PUBLICATIONS

Journal List

"Robust Low-Thermal Budget Ferroelectricity in Hf1-xZrxO2 Thin Films Using Thermally Stabilized Cyclopentadienyl-Based Novel Precursors without Post-Annealing"

Submitted

"Atomic Layer Deposition of Ru Using a New Zero-Valent Ru Precursor with a Ligand System Combining Open and Closed Ligands"

Submitted

"Investigating potential use of TiO2 as conductive-like layer in DRAM capacitors"

Submitted

"Timing-dependent spiking neural network: Fully on-board hardware implementation with photoelectroactive van der Waals synapses"

Submitted

109 "Effect of increasing deposition temperature of atomic layer deposited ZrO2 thin films: improvement of leakage current properties"

Ceramics International, accepted (2025).  [link]

Ji Hwan Kim, Seung Won Lee, Yoonchul Shin, Yeon-Ji Jeon, Hyo Yeon Kim, Hong Seok Jang, Hyung Soon Park, Tae Joo Park*, Ji-Hoon Ahn* 

108 "Oxidation Dynamics and Surface Chemistry of Iridium and Iridium Oxide Films Grown by Atomic Layer Deposition Using O2 and O3"

Small, accepted (2025).  [link]

Ji Won Han, Jae Woo Jang, Ryosuke Harada, Woo-Hee Kim, Ji-Hoon Ahn, Tae Joo Park*

107 "Dynamic control of synaptic plasticity by competing ferroelectric and trap-assisted switching in IGZO transistor with Al2O3/HfO2 dielectrics"

Advanced Functional Materials, accepted (2025).  [link]

Ojun Kwon, Dong Ho Lee, Seyoung Oh, Jongwon Yoon, Hyo-Bae Kim, Ji-Hoon Ahn, Woojin Park*, Han Seul Kim*, Byungjin Cho*

106 "High energy storage performance of nanometer-thick Al-doped ZrO2 films with antiferroelectricity for electrostatic capacitors"

ACS Applied Nano Materials, 8(37), 18080-18087 (2025). [link]

Seung Won Lee, Youkyoung Oh, Cheol Jun Kim, Bo Soo Kang , Ji-Hoon Ahn* 

105 "Atomic layer deposition of ZrO2 films at high temperature (>350℃) using modified cyclopentadienyl Zr precursor"

ACS Applied Materials & Interfaces, 17(37), 52913-52919 (2025). [link]

 Jae Chan Park, Chang Ik Choi, Hongseok Jang, Suhyong Yun, Miso Kim, Ji-Hoon Ahn, Woo-Hee Kim, Bonggeun Shong*, Tae Joo Park*

104 "Enhancing InGaZnO transistor current through high-κ dielectrics and interface trap extraction using single-pulse charge pumping"

Scientific Reports, 15, 23113 (2025).  [link]

JaeHyeong Park, Hyo-Bae Kim, Sang Min Yu, Kihwan Kim, Ju Heyuck Baeck, Jiyong Noh, Kwon-Shik Park, Soo-Young Yoon, Ji-Hoon Ahn, Saeroonter Oh

103 "Oxidation-state-dependent selective atomic layer etching of metal oxides"

ACS Applied Materials & Interfaces, 17(26), 38608-38618 (2025).  [link]

 Jeongbin Lee, Jae-Hong Noh, Jung-Tae Kim, Dongjun Lee, Ji Hyeon Choi, Jeong-Min Lee, Ji-Hoon Ahn, Tae Joo Park, Woo-Hee Kim

102 "Effect of H2/N2 ratio on molybdenum nitride thin films deposited by plasma-enhanced atomic layer deposition: Applications for next-generation interconnects"

ACS Applied Nano Materials, 8(25), 13130-13138 (2025).  [link]

Min-Ji Ha, Na-Gyeong Kang, Eun-Su Chung, Ji-Hoon Ahn* 

101 "Unintended soft breakdown mechanism limiting ultrathin ferroelectric HZO films scaling"

ACS Applied Electronic Materials, 7(9), 4114-4124 (2025).  [link]

Wonwoo Kho, Hyunjoo Hwang, Hyo-Bae Kim, Gunho Kim,  Ji-Hoon Ahn, Seung-Eon Ahn*

1100 "High-performance negative capacitance field-effect transistors with synthetic monolayer MoS2"

ACS Nano, 19(18), 17503-17513 (2025). [link]

Moonyoung Jung†, Hyo-Bae Kim†, Yungyeong Park†, Jeongmin Park, Hyeonseo Lee, Seunghyun Oh, Ki Kang Kim, Ji-Hoon Ahn*, Yeonghun Lee*, Junhong Na*, Dongseok Suh* 

99 "Polarization dynamics of the ferroelectric hafnium zirconium oxide thin-film capacitor during the relaxation process"

Applied Physics Letters, 126, 102904 (2025).  [link]

Cheol Jun Kim, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Minu Kang, Hyeon Su Seong, Seung Jin Kang, Yoonchul Shin, Ji-Hoon Ahn, Bo Soo Kang 

98 “Protocol for lateral patterning of van der Waals heterostructures using sequential chemical vapor deposition"

STAR Protocols, 6(2), 103755 (2025). [link]

Soonyoung Cha, Hyeuk-Jin Han,  Ji-Hoon Ahn*, Gangtae Jin* 

97 “Area-selective deposition of MoS2 using self-assembled monolayers for high-precision patterning"

Materials Letters, 383 138014 (2025).  [link]

Jeong-Hun Choi†, Dong Geun Kim†, Seo-Hyun Lee, Kang Choi, Woo-Hee Kim, Chang Mo Yoon*,  Ji-Hoon Ahn*

96 “High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor"

Journal of Materials Chemistry C, 13, 1637-1645 (2025).  [link]

Jae Chan Park, Chang Ik Choi, Woong Pyo Jeon, Tran Thi Ngoc Van, Woo-Hee Kim, Ji-Hoon Ahn, Bonggeun Shong*, Tae Joo Park*

95 “Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists"

Applied Surface Science, 687 162240 (2025).  [link]

Dong Geun Kim, Kyungryul Ha, Hyekyung Kim, Woo-Hee Kim*, Tae Joo Park*,  Ji-Hoon Ahn*

94 “Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications"

Journal of Alloys and Compounds, 1010 177682 (2025).  [link]

Yeon-Ji Jeon, Seung Won Lee, Yoonchul Shin, Ji-Hwan Kim, Chang Mo Yoon, Ji-Hoon Ahn

93 “Area-selective deposition of lateral van der Waals semiconductor heterostructures"

Cell Reports Physical Science, 5(11) 102254 (2024).  [link]

Chang-Soo Lee, Hyeuk Jin Han, Ji-Hoon Ahn, Gangtae Jin

92 “Ultrathin metal films with low  resistivity via atomic layer deposition: Process pressure effect on initial growth behavior of Ru films"

Chemistry of Materials, 36(17) 8496-8503 (2024). (2024).  [link]

Na-Gyeong Kang, Min-Ji Ha, Ji-Hoon Ahn* 

91 “Pulse program for improving learning accuracy and reducing programming energy consumption of ferroelectric synaptic transistor"

Current Applied Physics, 67 93-100 (2024).   [link]

Jae Yeob Lee, Cheol Jun Kim, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Seung Won Lee, Yoonchul Shin, Ji-Hoon Ahn, Bo Soo Kang 

90 “First demonstration of 2T0C-FeDRAM: a-ITZO FET and double gate a-ITZO/a-IGZO FeFET with record-long multibit retention time of > 4-bit and > 2000 s"

Nanoscale, 16 16467-16476 (2024). [link]

Tae Hyeon Noh†, Simin Chen†, Hyo-Bae Kim, Taewon Jin, Seoung min Park, Seong Ui An, Xinkai Sun, Sang-Hyeon Kim, Jae-Hoon Han, Ji-Hoon Ahn* , Dae-Hwan Ahn*, Younghyun Kim* 

89 “Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition"

Journal of Vacuum Science & Technology A, 42(4) 042401 (2024). [link]

Min-Ji Ha, Na-Gyeong Kang,Woo-Hee Kim, Tae Joo Park, Tae-Eon Park , Ji-Hoon Ahn* 

88 “Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation"

Chemical Engineering Journal, 488 150760 (2024).   [link]

Hyo-Bae Kim†, Jeong-Min Lee†, Dougyong Sung, Ji-Hoon Ahn* , Woo-Hee Kim* 

87 “Optimization method for conductance modulation in ferroelectric transistor for a neuromorphic computing"

Advanced Electronic Materials, 10(5) 2300698 (2024). [link]

Cheol Jun Kim, Jae Yeob Lee, Minkyung Ku, Tae Hoon Kim, Taehee Noh, Seung Won Lee,  Ji-Hoon Ahn, Bo Soo Kang 

86 “Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability"

Surfaces & Interfaces, 42 Part B 103499 (2023). [link]

Seung Won Lee, Hyunchang Kim,  Ji-Hoon Ahn* 

85 “Spike optimization to improve properties of ferroelectric tunnel junction synaptic devices for neuromorphic computing system applications"

Nanomaterials, 13(19) 2704 (2023).  [link]

Jisu Byun, Wonwoo Kho, Hyunjoo Hwang, Yoomi Kang, Minjeong Kang, Taewan Noh, Hoseong Kim, Jimin Lee, Hyo-Bae Kim, Ji-Hoon Ahn, Seung-Eon Ahn* 

84 “Implementation of rutile-TiO2 thin films on TiN without post-annealing through introduction of SnO2 and its improved electrical properties"

Surfaces & Interfaces, 42 Part A 103420 (2023).  [link]

Min Ji Jeong, Seung Won Lee, Yoonchul Shin, Jeong-Hun Choi,  Ji-Hoon Ahn* 

83 “Yttrium doping effects on ferroelectricity and electric properties of as-deposited Hf1-xZrxO2 thin films via atomic layer deposition"

Nanomaterials, 13(15) 2187 (2023).  [link]

Youkyoung Oh, Seung Won Lee, Jeong-Hun Choi, Seung-Eon Ahn, Hyo-Bae Kim*,  Ji-Hoon Ahn* 

82. “Microscale spectroscopic mapping of defect evolution in large-area growth of monolayer MoS2"

Applied Surface Science, 637, 157885 (2023). [link]

Taegeon Lee, Young-Gui Yoon*, Seung Won Lee,  Ji-Hoon Ahn, Heesuk Rho* 

81. “Low-temperature growth of 2D-MoS2 thin films by plasma-enhanced atomic layer deposition using a new molybdenum precursor and applicability to gas sensors"

ACS Applied Nano Materials, 6(13) 12132-12139 (2023). [link]

Jeong-Hun Choi, Min-Ji Ha, Dong Geun Kim, Ji-Min Lee,  Ji-Hoon Ahn 

80. “High-quality SiNx thin film growth at 300 C using atomic layer deposition with hollow cathode plasma"

Journal of Materials Chemistry C, 11, 9107-9113 (2023). [link]

Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim,  Ji-Hoon Ahn, Woo-Hee Kim, Tae Joo Park 

79. “Enhanced dielectric and energy storage performances of Hf0.6Zr0.4O2 thin films by Al doping"

Ceramics International, 49(11), 18055-18060 (2023). [link]

Seung Won Lee†, Min Ji Jeong†, Youkyoung Oh, Hyo-Bae Kim, Tae-Eon Park,  Ji-Hoon Ahn 

78. “Advanced atomic layer deposition (ALD): Controlling reaction kinetics and nucleation of metal thin films using electric potential assisted ALD"

Journal of Materials Chemistry C, 11, 3743-3750 (2023). [link]

Ji Won Han†, Hyun Soo Jin†, Yoon Jeong Kim, Ji Sun Heo, Woo-Hee Kim*,  Ji-Hoon Ahn*, Tae Joo Park* 

77. “Polarization switching dynamics simulation by using the practical distribution of ferroelectric properties"

Applied Physics Letters, 122, 012901 (2023). [link]

Cheol Jun Kim, Jae Yeob Lee, Minkyung Ku, Seung Won Lee,  Ji-Hoon Ahn, Bo Soo Kang 

76. “Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method"

Journal of Materials Chemistry C, 11(4), 1298-1303 (2023). [link]

Jae Chan Park, Chang Ik Choi, Sang-Gil Lee, Seung Jo Yoo, Ji-Hyun Lee, Jae Hyuck Jang, Woo-Hee Kim,  Ji-Hoon Ahn, Jeong Hwan Kim, Tae Joo Park 

75. “Phase control of two-dimensional tin sulfide compounds deposited via atomic layer deposition"

Applied Surface Science, 612, 155887 (2023). [link]

Dong Geun Kim, Ji-Min Lee, Jeong-Hun Choi*,  Ji-Hoon Ahn*

74. “Thickness-dependent the optical and electrical properties of amorphous transparent conductive SrRuO3 thin films deposited by RF magnetron sputtering on glass substrate "

New Physics: Sae Mulli, 72(10), 754-760 (2022). [link]

Hyo Jin Bang, Hyun Min Kim, Jong Hoon Lee,  Ji-Hoon Ahn, Hong Seung Kim 

73. “Effects of Zr content and annealing on ferroelectricity of as-grown crystalline Hf1-xZrxO2 thin films using Hf[Cp(NMe2)3] and Zr[Cp(NMe2)3] precursors via atomic layer deposition"

Ceramics International, 48(17), 25661-25665 (2022). [link]

Youkyoung Oh, Hyo-Bae Kim,  Seung Won Lee, Min Ji Jeong, Tae Joo Park*,  Ji-Hoon Ahn*

72. “Rhenium oxide/sulfide binary phase flakes decorated on nanofiber support for enhanced activation of electrochemical conversion reactions"

Chemical Engineering Journal, 446(1), 136951 (2022). [link]

Ga-Yoon Kim†, Jeongbin Lee†, Yeo-Jin Rho,  Woo-Hee Kim, MinJoong Kim,  Ji-Hoon Ahn*, Won-Hee Ryu*

71. “Advanced atomic layer deposition: Ultrathin and continuous metal thin film growth and work function control using the discrete feeding method"

Nano Letters, 22(11), 4589-4595 (2022). [link]

Ji Won Han, Hyun Soo Jin, Yoon Jeong Kim, Ji-Sun Heo, Woo-Hee Kim, Ji-Hoon Ahn, Jeong Hwan Kim*, Tae Joo Park*

70. “Equivalent oxide thickness scalability of Zr-rich ZrHfO2 thin films by Al-doping "

Materials Letters, 321, 132418 (2022). [link]

Min Ji Jeong, Seung Won Lee, Hyo-Bae Kim, Youkyoung Oh, Ju Hun Lee*, Ji-Hoon Ahn*

69. “A simple strategy to realize super stable ferroelectric capacitor via interface engineering "

Advanced Materials Interfaces, 9(15), 2102528 (2022). [link]

Hyo-Bae Kim, Kyun Seong Dae, Youkyoung Oh, Seung-Won Lee, Yoseop Lee, Seung-Eon Ahn, Jae Hyuck Jang*, Ji-Hoon Ahn*

68. “Area-selective atomic layer deposition using vapor dosing of short-chain alkanethiol inhibitors on metal/dielectric surfaces"

Advanced Materials Interfaces, 9(13), 2102364 (2022).  [link]

Jeongbin Lee, Jeong-Min Lee, Ji-Hoon Ahn, Tae Joo Park*, Woo-Hee Kim*

67. “Ultralow-resistivity molybdenum-carbide thin films deposited by plasma-enhanced atomic layer deposition using a cyclopentadienyl-based precursor"

Chemistry of Materials,  34(6), 2576-2584  (2022).  [link]

Min-Ji Ha, Hyunchang Kim, Jeong-Hun Choi, Miso Kim, Woo-Hee Kim, Tae Joo Park, Bonggeun Shong*, Ji-Hoon Ahn*

66. “Highly Stable Artificial Synapses Based on Ferroelectric Tunnel Junctions for Neuromorphic Computing Applications"

Advanced Materials Technologies, 7(7), 2101323 (2022).  [link]

Sungmun Song, Woori Ham, Gyuil Park, Wonwoo Kho, Jisoo Kim, Hyunjoo Hwang, Hyo-Bae Kim, Hyunsun Song, Ji-Hoon Ahn, Seung-Eon Ahn

65. “Unveiling the origin of two distinct routes of interlayer charge transfer doping in Bi2Te3/MoS2/SiO2 heterostructure"

Applied Surface Sciences, 579, 152208 (2022).  [link]

Taegeon Lee, Jeong-Hun Choi, Ji-Hoon Ahn, Young-Gui Yoon*, Heesuk Rho*

64. “A strategy for wafer-scale crystalline MoS2 thin films with controlled morphology using pulsed metal-organic chemical vapor deposition at low temperature"

Advanced Materials Interfaces, 9(4) 2101785 (2022).  [link]

Jeong-Hun Choi, Min-Ji Ha, Jae Chan Park, Tae Joo Park, Woo-Hee Kim, Myoung-Jae Lee, Ji-Hoon Ahn*

63. “Evaluating the performance and characteristics of rutile TiO2 thin film for triboelectric nanogenerator (TENG)"

Journal of the Korean Institute of Surface Engineering, 54(6) 324-330 (2021).   [link]

Ji-Hyeon Moon, Han-Jae Kim, Hyo-Bae Kim*,  Ji-Hoon Ahn*

62. “Tunable atomic level surface functionalization of  a multi-layered graphene oxide membrane to break the permeability-selectivity trade-off in salt removal of brackish water"

Separation and Purification Technology, 274, 119047 (2021).  [link]

Tae-Nam Kim, Jieun Lee, Jeong-Hun Choi, Ji-Hoon Ahn*, Euntae Yang, Moon-Hyun Hwang, Kyu-Jung Chae*

61. “Wafer-Scale Growth of a MoS2 Monolayer via One Cycle of Atomic Layer Deposition: An Adsorbate Control Method"

Chemistry of Materials, 33(11), 4099-4105 (2021).  [link]

Dae Hyun Kim‡, Jae Chan Park‡, Jeongwoo Park, Deok-Yong Cho, Woo-Hee Kim, Bonggeun Shong*, Ji-Hoon Ahn*, Tae Joo Park*

60. “Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited via atomic layer deposition using cyclopentadienyl-based precursors without annealing"

Nanoscale, 13, 8524-8531 (2021).  [link]

Hyo-Bae Kim†, Moonyoung Jung†, Youkyoung Oh,  Seung Won Lee, Dongseok Suh*, Ji-Hoon Ahn*

59. “Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films"

Materials Letters, 291, 129554 (2021). [link]

Hyunchol Cho, Ben Nie, Ajit Dhamdhere, Yifei Meng, Monica Neuburger, Ji-Hoon Ahn, Jerry Mack, Sung-Hoon Jung, Hae-Young Kim

58. “2D materials-based membranes for hydrogen purification: Current status and future prospects"

International Journal of Hydrogen Energy, 46(20), 11389-11410 (2021). [link]

Euntae Yang, Abayomi Babatunde Alayande, Kunli Goh, Chang-Min Kim, Kyoung-Hoon Chu, Moon-Hyun Hwang, Ji-Hoon Ahn, Kyu-Jung Chae*

57. “Low-resistivity SrRuO3 thin films formed on SiO2 substrates without buffer layer by RF magnetron sputtering"

Journal of Alloys and Compounds, 857, 157627 (2021). [link]

Hyun Min Kim, Jong Hoon Lee, Ahram Yom, Han Sol Lee, Dong Geun Kim, Dong Wan Ko, Hong Seung Kim*, Ji-Hoon Ahn*

56. “Atomic layer deposited strontium niobate thin films as new high-k dielectrics"

Materials Letters, 286, 129220 (2021). [link]

Seung Won Lee, Hyo-Bae Kim, Chang-Min Kim, Se-Hun Kwon*, Ji-Hoon Ahn*

55. “Enhanced electrical properties of ZrO2-TiN based capacitors by introducing ultrathin metal oxides"

Materials Letters, 279, 128490 (2020). [link]

Dong-Kwon Lee†, Hyo-Bae Kim†, Se-Hun Kwon*, Ji-Hoon Ahn* 

54. “Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperature"

Applied Surface Science, 532, 147462 (2020). [link]

Jeong-Hun Choi, Seung Won Lee, Hyo-Bae Kim, Ji-Hoon Ahn*

53. “Growth characteristics of tin sulphides crystals by vapor transport method using SnS and sulphur powder: effect of temperature and pressure"

Micro & Nano Letters, 15(10), 693-696 (2020). [link]

Chaeeun Kim, Jun-Cheol Park, Ji-Hoon Ahn*

52. “Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity"

Thin Solid Films, 694, 137752 (2020). [link]

Eun-Jin Song, Hyunjin Jo, Se-Hun Kwon*, Ji-Hoon Ahn*, Jung-Dae Kwon*

51. “Understanding tunneling electroresistance effect through potential profile in Pt/Hf0.5Zr0.5O2/TiN ferroelectric tunnel junction memory"

Applied Physic Letters, 115, 153502(2019). [link]

Jungkyu Yoon, Seunghyeon Hong, Yong Won Song, Ji-Hoon Ahn, Seung-Eon Ahn*

50. “Highly transparent and conductive oxide-metal-oxide electrodes optimized at the percolation thickness of AgOx for transparent silicon thin-film solar cells"

Solar Energy Materials and Solar Cells, 202, 110131, (2019). [link] 

Hyunjin Jo, Jo-Hwa Yang, Soo-Won Choi, Jaeho Park, Eun Jin Song, Myunhun Shin*, Ji-Hoon Ahn*, Jung-Dae Kwon*

49. “Improved electrical performance of a sol-gel IGZO transistor with high-k Al2O3 gate dielectric achieved by post annealing"

Nano Convergence, 6, 24, (2019). [link] 

Esther Lee, Tae Hyeon Kim, Seung Won Lee, Jee Hoon Kim, Jaeun Kim, Tae Gun Jeong, Ji-Hoon Ahn, Byungjin Cho*

48. “Modulation of crystal structure and electrical properties of Hf0.6Zr0.4O2 thin films by Al-doping"

Materials Letters, 252, 56-59 (2019). [link]  

Seung Won Lee, Chang-Min Kim, Jeong-Hun Choi, Cheol-Min Hyun, Ji-Hoon Ahn* 

47. “Synthesis of Bi2Te3 single crystals with lateral size up to tens of micrometers by vapor transport and its potential for thermoelectric applications"

Crystal Growth & Design, 19(4), 2024-2029 (2019) [link]

Cheol-Min Hyun, Jeong-Hun Choi, Seung Won Lee, Seung-Young Seo, Myoung-Jae Lee*, Se-Hun Kwon, Ji-Hoon Ahn*

46. “Comparative study of the electrical characteristics of ALD-ZnO thin films using H2O and H2O2 as the oxidants"

Journal of the American Ceramic Society, 102(10), 5881-5889, (2019) [link]

Woo-Jae Lee, Susanta Bera, Zhixin Wan, Wei Dai, Jong-Seong Bae, Tae Eun Hong, Kwang-Ho Kim*, Ji-Hoon Ahn*, Se-Hun Kwon*

45. “Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition"

Materials Letters, 246, 1-4 (2019). [link]  

Dong-Kwon Lee, Se-Hun Kwon*, Ji-Hoon Ahn* 

44. “Characteristics of copper microsphere grown by mixed-source hydride vapor phase epitaxy"

New Physics: Sae Mulli, 68(10), 1052-1058 (2018). [link] 

Kyoung Hwa Kim, Ji-Hoon Ahn, Hyung Soo Ahn*, Min Yang, Sam Nyung Yi, Injun Jeon, Chae Ryong Cho, Hunsoo Jeon, Jae Hak Lee, Hyo Suk Lee, Suck-Whan Kim*

43. “Low power switching characteristics of CNT field effect transistor device with Al-doped ZrHfO2 gate dielectric"

Journal of Nanomaterials, 2156895 (2018). [link] 

Seyoung Oh†, Seung Won Lee†, Dongjun Kim, Jeong-Hun Choi, Hong-Chul Chae, Sung Mook Choi, Ji-Hoon Ahn*, Byungjin Cho*

42. “Fabrication of microholes in silicon wafers by wet-chemical etching"

New Physics: Sae Mulli,  68(8), 834-838 (2018). [link] 

Ha Young Lee, Ji-Yeon Noh, Min Sub Kwak, Kyung-Won Lim, Hyung Soo Ahn, Ji-Hoon Ahn, Sam Nyung Yi*, Jungho Ryu*

41. “The correlation between the preferred orientation and Al distribution of Al-doped HfO2 films by plasma-enhanced atomic layer deposition"

Nanoscience and Nanotechnology Letters, 10, 747-753 (2018). [link] 

Da-Young Kim, Jaeho Jang, Bo-Ra Kim, Byung Jun Kim, Hyoung Chan Kim, Daekwon Joo, Pan-Kwi Park, Jin Hyock Kim, Ji-Hoon Ahn, Dong-Ok Shin, Daegeun Nam, Hyoung-Seok Moon*, Se-Hun Kwon*

40. “Silicon atomic layer etching by two-step plasma process consisting of oxidation and modification to form (NH4)2SiF6, and its sublimation"

Japanese Journal of Applied Physics, 57(10), 106505 (2018). [link]

Eun-Jin Song, Ji-Hye Kim, Jung-Dae Kwon*, Se-Hun Kwon*, Ji-Hoon Ahn* 

39. “Synthesis mechanism of MoS2 layered crystals by chemical vapor deposition using MoO3 and sulfur powders"

Journal of Alloys and Compounds, 756, 380-384 (2018). [link] 

Cheol-Min Hyun, Jeong-Hun Choi, Seung Won Lee, Jeong Hwa Park, Kang Taek Lee, Ji-Hoon Ahn* 

38. “Transparent bifacial a-Si:H solar cells with improved transparency employing silver oxide embedded transparent electrodes"

Solar Energy, 170, 940-946 (2018). [link] 

Hyunjin Jo, Jo-Hwa Yang, Ji-hoon Lee, Jung-Wook Lim, Jaesung Lee, Myunhun Shin*, Jung-Dae Kwon*, Ji-Hoon Ahn*

37. “Self-formed channel devices based on vertically grown two-dimensional materials with large-surface-area and their potential for chemical sensor applications"

Small, 14, 1704116 (2018) [link] 

Chaeeun Kim†, Jun-Cheol Park†, Sun Young Choi, Yonghun Kim, Seung-Young Seo, Tae-Eon Park, Se-Hun Kwon, Byungjin Cho*, Ji-Hoon Ahn*

36. “Wafer-scale synthesis of reliable high-mobility molybdenum disulfide thin films via inhibitor-utilizing atomic layer deposition"

Advanced Materials, 29, 1703031 (2017). (Selected as a Front Cover: December 20, 2017) [link] 

Woojin Jeon, Yeonchoo Cho, Sanghyun Jo, Ji-Hoon Ahn*, Seong-Jun Jeong*

35. “A hybrid gate dielectrics of ion gel dielectrics with ultra-thin passivation layer for high-performance transistor based on two-dimensional semiconductor channels"

Scientific Reports, 7, 14194 (2017). [link]

Hyunjin Jo†, Jeong-Hun Choi†, Cheol-Min Hyun†, Seung-Young Seo, Da Young Kim, Chang-Min Kim, Myoung-Jae Lee, Jung-Dae Kwon, Hyoung-Seok Moon, Se-Hun Kwon*, Ji-Hoon Ahn*

34. “Thermoelectric elastomer fabricated using CNT and nonconducting polymer"

Japanese Journal of Applied Physics,  56(9), 095101 (2017). [link]

Jeong-Hun Choi†, Cheol-Min Hyun†, Hyunjin Jo, Ji Hee Son, Ji Eun Lee, Ji-Hoon Ahn*

33. “Photo-thermoelectric properties of SnS nanocrystal with orthorhombic layered structure"

Applied Physics Letters, 111(1), 103104 (2017). [link]

Cheol-Min Hyun†, Jeong-Hun Choi†, Myoung Jae Lee, Ji-Hoon Ahn*

32. “Silicon oxide film deposited at room temperature using high-working-pressure plasma-enhanced chemical vapor deposition: effect of O2 flow rate"

Ceramics International, 43(13), 10628-10631 (2017). [link]

Young-Soo Lee, Seung-Hwan Lee, Jung-Dae, Kwon*, Ji-Hoon Ahn*, Jin-Sung Park*

31. “Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition"

Ceramics International, 43(8), 6580-6584 (2017). [link]

Seung-Hwan Lee, Jung-Dae, Kwon*, Ji-Hoon Ahn*, Jin-Sung Park*

30. “Vapor Phase Synthesis of TaS2 Nanocrystals with Iodine as Transport Agent"

Japanese Journal of Applied Physics, 56(4), 045501 (2017). [link]

Gangtae Jin†, Chaeeun Kim†, Hyunjin Jo†, Se-Hun Kwon, Seong-Jun Jeong, Han-Bo-Ram Lee*, Ji-Hoon Ahn*

29. “Frank-van der Merwe Growth vs. Volmer-Weber Growth in Successive Stacking of Bi2Te3/Sb2Te3 Few-layers by van der Waals Heteroepitaxy: The Critical Roles of  Finite Lattice-   

        Mismatch with Seed Substrates"

Advanced Electronic Materials, 3, 1600375 (2017). [link]

Hoseok Heo, Ji Ho Sung, Ji-Hoon Ahn, Fereshte Ghahari, Takashi Taniguchi, Kenji Watanabe, Philip Kim, Moon-Ho Jo*

28. “Depletion Effect of Polycrystalline-Silicon Gate Electrode by Phosphorus Deactivation"

Solid-State Electronics, 127, 1-4 (2017). [link]

Woojin Jeon, Ji-Hoon Ahn*

27. “Vapor Transport Synthesis of Two-dimensional SnS2 Nanocrystals Using a SnS2 Precursor Obtained from the Sulfurization of SnO2"

Crystal Growth & Design, 16(7), 3884-3889 (2016). [link]

Jun Cheol Park†, Kyoung Ryun Lee†, Hoseok Heo, Se-Hun Kwon, Jung-Dae Kwon, Myoung-Jae Lee, Woojin Jeon, Seong-Jun Jeong*, Ji-Hoon Ahn*

26. “Thermoelectric Materials by Utilizing Two-Dimensional Materials with Negative Correlation between Electrical and Thermal Conductivity”

Nature Communications, 7, 12011 (2016). [link]

Myoung Jae Lee†, Ji-Hoon Ahn†, Ji Ho Sung, Hoseok Heo, Seong Gi Jeon, Woo Lee, Jae Yong Song, Ki-Ha Hong, Byeongdae Choi, Sung-Hoon Lee, Moon-Ho Jo*

25. “First-Principles Study of Carbon Impurity Effects in the Pseudo-Hexagonal Ta2O5"

Current Applied Physics, 16(6), 638-643 (2016). [link]

Ja-Yong Kim, Blanka Magyary-Köpe, Yoshio Nishi, Ji-Hoon Ahn*

24. “Transparent Photovoltaic Device using Two-dimensional Transition Metal Dichalcogenides"

Journal of  Korean Institute of Surface Engineering, 49(2), 186-190 (2016). [link]

Tae-Hun Jwa†,Chul-Min Hyun†, Min-Sik Kim, Hyeok-ju Lee, Ji-Hoon Ahn*

23. “Plasma-Enhanced Atomic Layer Deposition of SnO2 Thin Films using SnCl4 and O2 Plasma”

Materials Letters, 166(1), 163-166 (2016). [link] 

Dong Kwon Lee, Zhixin Wan, Jong-Seong Bae, Han-Bo-Ram Lee, Ji-Hoon Ahn, Sang-Deok Kim, Jayong Kim, Se-Hun Kwon*

22. “Effect of annealing conditions on the formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films”

Microelectronic Engineering, 149, 62-65 (2016). [link]

Ji-Hoon Ahn*, Ja-Yong Kim

21. “Sub-0.5nm Equivalent Oxide Thickness Scaling for Si-doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode”

ACS applied materials & interfaces, 7(28), 15587-15592 (2015). [link] 

Ji-Hoon Ahn*,  Se-Hun Kwon*

20. “Enhanced Electrical Properties of Hf-Aluminate Thin Films by Crystal Structure Modulation”

Materials Letters, 157, 215-218 (2015). [link] 

Ji-Hoon Ahn*, Myoung Jae Lee*

19. “Deterministic Two-Dimensional Polymorphism Growth of Hexagonal n-type SnS2 and Orthorhombic p-type SnS Crystals”

Nano Letters, 15(6), 3703-3708 (2015). [link]

Ji-Hoon Ahn, Myoung Jae Lee, Hoseok Heo, Ji Ho Sung, Kyungwook Kim, Hyein Hwang, Moon-Ho Jo* 

18. “Rotation-Misfit-Free Heteroepitaxial Stacking and Stitching Growth of Hexagonal Transition-Metal Dichalcogenide Monolayers by Nucleation 

       Kinetics Controls”

Advanced Materials, 27(25), 3803-3810 (2015). (Selected as a Inside Back Cover: December 20, 2017) [link]

Hoseok Heo, Ji Ho Sung, Gangtae Jin, Ji-Hoon Ahn, Kyungwook Kim, Myoung Jae Lee, Soonyoung Cha, Hyunyong Choi, Moon-Ho Jo*

17. “Interlayer Orientation Dependent Light Absorption and Emission in Monolayer Semiconductor Stacks”

      Nature Communications, 6, 7372 (2015). [link]

Hoseok Heo, Ji Ho Sung, Soonyoung Cha, Bo-Gyu Jang, Joo-Youn Kim, Gangtae Jin, Donghun Lee, Ji-Hoon Ahn, Myoung Jae Lee, Ji Hoon Shim, 

Hyunyong Choi, Moon-Ho Jo*

16. “Abnormally enhanced dielectric constant in ZrO2/Ta2O5 multi-laminate structures by metallic Ta formation”

Materials Letters, 154, 148-151 (2015). [link]

Hyunchol Cho, Kyung-Woong Park, Cheol Hwan Park, Ho Jin Cho, Seung-Jin Yeom, Kwon Hong, Noh-Jung Kwak,  Ji-Hoon Ahn* 

15. “Effect of Al2O3 Insertion on the Electrical Properties of SrTiO3 Thin Film: A Comparison Between Al2O3-doped SrTiO3 and

      SrTiO3/Al2O3/SrTiO3 sandwich structure”

Materials Research Bulletin, 64, 1-5 (2015). [link]

Ji-Hoon Ahn, Ja-Yong Kim, Seong-Jun Jeong, Se-Hun Kwon* 

14. “Investigation of Strong Metallic Ta Reduction in ZrO2/Ta2O5 Multi-Laminate Layer Growth”

ECS Transactions, 61(2), 21-25 (2014) [link]

Hyunchol Cho, Kyung-Woong Park, Ji-hoon Ahn, C H Park, H J Cho, S J Yeon, K Hong, N J Kwak 

13. “Multifunctional Ru-AlN Heating Resistor Films for High Efficiency Inkjet Printhead”

Journal of Electroceramics, 32, 240-245 (2014). [link]

Woo-Chang Choi, Zhixin Wan, Ji-Hoon Ahn, Doo-In Kim, Seung-Yong Shin, Kyung-Il Moon, Jin-Seong Park*, Jung-Dae Kwon*,Se-Hun Kwon* 

12. “Impact of Transparent Electrode on Photoresponse of ZnO-based Phototransistor”

Applied Physics Letters, 103, 251111 (2013). [link]

Seunghyup Lee, Seung-Eon Ahn*, Yongwoo Jeon, Ji-Hoon Ahn, Ihun Song, Sanghun Jeon, Dong-Jin Yun, Jungwoo Kim, Hyung Choi, U-in Chung, Jaechul Park

11. “Temperature Dependence of Photocurrent in an Amorphous GaInZnO/InZnO Thin Film Transistor”

Applied Physics Letters, 103, 173515 (2013). [link]

Ji-Hoon Ahn*, Seung-Eon Ahn*, Yongwoo Jeon, Seunghyup Lee, Ihun Song, Jungwoo Kim, Hyung Choi, U-in Chung 

10. “Ru Films from Bis(ethylcyclopentadienyl) ruthenium Using Ozone as a Reactant by Atomic Layer Deposition for Capacitor Electrodes”

Journal of Electrochemical Society, 159(6), H560-H564 (2012). [link]

Ja-Yong Kim, Deok-Sin Kil, Jin-Hyock Kim, Se-hun Kwon, Ji-Hoon Ahn, Jae-Sung Roh, Sung-Ki Park 

9. “Thermal stability of RuO2 thin films prepared by modified atomic layer deposition”

Current Applied Physics, 12, S160-S136 (2012). [link] 

Jin-Hyock Kim, Ji-Hoon Ahn, Sang-Won Kang, Jae-Sung Roh, Se-hun Kwon*,  Ja-Yong Kim* 

8. “Theoretical Simulation of Surface Evolution using Random Deposition and Surface Relaxation for Metal Oxide Thin Film in Atomic Layer Deposition”

Journal of Material Science Technology, 26(4), 371-374 (2010). [link]

Ji-Hoon Ahn, Se-hun Kwon*, Jin-Hyock Kim, Ja-Yong Kim, Sang-Won Kang 

7. “Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition”

Electrochemical and Solid-State Letters, 12(2), G5-G8 (2009) [link]

Ji-Hoon Ahn, Ja-Yong Kim, Jin-Hyock Kim, Jae-Sung Roh, Sang-Won Kang*

6. “Dielectric Properties of SrTiO3 Thin Films on SrRuO3 Seed Prepared by Plasma-Enhanced Atomic Layer Deposition”

ECS Transactions, 16(5), 335-339 (2008) [link]

Ji-Hoon Ahn, Ja-Yong Kim, Jin-Hyock Kim, Jae-Sung Roh, Sang-Won Kang

5. “Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition”

Journal of Electrochemical Society, 155(10), G185-G188 (2008). [link]

Ji-Hoon Ahn, Sang-Won Kang*, Ja-Yong Kim, Jin-Hyock Kim, Jae-Sung Roh

4. “Applicability of Step Coverage Modeling to TiO2 Thin Films in Atomic Layer Deposition”

Journal of Electrochemical Society, 154(12), H1008-H1013, (2007). [link]

Ja-Yong Kim, Jin-Hyock Kim, Ji-Hoon Ahn, Pan-Kwi Park, Sang-Won Kang* 

3. “Effect of Crystallinity and Nonstoichiometric Region on Dielectric Properties of SrTiO3 Films Formed on Ru”

Applied Physics Letters, 91, 092910 (2007). [link]

Ja-Yong Kim, Ji-Hoon Ahn, Jin-Hyock Kim, Jae-Sung Roh, Sang-Won Kang*

2. “Increment of Dielectric Properties of SrTiO3 Thin Films by SrO Interlayer on Ru Bottom Electrodes”

Applied Physics Letters, 91, 062910 (2007). [link]

Ji-Hoon Ahn*, Ja-Yong Kim, Sang-Won Kang*, Jin-Hyock Kim, Jae-Sung Roh 

1. “Step Coverage Modeling of Thin Films in Atomic Layer Deposition"

Journal of Applied Physics, 101, 073502 (2007). [link]

Ja-Yong Kim, Jin-Hyock Kim, Ji-Hoon Ahn , Sang-Won Kang*