Deposit epitaxial thin films, heterostructures, multilayers, superlattices, and nanocomposite films with  desired properties including superconductivity, ferroelectricity, piezoelectricity, and ferromagnetism.

Capabilities  include:

• Over 500 ceramic targets of oxides, metals, other compounds.

• Four pulsed-laser deposition systems for thin film growth.

• One PLD chamber designed for actinide thin film synthesis.

• Reflection high-energy electron diffraction (RHEED) for in-situ growth monitoring.

• Combinatorial high throughput thin film synthesis.

• Five PLD chambers for different materials

Capabilities include:

• Powder diffraction.

• Thin film metrology (Phi scan, Omega scan, Pole Figure, Reciprocal Space Map, etc.).

• In-plane diffraction (for ultrathin films).

• Domed Cooling/heating Stage for Four-Circle Goniometers (Temperature range from -180 °C to +500 °C).

• High resolution and high speed 2D detector.

• Automated instrument control and measurements.

Capabilities include: 

• Sample environment controls include fields up to ±9 T and a temperature range of 1.9–400 K.

• Expandable design makes the PPMS the most versatile system of its kind.

DC resistance; van der Pauw — Hall Transport 

Vibrating Sample Magnetometer (VSM); AC Susceptibility (ACMS II)

Heat Capacity 

Multi-Function Probes

Characterization equipment for electronic devices in controlled environments and temperature (light pulse, gas flow, temperature, etc) allows users to investigate electronic devices for different functional applications, including memory storage and neuromorphic computing.

• Suitable materials include dielectric, ferroelectric, insulating, and semiconducting thin films and devices.

• Test ferroelectric and dielectric thin films and capacitors at different temperatures for current voltage (I-V), polarization voltage (P-E), capacitance voltage (C-V), capacitance frequency (C-f), etc.

• Temperature stage (-195oC–600oC).

The MJB4 is widely used for MEMS and optoelectronics applications, such as LED production. It can be specifically configured for nonstandard substrates such as hybrids and high-frequency components for fragile III-V materials. 

The double-tilt Fusion Select TEM holder is designed for in-situ biasing and heating experiments in TEM for high solution imaging. 

Tripod Polisher 

Dimple Grinder

M-Prep 5x™ Grinder/Polisher

Ion milling (shared)

Furnace

Hydraulic Pellet Press

Powder Pressing Die Set, etc

nanofab

TEM (Titan, Spectra, etc)

FIB etc.