Specialties

· Metrology and Semiconductor Processes:

· Transmission electronic microscopes. (Titan and Tecnai)

· X-ray diffraction measurement system (PANalytical, Inc)

· Atomic force microscopy (Veeco)

· Field-Emission Scanning Electron Microscope (Hitachi)

· E-beam lithography (Leica)

· Optical lithography

· Deposition system (e-beam, thermal, PLD, sputtering)

· Annealing system (RTP)

· Focus ion beam

· Nanoimprint

· Reactive ion etching system

· Optical Systems:

· Ultrafast laser ( Ti-sapphire ) system with optical parametric amplifier (primary user/operator)

· Surface plasmon resonance ( SPR ) measurement

· Fiber/waveguide optics

· Z-scan nonlinear measurement

· Raman spectrometer with triple monochrometer (Jobin Yvon HORIBA T64000)

· Near-field scanning optical microscopy (NSOM )

· Spectral ellipsometer. ( J.A. Woollam ‘VASE’ )

· Computer Skills: proficient in Matlab, Labview, and C/C++, COMSOL