metal thin films using electric potential assisted ALD"

Journal of Materials Chemistry C, 11, 3743-3750 (2023). [link]

Ji Won Han†, Hyun Soo Jin†, Yoon Jeong Kim, Ji Sun Heo, Woo-Hee Kim*,  Ji-Hoon Ahn*, Tae Joo Park* 

77. “Polarization switching dynamics simulation by using the practical distribution of ferroelectric properties"

Applied Physics Letters, 122, 012901 (2023). [link]

Cheol Jun Kim, Jae Yeob Lee, Minkyung Ku, Seung Won Lee,  Ji-Hoon Ahn, Bo Soo Kang 

76. “Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method"

Journal of Materials Chemistry C, 11(4), 1298-1303 (2023). [link]

Jae Chan Park, Chang Ik Choi, Sang-Gil Lee, Seung Jo Yoo, Ji-Hyun Lee, Jae Hyuck Jang, Woo-Hee Kim,  Ji-Hoon Ahn, Jeong Hwan Kim, Tae Joo Park 

75. “Phase control of two-dimensional tin sulfide compounds deposited via atomic layer deposition"

Applied Surface Science, 612, 155887 (2023). [link]

Dong Geun Kim, Ji-Min Lee, Jeong-Hun Choi*,  Ji-Hoon Ahn*

74. “Thickness-dependent the optical and electrical properties of amorphous transparent conductive SrRuO3 thin films deposited by RF magnetron sputtering on glass substrate "

New Physics: Sae Mulli, 72(10), 754-760 (2022). [link]

Hyo Jin Bang, Hyun Min Kim, Jong Hoon Lee,  Ji-Hoon Ahn, Hong Seung Kim 

73. “Effects of Zr content and annealing on ferroelectricity of as-grown crystalline Hf1-xZrxO2 thin films using Hf[Cp(NMe2)3] and Zr[Cp(NMe2)3] precursors via atomic layer deposition"

Ceramics International, 48(17), 25661-25665 (2022). [link]

Youkyoung Oh, Hyo-Bae Kim,  Seung Won Lee, Min Ji Jeong, Tae Joo Park*,  Ji-Hoon Ahn*

72. “Rhenium oxide/sulfide binary phase flakes decorated on nanofiber support for enhanced activation of electrochemical conversion reactions"

Chemical Engineering Journal, 446(1), 136951 (2022). [link]

Ga-Yoon Kim†, Jeongbin Lee†, Yeo-Jin Rho,  Woo-Hee Kim, MinJoong Kim,  Ji-Hoon Ahn*, Won-Hee Ryu*

71. “Advanced atomic layer deposition: Ultrathin and continuous metal thin film growth and work function control using the discrete feeding method"

Nano Letters, 22(11), 4589-4595 (2022). [link]

Ji Won Han, Hyun Soo Jin, Yoon Jeong Kim, Ji-Sun Heo, Woo-Hee Kim, Ji-Hoon Ahn, Jeong Hwan Kim*, Tae Joo Park*

70. “Equivalent oxide thickness scalability of Zr-rich ZrHfO2 thin films by Al-doping "

Materials Letters, 321, 132418 (2022). [link]

Min Ji Jeong, Seung Won Lee, Hyo-Bae Kim, Youkyoung Oh, Ju Hun Lee*, Ji-Hoon Ahn*

69. “A simple strategy to realize super stable ferroelectric capacitor via interface engineering "

Advanced Materials Interfaces, 9(15), 2102528 (2022). [link]

Hyo-Bae Kim, Kyun Seong Dae, Youkyoung Oh, Seung-Won Lee, Yoseop Lee, Seung-Eon Ahn, Jae Hyuck Jang*, Ji-Hoon Ahn*

68. “Area-selective atomic layer deposition using vapor dosing of short-chain alkanethiol inhibitors on metal/dielectric surfaces"

Advanced Materials Interfaces, 9(13), 2102364 (2022).  [link]

Jeongbin Lee, Jeong-Min Lee, Ji-Hoon Ahn, Tae Joo Park*, Woo-Hee Kim*

67. “Ultralow-resistivity molybdenum-carbide thin films deposited by plasma-enhanced atomic layer deposition using a cyclopentadienyl-based precursor"

Chemistry of Materials,  34(6), 2576-2584  (2022).  [link]

Min-Ji Ha, Hyunchang Kim, Jeong-Hun Choi, Miso Kim, Woo-Hee Kim, Tae Joo Park, Bonggeun Shong*, Ji-Hoon Ahn*

66. “Highly Stable Artificial Synapses Based on Ferroelectric Tunnel Junctions for Neuromorphic Computing Applications"

Advanced Materials Technologies, 7(7), 2101323 (2022).  [link]

Sungmun Song, Woori Ham, Gyuil Park, Wonwoo Kho, Jisoo Kim, Hyunjoo Hwang, Hyo-Bae Kim, Hyunsun Song, Ji-Hoon Ahn, Seung-Eon Ahn

65. “Unveiling the origin of two distinct routes of interlayer charge transfer doping in Bi2Te3/MoS2/SiO2 heterostructure"

Applied Surface Sciences, 579, 152208 (2022).  [link]

Taegeon Lee, Jeong-Hun Choi, Ji-Hoon Ahn, Young-Gui Yoon*, Heesuk Rho*

64. “A strategy for wafer-scale crystalline MoS2 thin films with controlled morphology using pulsed metal-organic chemical vapor deposition at low temperature"

Advanced Materials Interfaces, 9(4) 2101785 (2022).  [link]

Jeong-Hun Choi, Min-Ji Ha, Jae Chan Park, Tae Joo Park, Woo-Hee Kim, Myoung-Jae Lee, Ji-Hoon Ahn*

63. “Evaluating the performance and characteristics of rutile TiO2 thin film for triboelectric nanogenerator (TENG)"

Journal of the Korean Institute of Surface Engineering, 54(6) 324-330 (2021).   [link]

Ji-Hyeon Moon, Han-Jae Kim, Hyo-Bae Kim*,  Ji-Hoon Ahn*

62. “Tunable atomic level surface functionalization of  a multi-layered graphene oxide membrane to break the permeability-selectivity trade-off in salt removal of brackish water"

Separation and Purification Technology, 274, 119047 (2021).  [link]

Tae-Nam Kim, Jieun Lee, Jeong-Hun Choi, Ji-Hoon Ahn*, Euntae Yang, Moon-Hyun Hwang, Kyu-Jung Chae*

61. “Wafer-Scale Growth of a MoS2 Monolayer via One Cycle of Atomic Layer Deposition: An Adsorbate Control Method"

Chemistry of Materials, 33(11), 4099-4105 (2021).  [link]

Dae Hyun Kim‡, Jae Chan Park‡, Jeongwoo Park, Deok-Yong Cho, Woo-Hee Kim, Bonggeun Shong*, Ji-Hoon Ahn*, Tae Joo Park*

60. “Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited via atomic layer deposition using cyclopentadienyl-based precursors without annealing"

Nanoscale, 13, 8524-8531 (2021).  [link]

Hyo-Bae Kim†, Moonyoung Jung†, Youkyoung Oh,  Seung Won Lee, Dongseok Suh*, Ji-Hoon Ahn*

59. “Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films"

Materials Letters, 291, 129554 (2021). [link]

Hyunchol Cho, Ben Nie, Ajit Dhamdhere, Yifei Meng, Monica Neuburger, Ji-Hoon Ahn, Jerry Mack, Sung-Hoon Jung, Hae-Young Kim

58. “2D materials-based membranes for hydrogen purification: Current status and future prospects"

International Journal of Hydrogen Energy, 46(20), 11389-11410 (2021). [link]

Euntae Yang, Abayomi Babatunde Alayande, Kunli Goh, Chang-Min Kim, Kyoung-Hoon Chu, Moon-Hyun Hwang, Ji-Hoon Ahn, Kyu-Jung Chae*

57. “Low-resistivity SrRuO3 thin films formed on SiO2 substrates without buffer layer by RF magnetron sputtering"

Journal of Alloys and Compounds, 857, 157627 (2021). [link]

Hyun Min Kim, Jong Hoon Lee, Ahram Yom, Han Sol Lee, Dong Geun Kim, Dong Wan Ko, Hong Seung Kim*, Ji-Hoon Ahn*

56. “Atomic layer deposited strontium niobate thin films as new high-k dielectrics"

Materials Letters, 286, 129220 (2021). [link]

Seung Won Lee, Hyo-Bae Kim, Chang-Min Kim, Se-Hun Kwon*, Ji-Hoon Ahn*

55. “Enhanced electrical properties of ZrO2-TiN based capacitors by introducing ultrathin metal oxides"

Materials Letters, 279, 128490 (2020). [link]

Dong-Kwon Lee†, Hyo-Bae Kim†, Se-Hun Kwon*, Ji-Hoon Ahn* 

54. “Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperature"

Applied Surface Science, 532, 147462 (2020). [link]

Jeong-Hun Choi, Seung Won Lee, Hyo-Bae Kim, Ji-Hoon Ahn*

53. “Growth characteristics of tin sulphides crystals by vapor transport method using SnS and sulphur powder: effect of temperature and pressure"

Micro & Nano Letters, 15(10), 693-696 (2020). [link]

Chaeeun Kim, Jun-Cheol Park, Ji-Hoon Ahn*

52. “Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity"

Thin Solid Films, 694, 137752 (2020). [link]

Eun-Jin Song, Hyunjin Jo, Se-Hun Kwon*, Ji-Hoon Ahn*, Jung-Dae Kwon*

51. “Understanding tunneling electroresistance effect through potential profile in Pt/Hf0.5Zr0.5O2/TiN ferroelectric tunnel junction memory"

Applied Physic Letters, 115, 153502(2019). [link]

Jungkyu Yoon, Seunghyeon Hong, Yong Won Song, Ji-Hoon Ahn, Seung-Eon Ahn*

50. “Highly transparent and conductive oxide-metal-oxide electrodes optimized at the percolation thickness of AgOx for transparent silicon thin-film solar cells"

Solar Energy Materials and Solar Cells, 202, 110131, (2019). [link] 

Hyunjin Jo, Jo-Hwa Yang, Soo-Won Choi, Jaeho Park, Eun Jin Song, Myunhun Shin*, Ji-Hoon Ahn*, Jung-Dae Kwon*

49. “Improved electrical performance of a sol-gel IGZO transistor with high-k Al2O3 gate dielectric achieved by post annealing"

Nano Convergence, 6, 24, (2019). [link] 

Esther Lee, Tae Hyeon Kim, Seung Won Lee, Jee Hoon Kim, Jaeun Kim, Tae Gun Jeong, Ji-Hoon Ahn, Byungjin Cho*

48. “Modulation of crystal structure and electrical properties of Hf0.6Zr0.4O2 thin films by Al-doping"

Materials Letters, 252, 56-59 (2019). [link]  

Seung Won Lee, Chang-Min Kim, Jeong-Hun Choi, Cheol-Min Hyun, Ji-Hoon Ahn* 

47. “Synthesis of Bi2Te3 single crystals with lateral size up to tens of micrometers by vapor transport and its potential for thermoelectric applications"

Crystal Growth & Design, 19(4), 2024-2029 (2019) [link]

Cheol-Min Hyun, Jeong-Hun Choi, Seung Won Lee, Seung-Young Seo, Myoung-Jae Lee*, Se-Hun Kwon, Ji-Hoon Ahn*

46. “Comparative study of the electrical characteristics of ALD-ZnO thin films using H2O and H2O2 as the oxidants"

Journal of the American Ceramic Society, 102(10), 5881-5889, (2019) [link]

Woo-Jae Lee, Susanta Bera, Zhixin Wan, Wei Dai, Jong-Seong Bae, Tae Eun Hong, Kwang-Ho Kim*, Ji-Hoon Ahn*, Se-Hun Kwon*

45. “Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition"

Materials Letters, 246, 1-4 (2019). [link]  

Dong-Kwon Lee, Se-Hun Kwon*, Ji-Hoon Ahn* 

44. “Characteristics of copper microsphere grown by mixed-source hydride vapor phase epitaxy"

New Physics: Sae Mulli, 68(10), 1052-1058 (2018). [link] 

Kyoung Hwa Kim, Ji-Hoon Ahn, Hyung Soo Ahn*, Min Yang, Sam Nyung Yi, Injun Jeon, Chae Ryong Cho, Hunsoo Jeon, Jae Hak Lee, Hyo Suk Lee, Suck-Whan Kim*

43. “Low power switching characteristics of CNT field effect transistor device with Al-doped ZrHfO2 gate dielectric"

Journal of Nanomaterials, 2156895 (2018). [link] 

Seyoung Oh†, Seung Won Lee†, Dongjun Kim, Jeong-Hun Choi, Hong-Chul Chae, Sung Mook Choi, Ji-Hoon Ahn*, Byungjin Cho*

42. “Fabrication of microholes in silicon wafers by wet-chemical etching"

New Physics: Sae Mulli,  68(8), 834-838 (2018). [link] 

Ha Young Lee, Ji-Yeon Noh, Min Sub Kwak, Kyung-Won Lim, Hyung Soo Ahn, Ji-Hoon Ahn, Sam Nyung Yi*, Jungho Ryu*

41. “The correlation between the preferred orientation and Al distribution of Al-doped HfO2 films by plasma-enhanced atomic layer deposition"

Nanoscience and Nanotechnology Letters, 10, 747-753 (2018). [link] 

Da-Young Kim, Jaeho Jang, Bo-Ra Kim, Byung Jun Kim, Hyoung Chan Kim, Daekwon Joo, Pan-Kwi Park, Jin Hyock Kim, Ji-Hoon Ahn, Dong-Ok Shin, Daegeun Nam, Hyoung-Seok Moon*, Se-Hun Kwon*

40. “Silicon atomic layer etching by two-step plasma process consisting of oxidation and modification to form (NH4)2SiF6, and its sublimation"

Japanese Journal of Applied Physics, 57(10), 106505 (2018). [link]

Eun-Jin Song, Ji-Hye Kim, Jung-Dae Kwon*, Se-Hun Kwon*, Ji-Hoon Ahn* 

39. “Synthesis mechanism of MoS2 layered crystals by chemical vapor deposition using MoO3 and sulfur powders"

Journal of Alloys and Compounds, 756, 380-384 (2018). [link] 

Cheol-Min Hyun, Jeong-Hun Choi, Seung Won Lee, Jeong Hwa Park, Kang Taek Lee, Ji-Hoon Ahn* 

38. “Transparent bifacial a-Si:H solar cells with improved transparency employing silver oxide embedded transparent electrodes"

Solar Energy, 170, 940-946 (2018). [link] 

Hyunjin Jo, Jo-Hwa Yang, Ji-hoon Lee, Jung-Wook Lim, Jaesung Lee, Myunhun Shin*, Jung-Dae Kwon*, Ji-Hoon Ahn*

37. “Self-formed channel devices based on vertically grown two-dimensional materials with large-surface-area and their potential for chemical sensor applications"

Small, 14, 1704116 (2018) [link] 

Chaeeun Kim†, Jun-Cheol Park†, Sun Young Choi, Yonghun Kim, Seung-Young Seo, Tae-Eon Park, Se-Hun Kwon, Byungjin Cho*, Ji-Hoon Ahn*

36. “Wafer-scale synthesis of reliable high-mobility molybdenum disulfide thin films via inhibitor-utilizing atomic layer deposition"

Advanced Materials, 29, 1703031 (2017). (Selected as a Front Cover: December 20, 2017) [link] 

Woojin Jeon, Yeonchoo Cho, Sanghyun Jo, Ji-Hoon Ahn*, Seong-Jun Jeong*

35. “A hybrid gate dielectrics of ion gel dielectrics with ultra-thin passivation layer for high-performance transistor based on two-dimensional semiconductor channels"

Scientific Reports, 7, 14194 (2017). [link]

Hyunjin Jo†, Jeong-Hun Choi†, Cheol-Min Hyun†, Seung-Young Seo, Da Young Kim, Chang-Min Kim, Myoung-Jae Lee, Jung-Dae Kwon, Hyoung-Seok Moon, Se-Hun Kwon*, Ji-Hoon Ahn*

34. “Thermoelectric elastomer fabricated using CNT and nonconducting polymer"

Japanese Journal of Applied Physics,  56(9), 095101 (2017). [link]

Jeong-Hun Choi†, Cheol-Min Hyun†, Hyunjin Jo, Ji Hee Son, Ji Eun Lee, Ji-Hoon Ahn*

33. “Photo-thermoelectric properties of SnS nanocrystal with orthorhombic layered structure"

Applied Physics Letters, 111(1), 103104 (2017). [link]

Cheol-Min Hyun†, Jeong-Hun Choi†, Myoung Jae Lee, Ji-Hoon Ahn*

32. “Silicon oxide film deposited at room temperature using high-working-pressure plasma-enhanced chemical vapor deposition: effect of O2 flow rate"

Ceramics International, 43(13), 10628-10631 (2017). [link]

Young-Soo Lee, Seung-Hwan Lee, Jung-Dae, Kwon*, Ji-Hoon Ahn*, Jin-Sung Park*

31. “Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition"

Ceramics International, 43(8), 6580-6584 (2017). [link]

Seung-Hwan Lee, Jung-Dae, Kwon*, Ji-Hoon Ahn*, Jin-Sung Park*

30. “Vapor Phase Synthesis of TaS2 Nanocrystals with Iodine as Transport Agent"

Japanese Journal of Applied Physics, 56(4), 045501 (2017). [link]

Gangtae Jin†, Chaeeun Kim†, Hyunjin Jo†, Se-Hun Kwon, Seong-Jun Jeong, Han-Bo-Ram Lee*, Ji-Hoon Ahn*

29. “Frank-van der Merwe Growth vs. Volmer-Weber Growth in Successive Stacking of Bi2Te3/Sb2Te3 Few-layers by van der Waals Heteroepitaxy: The Critical Roles of  Finite Lattice-   

        Mismatch with Seed Substrates"

Advanced Electronic Materials, 3, 1600375 (2017). [link]

Hoseok Heo, Ji Ho Sung, Ji-Hoon Ahn, Fereshte Ghahari, Takashi Taniguchi, Kenji Watanabe, Philip Kim, Moon-Ho Jo*

28. “Depletion Effect of Polycrystalline-Silicon Gate Electrode by Phosphorus Deactivation"

Solid-State Electronics, 127, 1-4 (2017). [link]

Woojin Jeon, Ji-Hoon Ahn*

27. “Vapor Transport Synthesis of Two-dimensional SnS2 Nanocrystals Using a SnS2 Precursor Obtained from the Sulfurization of SnO2"

Crystal Growth & Design, 16(7), 3884-3889 (2016). [link]

Jun Cheol Park†, Kyoung Ryun Lee†, Hoseok Heo, Se-Hun Kwon, Jung-Dae Kwon, Myoung-Jae Lee, Woojin Jeon, Seong-Jun Jeong*, Ji-Hoon Ahn*

26. “Thermoelectric Materials by Utilizing Two-Dimensional Materials with Negative Correlation between Electrical and Thermal Conductivity”

Nature Communications, 7, 12011 (2016). [link]

Myoung Jae Lee†, Ji-Hoon Ahn†, Ji Ho Sung, Hoseok Heo, Seong Gi Jeon, Woo Lee, Jae Yong Song, Ki-Ha Hong, Byeongdae Choi, Sung-Hoon Lee, Moon-Ho Jo*

25. “First-Principles Study of Carbon Impurity Effects in the Pseudo-Hexagonal Ta2O5"

Current Applied Physics, 16(6), 638-643 (2016). [link]

Ja-Yong Kim, Blanka Magyary-Köpe, Yoshio Nishi, Ji-Hoon Ahn*

24. “Transparent Photovoltaic Device using Two-dimensional Transition Metal Dichalcogenides"

Journal of  Korean Institute of Surface Engineering, 49(2), 186-190 (2016). [link]

Tae-Hun Jwa†,Chul-Min Hyun†, Min-Sik Kim, Hyeok-ju Lee, Ji-Hoon Ahn*

23. “Plasma-Enhanced Atomic Layer Deposition of SnO2 Thin Films using SnCl4 and O2 Plasma”

Materials Letters, 166(1), 163-166 (2016). [link] 

Dong Kwon Lee, Zhixin Wan, Jong-Seong Bae, Han-Bo-Ram Lee, Ji-Hoon Ahn, Sang-Deok Kim, Jayong Kim, Se-Hun Kwon*

22. “Effect of annealing conditions on the formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films”

Microelectronic Engineering, 149, 62-65 (2016). [link]

Ji-Hoon Ahn*, Ja-Yong Kim

21. “Sub-0.5nm Equivalent Oxide Thickness Scaling for Si-doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode”

ACS applied materials & interfaces, 7(28), 15587-15592 (2015). [link] 

Ji-Hoon Ahn*,  Se-Hun Kwon*

20. “Enhanced Electrical Properties of Hf-Aluminate Thin Films by Crystal Structure Modulation”

Materials Letters, 157, 215-218 (2015). [link] 

Ji-Hoon Ahn*, Myoung Jae Lee*

19. “Deterministic Two-Dimensional Polymorphism Growth of Hexagonal n-type SnS2 and Orthorhombic p-type SnS Crystals”

Nano Letters, 15(6), 3703-3708 (2015). [link]

Ji-Hoon Ahn, Myoung Jae Lee, Hoseok Heo, Ji Ho Sung, Kyungwook Kim, Hyein Hwang, Moon-Ho Jo* 

18. “Rotation-Misfit-Free Heteroepitaxial Stacking and Stitching Growth of Hexagonal Transition-Metal Dichalcogenide Monolayers by Nucleation 

       Kinetics Controls”

Advanced Materials, 27(25), 3803-3810 (2015). (Selected as a Inside Back Cover: December 20, 2017) [link]

Hoseok Heo, Ji Ho Sung, Gangtae Jin, Ji-Hoon Ahn, Kyungwook Kim, Myoung Jae Lee, Soonyoung Cha, Hyunyong Choi, Moon-Ho Jo*

17. “Interlayer Orientation Dependent Light Absorption and Emission in Monolayer Semiconductor Stacks”

      Nature Communications, 6, 7372 (2015). [link]

Hoseok Heo, Ji Ho Sung, Soonyoung Cha, Bo-Gyu Jang, Joo-Youn Kim, Gangtae Jin, Donghun Lee, Ji-Hoon Ahn, Myoung Jae Lee, Ji Hoon Shim, 

Hyunyong Choi, Moon-Ho Jo*

16. “Abnormally enhanced dielectric constant in ZrO2/Ta2O5 multi-laminate structures by metallic Ta formation”

Materials Letters, 154, 148-151 (2015). [link]

Hyunchol Cho, Kyung-Woong Park, Cheol Hwan Park, Ho Jin Cho, Seung-Jin Yeom, Kwon Hong, Noh-Jung Kwak,  Ji-Hoon Ahn* 

15. “Effect of Al2O3 Insertion on the Electrical Properties of SrTiO3 Thin Film: A Comparison Between Al2O3-doped SrTiO3 and

      SrTiO3/Al2O3/SrTiO3 sandwich structure”

Materials Research Bulletin, 64, 1-5 (2015). [link]

Ji-Hoon Ahn, Ja-Yong Kim, Seong-Jun Jeong, Se-Hun Kwon* 

14. “Investigation of Strong Metallic Ta Reduction in ZrO2/Ta2O5 Multi-Laminate Layer Growth”

ECS Transactions, 61(2), 21-25 (2014) [link]

Hyunchol Cho, Kyung-Woong Park, Ji-hoon Ahn, C H Park, H J Cho, S J Yeon, K Hong, N J Kwak 

13. “Multifunctional Ru-AlN Heating Resistor Films for High Efficiency Inkjet Printhead”

Journal of Electroceramics, 32, 240-245 (2014). [link]

Woo-Chang Choi, Zhixin Wan, Ji-Hoon Ahn, Doo-In Kim, Seung-Yong Shin, Kyung-Il Moon, Jin-Seong Park*, Jung-Dae Kwon*,Se-Hun Kwon* 

12. “Impact of Transparent Electrode on Photoresponse of ZnO-based Phototransistor”

Applied Physics Letters, 103, 251111 (2013). [link]

Seunghyup Lee, Seung-Eon Ahn*, Yongwoo Jeon, Ji-Hoon Ahn, Ihun Song, Sanghun Jeon, Dong-Jin Yun, Jungwoo Kim, Hyung Choi, U-in Chung, Jaechul Park

11. “Temperature Dependence of Photocurrent in an Amorphous GaInZnO/InZnO Thin Film Transistor”

Applied Physics Letters, 103, 173515 (2013). [link]

Ji-Hoon Ahn*, Seung-Eon Ahn*, Yongwoo Jeon, Seunghyup Lee, Ihun Song, Jungwoo Kim, Hyung Choi, U-in Chung 

10. “Ru Films from Bis(ethylcyclopentadienyl) ruthenium Using Ozone as a Reactant by Atomic Layer Deposition for Capacitor Electrodes”

Journal of Electrochemical Society, 159(6), H560-H564 (2012). [link]

Ja-Yong Kim, Deok-Sin Kil, Jin-Hyock Kim, Se-hun Kwon, Ji-Hoon Ahn, Jae-Sung Roh, Sung-Ki Park 

9. “Thermal stability of RuO2 thin films prepared by modified atomic layer deposition”

Current Applied Physics, 12, S160-S136 (2012). [link] 

Jin-Hyock Kim, Ji-Hoon Ahn, Sang-Won Kang, Jae-Sung Roh, Se-hun Kwon*,  Ja-Yong Kim* 

8. “Theoretical Simulation of Surface Evolution using Random Deposition and Surface Relaxation for Metal Oxide Thin Film in Atomic Layer Deposition”

Journal of Material Science Technology, 26(4), 371-374 (2010). [link]

Ji-Hoon Ahn, Se-hun Kwon*, Jin-Hyock Kim, Ja-Yong Kim, Sang-Won Kang 

7. “Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition”

Electrochemical and Solid-State Letters, 12(2), G5-G8 (2009) [link]

Ji-Hoon Ahn, Ja-Yong Kim, Jin-Hyock Kim, Jae-Sung Roh, Sang-Won Kang*

6. “Dielectric Properties of SrTiO3 Thin Films on SrRuO3 Seed Prepared by Plasma-Enhanced Atomic Layer Deposition”

ECS Transactions, 16(5), 335-339 (2008) [link]

Ji-Hoon Ahn, Ja-Yong Kim, Jin-Hyock Kim, Jae-Sung Roh, Sang-Won Kang

5. “Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition”

Journal of Electrochemical Society, 155(10), G185-G188 (2008). [link]

Ji-Hoon Ahn, Sang-Won Kang*, Ja-Yong Kim, Jin-Hyock Kim, Jae-Sung Roh

4. “Applicability of Step Coverage Modeling to TiO2 Thin Films in Atomic Layer Deposition”

Journal of Electrochemical Society, 154(12), H1008-H1013, (2007). [link]

Ja-Yong Kim, Jin-Hyock Kim, Ji-Hoon Ahn, Pan-Kwi Park, Sang-Won Kang* 

3. “Effect of Crystallinity and Nonstoichiometric Region on Dielectric Properties of SrTiO3 Films Formed on Ru”

Applied Physics Letters, 91, 092910 (2007). [link]

Ja-Yong Kim, Ji-Hoon Ahn, Jin-Hyock Kim, Jae-Sung Roh, Sang-Won Kang*

2. “Increment of Dielectric Properties of SrTiO3 Thin Films by SrO Interlayer on Ru Bottom Electrodes”

Applied Physics Letters, 91, 062910 (2007). [link]

Ji-Hoon Ahn*, Ja-Yong Kim, Sang-Won Kang*, Jin-Hyock Kim, Jae-Sung Roh 

1. “Step Coverage Modeling of Thin Films in Atomic Layer Deposition"

Journal of Applied Physics, 101, 073502 (2007). [link]

Ja-Yong Kim, Jin-Hyock Kim, Ji-Hoon Ahn , Sang-Won Kang*