Peer-reviewed publications

Representative publications

Full list of publications

under review 

112. S. Kwon, B. Shong*

Chemical Mechanism for Nucleation Enhancement in Atomic Layer Deposition of Pt by Surface Functionalization


111. M. Kim, B. Shong*

Dimerization equilibrium of group 13 precursors for vapor deposition of thin films


110. H. Cho, C. Yoo*, B. Shong*

Influence of Ge Precursors toward Atomic Layer Deposition of Germanium Tellurides


109. J. Kim, B. Shong*

Adsorption mechanism of hexachlorodisilane for low-temperature atomic layer deposition of silicon nitride


108. H. Eom, S. Lee, Y. Choi, B. Shong*

Adsorption of trimethylaluminum on period 4 and 5 transition metal surfaces


107. J.S. Lim, S.E. Lee, B. Shong, Y.-K. Park, H.-S. Lee* 

Valorization of Cocoa Bean Shell Residue from Supercritical Fluid Extraction through Hydrothermal Carbonization for Hydrochar Production


106. J. Lim, A.T. Hoang, Z. Li, T.T. Ngoc Van, J.-I. Lee, K. Lee, N. Gauriot, T. Taniguchi, K. Watanabe, B. Shong, K. Kim, J.-H. Ahn*, M. Chhowalla*, A. Rao*

Dual-step chemical treatment of wafer-scale MOCVD grown monolayer molybdenum disulfides


105. J.C. Park+, C.I. Choi+, H. Jang, S. Yun, T.T. Ngoc Van, W.-H. Kim, J.-H. Ahn, B. Shong*, T.J. Park*

High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor

2025 (1)

104. S.E. Lee, J.S. Lim, Y.-K. Park, B. Shong, H.-S. Lee* 

Utilizing cocoa bean husk residues from supercritical extraction for biofuel production through hydrothermal liquefaction

The Journal of Supercritical Fluids, 2025, 215, 106416 

http://doi.org/10.1016/j.supflu.2024.106416 

2024 (13)

103. I. Cho, B. Shong*

Exchange reactions during atomic layer deposition of ternary group 13 oxides and nitrides

ACS Applied Electronic Materials

http://doi.org/10.1021/acsaelm.4c01346


102. E.-H. Cho+, D. Kong+, I. Cho+, Y. Leem, Y.M. Lee, M. Kim, C.T. Nguyen, J.Y. Lee, B. Shong*, H.-B.-R. Lee*

Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation 

Chemistry of Materials, 2024, 36 (18), 8663–8672 

http://doi.org/10.1021/acs.chemmater.4c01133 


101. J.S. Lim, S.E. Lee, S.J. Kim, B. Shong, Y.-K. Park, H. Lee*

Optimization Study to Minimize Trigonelline and Chlorogenic acid Loss in the Coffee Decaffeination Process through Supercritical Fluid Extraction

Clean Technology, 2024, 30 (3), 203–210 

http://doi.org/10.7464/ksct.2024.30.3.203 


100. M. Kim, S. Kim, B. Shong*

Adsorption of dimethylaluminum isopropoxide (DMAI) on the Al2O3 surface: A machine-learning potential study 

Journal of Science: Advanced Materials and Devices, 2024, 9 (3), 100754 

http://doi.org/10.1016/j.jsamd.2024.100754 


99. S.H. Yoon+, J.H. Cho+, I. Cho+, M.J. Kim, J.S. Hur, S.W. Bang, H.J. Lee, J.U. Bae, J. Kim, B. Shong*, J.K, Jeong*

Tailoring Subthreshold Swing in a-IGZO Thin-Film Transistors for AMOLED Displays: Impact of Conversion Mechanism on PEALD Deposition Sequences

Small Methods, 2024, 8 (8), 2301185 

http://doi.org/10.1002/smtd.202301185 


98. J. Lee, J. Oh, J. Kim, H. Oh, B. Shong*, W.-H. Kim*

Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces

Applied Surface Science, 2024, 662, 160099

http://doi.org/10.1016/j.apsusc.2024.160099 


97. T.T. Ngoc Van, B. Shong* 

Surface chemical reactions during atomic layer deposition of zinc oxynitride (ZnON)

Electronic Materials Letters, 2024, 20 (4), 500–507 

http://doi.org/10.1007/s13391-023-00467-8


96. J. Park+, I. Cho+, H. Jeon+, Y. Lee, J. Zhang, D. Lee, M.K. Cho, D.J. Preston, B. Shong*, I.S. Kim*, W.-K. Lee* 

Conversion of Layered WS2 Crystals into Mixed-Domain Electrochemical Catalysts by Plasma-Assisted Surface Reconstruction 

Advanced Materials, 2024, 36 (25), 2314031 

http://doi.org/10.1002/adma.202314031


95. M. Kim, H. Eom, S.H. Lee, J. Kim, S. Kwon, B. Shong*

Theoretical Design Strategies for Area-Selective Atomic Layer Deposition

Chemistry of Materials, 2024, 36 (11), 5313-5324 

http://doi.org/10.1021/acs.chemmater.3c03326


94. M.Kim, H. Oh, B Shong*

Effect of chain length of α,ω-bifunctional molecules toward atomic layer deposition and molecular layer deposition 

Materials Chemistry and Physics, 2024, 318, 129273 

http://doi.org/10.1016/j.matchemphys.2024.129273


93. H. Eom, W. Bae, J.Y. Sung, J.H. Choi, K.S. Dae, J.H. Jang, T.J. Park, S.W. Lee, B. Shong*

Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminum 

APL Materials, 2024, 12, 031115 

http://doi.org/10.1063/5.0198197


92. J. Kim+, C. Yeon+, D.-H. Cho, J. Jung*, B. Shong*

Enhancement of conformality of silicon nitride thin films by ABC-type atomic layer deposition 

Advanced Electronic Materials, 2024, 10 (3), 2300722 

http://doi.org/10.1002/aelm.202300722


91. T.T. Ngoc Van+, C. Kim+, H. Lee, J. Kim*, B. Shong*

Machine learning-based exploration of molecular design descriptor for area-selective atomic layer deposition (AS-ALD) precursors

Journal of Molecular Modeling, 2024, 30, 10 

http://doi.org/10.1007/s00894-023-05806-y 

2023 (13) 

90. A.T. Hoang+, L. Hu+, B.J. Kim+, T.T. Ngoc Van, K.D. Park, Y. Jeong, K. Lee, S. Ji, J. Hong, A.K. Katiyar, B. Shong, K. Kim, S. Im, W.J. Chung, J.-H. Ahn*

Low-temperature growth of MoS2 on polymer and thin glass substrates for flexible electronics 

Nature Nanotechnology, 2013, 18 (12), 1439–1447 

http://doi.org/10.1038/s41565-023-01460-w 


89. H. Kim+, M. Kim+, B. Kim, B. Shong*

Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride 

Journal of Vacuum Science and Technology A, 2023, 41 (6), 063409 

http://doi.org/10.1116/6.0002966 


88. J. Lee, S.H. Lee, B. Shong*

Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H2S 

Journal of Vacuum Science and Technology A, 2023, 41 (6), 062405 

http://doi.org/10.1116/6.0003041 


87. Y. Lee+, S.-H. Lee+, S.K. Han+, J. Park, D. Lee, D.J. Preston, I.S. Kim, M.C. Hersam, Y. Kwon*, B. Shong*, W.-K. Lee*

Strain-enabled local phase control in layered MoTe2 for enhanced electrocatalytic hydrogen evolution

ACS Energy Letters, 2023, 8 (11), 4716–4725 

http://doi.org/10.1021/acsenergylett.3c01941


86. H.Y. Lee+, J.S. Hur+, I. Cho, C.H. Choi, S.H. Yoon, Y. Kwon, B. Shong*, J.K. Jeong*

Comparative Study on Indium Precursors for Plasma-Enhanced Atomic Layer Deposition of In2O3 and Application to High-Performance Field-Effect Transistors 

ACS Applied Materials & Interfaces, 2023, 15 (44), 51399-51410 

http://doi.org/10.1021/acsami.3c11796


85. N.K. Yu, J.-M. Lee, W.-H. Kim*, B. Shong* 

Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions

Applied Surface Science, 636, 157864 

http://doi.org/10.1016/j.apsusc.2023.157864


84. C. Kim, N. Hur, J. Yang, S. Oh, J. Yeo, H.Y. Jeong*, B. Shong*, J. Suh*

Atomic layer deposition route to scalable, electronic-grade van der Waals Te thin films 

ACS Nano, 2023, 17 (16), 15776–15786 

http://doi.org/10.1021/acsnano.3c03559


83. M. Kim, E. Shin, H. Song, Y. Nam, D. Kim, J.-H. Hwang*, B. Shong*

Rational molecular design for non-aqueous atomic layer deposition of zinc oxide

Chemistry of Materials, 2023, 35 (12), 4669-4679 

http://doi.org/10.1021/acs.chemmater.3c00143 


82. C. Ahn, J.H. Jung, J.J. Kim, D.-C. Lee*, B. Shong*

Adsorption and surface diffusion of atomic Ru on TiN and SiO2: A first-principles study 

Coatings, 2023, 13 (6), 1020 

http://doi.org/10.3390/coatings13061020 


81. J. Hyun, H. Kim, B. Shong, Y.-S. Min*

Pyridine-Catalyzed Atomic Layer Deposition of SiO2 from Hexachlorodisilane and Water: In-Situ Mechanistic Study

Chemistry of Materials, 2023, 35 (10), 4100–4108 

http://doi.org/10.1021/acs.chemmater.3c00621


80. N.K. Yu, K. Kim, C. Heo, J. Lee, W. Kim, S.-W. Chung*, B. Shong* 

Thermal decomposition pathways of chlorinated trisilanes

Silicon, 2023, 15 (7), 3193–3199 

http://doi.org/10.1007/s12633-022-02248-8


79. J.H. Jung, H. Oh, B. Shong*

Fluorination of TiN, TiO2, and SiO2 surfaces by HF toward selective atomic layer etching (ALE)

Coatings, 2023, 13 (2), 387 

http://doi.org/10.3390/coatings13020387 


78. H.-I. Yeom, J. Kim, G.-J. Jeon, J. Park, D.U. Han, J.H. Kim, K.M. Kim, B. Shong, S.-H.K Park* 

High Performance Oxide Thin-Film Diode and its Conduction Mechanism Based on ALD-assisted Interface Engineering 

Journal of Materials Chemistry C, 2023, 11 (4), 1336–1345 

http://doi.org/10.1039/D2TC03751C 

2022 (9)

77. N.H. Le, T.T. Ngoc Van, B. Shong, J. Cho* 

Low temperature glycolysis of polyethylene terephthalate 

ACS Sustainable Chemistry & Engineering, 2022, 10 (51), 17261–17273 

http://doi.org/10.1021/acssuschemeng.2c05570 


76. C.T. Nguyen, E.-H. Cho, B. Gu, S. Lee, H.-S. Kim, J. Park, N.-K. Yu, S. Shin, B. Shong, J.Y. Lee, H.-B.-R. Lee*

Gradient Area-Selective Deposition for Seamless Gap-filling in 3D Nanostructures through Surface Chemical Reactivity Control 

Nature Communications, 2022, 13 (1), 7597 

http://doi.org/10.1038/s41467-022-35428-6 


75. S. Lee, G. Baek, H. Yang, T.T. Ngoc Van, S.-W. Kim, Y.-K. Kim, B. Shong*, J.-S. Park*

Thermally annealed molecular layer-deposited indicone: Structural analysis and area selective deposition application

Advanced Materials Interfaces, 2022, 9 (32), 2201411 

http://doi.org/10.1002/admi.202201411 


74. T.T. Ngoc Van, D. Jang, E.A. Jung, H. Noh, J. Moon, D.-S. Kil, S.-W. Chung*, B. Shong*

Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition 

The Journal of Physical Chemistry C, 2022, 126 (42), 18090–18099 

http://doi.org/10.1021/acs.jpcc.2c04425 


73. J.-M. Lee+, J. Lee+, H. Oh, J. Kim, B. Shong*, T.J. Park*, W.-H. Kim*

Inhibitor-free Area-Selective Atomic Layer Deposition of SiO2 through Chemoselective Adsorption of an Aminodisilane Precursor on Oxide versus Nitride Substrates 

Applied Surface Science, 2022, 589, 152939 

http://doi.org/10.1016/j.apsusc.2022.152939


72. M.-J. Ha, H. Kim, J.-H. Choi, M. Kim, W.-H. Kim, T.J. Park, B Shong*, J.-H. Ahn*

Ultra-low Resistivity Molybdenum Carbide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition Using a Cyclopentadienyl-based Precursor

Chemistry of Materials, 2022, 34 (6), 2576–2584 

http://doi.org/10.1021/acs.chemmater.1c03607


71. T.K. Yun, Y. Lee, M.J. Kim, J. Park, D. Kang, S. Kim, Y.J. Choi, Y. Yi, B. Shong, J.H. Cho, K. Kim*

Commensurate assembly of C60 on black phosphorus for mixed-dimensional van der Waals transistors 

Small, 2022, 18 (10), 2105916 

http://doi.org/10.1002/smll.202105916


70. N.-Y. Park+, M. Kim+, Y.-H. Kim, R. Ramesh, D.K. Nandi, T. Tsugawa, T. Shigetomi, K. Suzuki, R. Harada, M. Kim, K.-S. An, B. Shong*, S.-H. Kim*

Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen

Chemistry of Materials, 2022, 34 (4), 1533-1543 

http://doi.org/10.1021/acs.chemmater.1c03142


69. A. Choi+, A.T. Hoang+, T.T. Ngoc Van, B. Shong, L. Hu, K.Y. Thai, J.-H. Ahn*

Residue-free photolithographic patterning of graphene

Chemical Engineering Journal, 429, 132504

http://doi.org/10.1016/j.cej.2021.132504

2021 (16)

68. B.G. Ko+, C.T. Nguyen+, B. Gu, M.R. Khan, K. Park, H. Oh, J. Park, B. Shong, H.-B.-R. Lee*

Growth Modulation of Atomic Layer Deposition of HfO2 by Combinations of H2O and O3 Reactants 

Dalton Transactions, 2021, 50 (48), 17935–17944 

http://doi.org/10.1039/D1DT03465K 


67. J. Park, H. Eom, S.H. Kim, T.J. Seok, T.J. Park, S.W. Lee, B. Shong* 

Chemical mechanism of formation of the two-dimensional electron gas at the Al2O3/TiO2 interface by atomic layer deposition

Materials Today Advances, 2021, 12, 100195 

http://doi.org/10.1016/j.mtadv.2021.100195 


66. Y. Lee, S. Seo, T. Nam, H. Lee, H. Yoon, S. Sun, I.-K. Oh, S. Lee, B. Shong, J.H. Seo, J.H. Seok, H. Kim*

Growth Mechanism and Electrical Properties of Tungsten Films deposited by Plasma-enhanced Atomic Layer Deposition with Chloride and Metal Organic Precursors

Applied Surface Science, 2021, 568, 150939 

http://doi.org/10.1016/j.apsusc.2021.150939 


65. N.K. Yu, C.H. Moon, J. Park, H.-B.-R. Lee*, B. Shong*

Evaluation of silicon tetrahalide precursors for low-temperature thermal atomic layer deposition of silicon nitride 

Applied Surface Science, 2021, 565, 150603 

http://doi.org/10.1016/j.apsusc.2021.150603


64. M.Z. Ansari, P. Janicek, D.K. Nandi, S. Slang, M. Bouska, H. Oh, B. Shong, S.-H. Kim*

Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor

Applied Surface Science, 2021, 565, 150152 

http://doi.org/10.1016/j.apsusc.2021.150152 


63. S. Seo+, W.J. Woo+, Y. Lee, H. Yoon, M. Kim, I.-K. Oh, S.-M. Chung, H. Kim*, B. Shong*

Reaction mechanism of non-hydrolytic atomic layer deposition of Al2O3 with a series of alcohol oxidants

The Journal of Physical Chemistry C, 2021, 125 (33), 18151–18160 

http://doi.org/10.1021/acs.jpcc.1c03518 


62. S. Lee+, M. Kim+, G. Mun, J. Ko, H.-I. Yeom, G.-H. Lee, B. Shong*, S.-H.K. Park* 

Effects of Al Precursors on the Characteristics of Indium-Aluminum Oxide Semiconductor Grown by Plasma-Enhanced Atomic Layer Deposition 

ACS Applied Materials & Interfaces, 2021, 13 (33), 40134–40144

http://doi.org/10.1021/acsami.1c11304


61. J. Lee+, J.-M. Lee+, H. Oh, C. Kim, J. Kim, D.H. Kim, B. Shong*, T.J. Park*, W.-H. Kim* 

Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide versus Nitride Selectivity 

Advanced Functional Materials, 2021, 31 (33), 2102556 

http://doi.org/10.1002/adfm.202102556


60. Y. Kotsugi, S.-M. Han, Y.-H. Kim, T. Cheon, D.K. Nandi, R. Ramesh, N.K. Yu, K. Son, T. Tsugawa, S. Ohtake, R. Harada, Y.-B. Park, B. Shong*, S.-H. Kim*

Atomic Layer Deposition of Ru for Replacing Cu-interconnects

Chemistry of Materials, 2021, 33 (14), 5639–5651

http://doi.org/10.1021/acs.chemmater.1c01054 


59. H.-M. Kim, J.-H. Lee, S.-H. Lee, R. Harada, T. Shigetomi, S. Lee, T. Tsugawa, B. Shong*, J.-S. Park* 

Area-selective atomic layer deposition of ruthenium using a novel Ru precursor and H2O as a reactant 

Chemistry of Materials, 2021, 33 (12), 4353–4361 

http://doi.org/10.1021/acs.chemmater.0c04496 


58. C.T. Nguyen, B. Gu, T. Cheon, J. Park, M.R. Khan, S.-H. Kim, B. Shong, H.-B.-R. Lee*

Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches 

Chemistry of Materials, 2021, 33 (12), 4435–4444 

http://doi.org/10.1021/acs.chemmater.1c00508 


57. D.H. Kim+, J.C. Park+, J. Park, D.-Y. Cho, W.-H. Kim, B. Shong*, J.-H. Ahn*, T.J. Park*

Wafer Scale Growth of MoS2 Monolayer via One-Cycle of Atomic Layer Deposition: Adsorbate-Controlled Method

Chemistry of Materials, 2021, 33 (11), 4099-4105 

http://doi.org/10.1021/acs.chemmater.1c00729 


56. S.S. Raya, A.S. Ansari*, B. Shong* 

Adsorption of gas molecules on graphene, silicene, and germanene: A comparative first-principles study

Surfaces and Interfaces, 2021, 101054 

http://doi.org/10.1016/j.surfin.2021.101054 


55. A.S. Ansari, J.W. Han, B. Shong* 

Intermediates for catalytic reduction of CO2 on p-block element surfaces

Journal of Industrial and Engineering Chemistry, 2021, 96, 236–242

http://doi.org/10.1016/j.jiec.2021.01.016 


54. A.T.A. Ahmed, A.S. Ansari, S.M. Pawar, B. Shong, H. Kim*, H. Im* 

Anti-corrosive FeO decorated CuCo2S4 as an efficient and durable electrocatalyst for hydrogen evolution reaction

Applied Surface Science, 2021, 539, 148229 

http://doi.org/10.1016/j.apsusc.2020.148229


53. S. Choi, A.S. Ansari, H.J. Yun, H. Kim, B, Shong*, B.J. Choi*

Growth of Al-rich AlGaN thin films by purely thermal atomic layer deposition

Journal of Alloys and Compounds, 2021, 854, 157186

http://doi.org/10.1016/j.jallcom.2020.157186 

2020 (13)

52. W.-H. Kim+, K. Shin+, B. Shong, L. Godet, S.F. Bent* 

Atomic Layer Deposition of Pt on the Surface Deactivated by Fluorocarbon Implantation: Investigation of the Growth Mechanism 

Chemistry of Materials, 2020, 32 (22), 9696–9703 

http://doi.org/10.1021/acs.chemmater.0c03372 


51. B. Shong+, A.S. Ansari+, S.F. Bent*

Thermally Activated Reactions of Phenol at the Ge(100)-2 × 1 Surface 

The Journal of Physical Chemistry C, 2020, 124 (43), 23657–23660 

http://doi.org/10.1021/acs.jpcc.0c06314 


50.  H.G. Kim, M. Kim, B. Gu, M.R. Khan, B.G. Ko, S. Yasmeen, C.S. Kim, S.-H. Kwon, J. Kim, J. Kwon, K. Jin, B. Cho, J.-S. Chun, B. Shong*, H.-B.-R. Lee*

Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 using Ethanethiol Inhibitor 

Chemistry of Materials, 2020, 32 (20), 8921–8929 

http://doi.org/10.1021/acs.chemmater.0c02798 


49. S. Lee, M. Kim, G. Baek, H.-M. Kim, T.T. Ngoc Van, D. Gwak, K. Heo, B Shong*, J.-S. Park*

Thermal Annealing of Molecular Layer Deposited Indicone Toward Area-Selective Atomic Layer Deposition 

ACS Applied Materials & Interfaces, 2020, 12 (38), 43212-43221 

http://doi.org/10.1021/acsami.0c10322 


48.   S. Lee, G. Baek, J.-H. Lee, T.T. Ngoc Van, A.S. Ansari, B. Shong*, J.-S. Park* 

Molecular layer deposition of indicone and organic-inorganic hybrid thin films as flexible transparent conductor 

Applied Surface Science, 2020, 525, 146383 

http://doi.org/10.1016/j.apsusc.2020.146383 


47. A.S. Ansari, S.S. Raya, B. Shong*

Mechanistic investigation on thermal atomic layer deposition of group 13 oxides 

The Journal of Physical Chemistry C, 2020, 124 (31), 17121-17134 

http://doi.org/10.1021/acs.jpcc.0c04872 


46. J. Park, N.K. Yu, D. Jang, E. Jung, H. Noh, J. Moon, D. Kil, B. Shong*

Adsorption of titanium halides on nitride and oxide surfaces during atomic layer deposition: a DFT study 

Coatings, 2020, 10 (8), 712 

http://doi.org/10.3390/coatings10080712 


45. S.S. Raya, A.S. Ansari*, B. Shong* 

Molecular Adsorption of NH3 and NO2 on Zr and Hf Dichalcogenides (S, Se, Te) Monolayers: A Density Functional Theory Study

Nanomaterials, 2020, 10 (6), 1215 

http://doi.org/10.3390/nano10061215 


44. J.-H. Kim, T.T. Ngoc Van, J. Oh, S.-M. Bae, S.I. Lee, B. Shong*, J.-H. Hwang* 

Plasma-Enhanced Atomic Layer Deposition of Hafnium Silicate Thin Films using Using a Single-Source Precursor 

Ceramics International, 2020, 46 (8), 10121-10129 

http://doi.org/10.1016/j.ceramint.2020.01.002 


43. J.-W. Choi+, J. Oh+, T.T. Ngoc Van, J. Kim, H. Hwang, C.G. Kim, T.-M. Chung, K.-S. An*, B. Shong*, J.-H. Hwang* 

Tin Oxysulfide Composite Thin Films Based on Atomic Layer Deposition of Tin Sulfide and Tin Oxide Using Sn(dmamp)2 as Sn Precursor 

Ceramics International, 2020, 46 (4), 5109-5118 

http://doi.org/10.1016/j.ceramint.2019.10.254 


42. S.S. Raya, A.S. Ansari, S.G. Kang, H.-B.-R. Lee*, B. Shong* 

Effect of molecular backbone structure on vapor phase coupling reaction between diiso(thio)cyanates with diamines, diols, and dithiols 

Progress in Organic Coatings, 2020, 140, 105509 

http://doi.org/10.1016/j.porgcoat.2019.105509 


41. I.-K. Oh+, W.-H. Kim+, L. Zeng, J. Singh, D. Bae, A.J.M. Mackus, J.-G. Song, S. Seo, B. Shong, H. Kim, S.F. Bent* 

Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition 

ACS Nano, 2020, 14 (2), 1757–1769 

http://doi.org/10.1021/acsnano.9b07467 


40. I.-K. Oh, L. Zeng, J.-E. Kim, J.-S. Park, K. Kim, H. Lee, S. Seo, M.R. Khan, S. Kim, C.W. Park, J. Lee, B. Shong, Z. Lee, S.F. Bent, H. Kim, J.Y. Park, H.-B.-R. Lee* 

Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation 

ACS Nano, 2020, 14 (1), 676-687 

http://doi.org/10.1021/acsnano.9b07430 

2019 (7)

39. M.Z. Ansari, D.K. Nandi, P. Janicek, S.A. Ansari, R. Ramesh, T. Cheon, B. Shong*, S.-H. Kim* 

Low-temperature atomic layer deposition of highly conformal tin nitride thin films for energy storage devices 

ACS Applied Materials & Interfaces, 2019, 11 (46), 43608-43621 

http://doi.org/10.1021/acsami.9b15790 


38.   I.-K. Oh+, J.S. Park+, M.R. Khan, K. Kim, Z. Lee, B. Shong, H.-B.-R. Lee* 

Reaction Mechanism of Atomic Layer Deposition of Pt on Various Textile Surfaces 

Chemistry of Materials, 2019, 31 (21), 8995-9002 

http://doi.org/10.1021/acs.chemmater.9b03171 


37. T.H. Kim+, D.K. Nandi+, R. Ramesh, S.-M. Han, B. Shong*, S.-H. Kim* 

Some insights into atomic layer deposition of MoNx using Mo(CO)6 and NH3 and its diffusion barrier application

Chemistry of Materials, 2019, 31 (20), 8338-8350 

http://doi.org/10.1021/acs.chemmater.9b01578  


36. T. Nam, H. Lee, S. Seo, S.M. Cho, B. Shong, H.-B.-R. Lee, H. Kim* 

Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants 

Ceramics International, 2019, 45 (15), 19105-19112 

http://doi.org/10.1016/j.ceramint.2019.06.156 


35. C.T. Nguyen, J. Yoon, R. Khan, B. Shong*, H.-B.-R. Lee* 

Thermal atomic layer deposition of metallic Ru using H2O as reactant

Applied Surface Science, 2019, 488, 896-902 

http://doi.org/10.1016/j.apsusc.2019.05.242 


34. D.H. Kim, H.J. Lee, H. Jeong, B. Shong*, W.-H. Kim*, T.J. Park* 

Thermal atomic layer deposition of device-quality SiO2 thin films under 100 °C using an aminodisilane precursor

Chemistry of Materials, 2019, 31 (15), 5502-5508 

http://doi.org/10.1021/acs.chemmater.9b01107 


33. T.T. Ngoc Van, A.S. Ansari, B. Shong*

Surface chemical reactions during atomic layer deposition of ZnO, ZnS, and Zn(O,S) 

Journal of Vacuum Science and Technology A, 2019, 37 (2), 020909 

http://doi.org/10.1116/1.5079247 

2018 (9)

32. S. Yeo+, D.K. Nandi+, R. Rahul, T.H. Kim, B. Shong, Y. Jang, J.-S. Bae, J.W. Han, S.-H. Kim*, H. Kim*

Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications

Applied Surface Science, 2018, 459, 596-605 

http://doi.org/10.1016/j.apsusc.2018.07.210


31. S. Lee, G. Baek, J.-H. Lee, D.-W. Choi, B. Shong*, J.-S. Park*

Facile fabrication of p-type Al2O3/carbon nanocomposite films using molecular layer deposition

Applied Surface Science, 2018, 458, 864-871 

http://doi.org/10.1016/j.apsusc.2018.07.158


30. R. Khan, B. Shong*, B.G. Ko, J.K. Lee, H. Lee, J.Y. Park, I.-K. Oh, S.S. Raya, H.M. Hong, K.-B. Chung, E.J. Luber, C.-H. Lee, W.-H. Kim*, H.-B.-R. Lee* 

Area-selective Atomic Layer Deposition using Si Precursors as Inhibitors 

Chemistry of Materials, 2018, 30 (21), 7603-7610 

http://doi.org/10.1021/acs.chemmater.8b02774 


29. S. Seo, T. Nam, H.-B.-R. Lee, H. Kim*, B. Shong*

Molecular oxidation of surface –CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study

Applied Surface Science, 2018, 457, 376-380 

http://doi.org/10.1016/j.apsusc.2018.06.160 


28. W. Oh, C.K. Rhee, J.W. Han, B. Shong* 

Atomic and molecular adsorption on the Bi(111) surface: Insights into catalytic CO2 reduction 

The Journal of Physical Chemistry C, 2018, 122 (40), 23084-23090 

http://doi.org/10.1021/acs.jpcc.8b07865 


27. M.-H. Ko, B. Shong*, J.-H. Hwang*

Low Temperature Atomic Layer Deposition of Nickel Sulfide and Nickel Oxide Thin Films Using Ni(dmamb)2 as Ni Precursor

Ceramics International, 2018, 44 (14), 16342-16351 

http://doi.org/10.1016/j.ceramint.2018.06.041 


26. J.K. Yoo, M. Choi, S. Yang, B. Shong, H.-S. Chung, Y. Sohn, C.K. Rhee*

Formic acid electrooxidation activity of Pt and Pt/Au catalysts: Effects of surface physical properties and irreversible adsorption of Bi

Electrochimica Acta, 2018, 273, 307-317 

http://doi.org/10.1016/j.electacta.2018.04.071 


25. E.M. Choi, J.-E. Park, G.S. Park, B. Shong, S.K. Kang, K.-s. Son*

Selective ethylene oligomerization with in-situ-generated chromium catalysts supported by trifluoromethyl-containing ligands

Journal of Polymer Science Part A: Polymer Chemistry, 2018, 56 (4), 444-450 

http://doi.org/10.1002/pola.28915 


24.  C.M. Yoon+, I.-K. Oh+, Y.-J. Lee, J.-G. Song, S.J. Lee, J.-M. Myoung, H.G. Kim, H.-S. Moon, B. Shong, H. Kim*, H.-B.-R. Lee*

Water-erasable memory device for security applications prepared by the atomic layer deposition of GeO2

Chemistry of Materials, 2018, 30 (3), 830-840 

http://doi.org/10.1021/acs.chemmater.7b04371 

2017 (7)

23.  B. Shong, J. Kachian, S.F. Bent*

Autocatalytic dissociative adsorption of imidazole on the Ge(100)-2 × 1 surface

The Journal of Physical Chemistry C, 2017, 121 (38), 20905-20910 

http://doi.org/10.1021/acs.jpcc.7b07691 


22.  J. Sheng, E.J. Park, B. Shong*, J.-S. Park*

Atomic layer deposition of an indium gallium oxide thin film for thin film transistor applications

ACS Applied Materials & Interfaces, 2017, 9 (28), 23934-23940 

http://doi.org/10.1021/acsami.7b04985 


21.  B. Shong, J.S. Yoo, T.E. Sandoval, S.F. Bent*

Formation of germa-ketenimine on the Ge(100) surface by adsorption of tert-butyl isocyanide

Journal of the American Chemical Society, 2017, 139 (25), 8758-8765 

http://doi.org/10.1021/jacs.7b04755 


20.  B. Shong*

Adsorption of carbon monoxide on the Si(111)-7×7 surface

Applied Surface Science, 2017, 405, 209-214 

http://doi.org/10.1016/j.apsusc.2017.02.063 


19. J.Y. Lee, A. Kim, W.-S. Oh, B. Shong*

Computational study on vapor phase coupling reaction between diiso(thio)cyanates with diamines, diols, and dithiols

International Journal of Quantum Chemistry, 2017, 117, 7, e25341 

http://doi.org/10.1002/qua.25341 


18.  S.W. Ryu+, J. Yoon+, H.-S. Moon+, B. Shong, H. Kim, H.-B.-R. Lee* 

Atomic layer deposition of 1D and 2D nickel nanostructures on graphite

Nanotechnology, 2017, 28, 11, 115301 

http://doi.org/10.1088/1361-6528/aa5aec 


17.  Y.-S. Lee, D.-W. Choi, B. Shong, S. Oh*, J.-S. Park*

Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone

Ceramics International, 2017, 43, 2, 2095-2099 

http://doi.org/10.1016/j.ceramint.2016.10.186 

2016 (6)

16. J.H. Lee, J.G. Woo, B. Shong*

Tunable adsorption of isocyanides on group 14 (100)-2 × 1 surfaces

Applied Surface Science, 2016, 390, 968-973 

http://doi.org/10.1016/j.apsusc.2016.09.013 


15.  J. Lee+, J. Yoon+, H.G. Kim, S. Kang, W.-S. Oh, H. Algadi, S. Al-Sayari, B. Shong, S.-H. Kim, H. Kim, T. Lee*, H.-B.-R. Lee*

Highly conductive and flexible fiber for textile electronics obtained by extremely low-temperature atomic layer deposition of Pt

NPG Asia Materials, 2016, 8, e331 

http://doi.org/10.1038/am.2016.182 


14.  J.-S. Kang, K.T. Leung, M.-K. Nah, J.-S. Shin, M.-H. Kang, B. Shong, J.-G. Kang*, J. Lee, Y. Sohn*

Neighbour-sensitized near-infrared emission of new Nd(III) and Er(III) complexes with 1-(anthracene-2-yl)-4,4,4-trifluoro-1,3-butanedione

New Journal of Chemistry, 2016, 40 (11), 9702-9710 

http://doi.org/10.1039/c6nj00999a 


13.  F. Hiebel, B. Shong, W. Chen, R.J. Madix, E. Kaxiras, C.M. Friend*

Self-assembly of acetate adsorbates drives atomic rearrangement on the Au(110) surface

Nature Communications, 2016, 7, 13139 

http://doi.org/10.1038/ncomms13139 


12. B. Shong, T.R. Hellstern, S.F. Bent*

Adsorption of heterobifunctional 4-nitrophenol on the Ge(100)-2 × 1 surface

Surface Science, 2016, 650, 279-284 

http://doi.org/10.1016/j.susc.2015.04.007 


11. B. Shong, N. Shin, Y.-H. Lee, K.H. Ahn, Y.-W. Lee*

Synthesis of indium tin oxide (ITO) nanoparticles in supercritical methanol

The Journal of Supercritical Fluids, 2016, 113, 39-43 

http://doi.org/10.1016/j.supflu.2016.03.002 

2012 - 2015 (10)

10. B. Shong, T.E. Sandoval, A.M. Crow, S.F. Bent*

Unidirectional adsorption of bifunctional 1,4-phenylene diisocyanide on the Ge(100)-2 × 1 surface

The Journal of Physical Chemistry Letters, 2015, 6 (6), 1037-1041 

http://doi.org/10.1021/acs.jpclett.5b00098 


9. B. Shong, S.F. Bent*

Thermally activated reactions of nitrobenzene at the Ge(100)-2 × 1 surface

The Journal of Physical Chemistry C, 2014, 118 (50), 29224-29233 

http://doi.org/10.1021/jp505352k 


8. B. Shong, R.Y. Brogaard, T.E. Sandoval, S.F. Bent*

Coverage-dependent adsorption of bifunctional molecules: detailed insights into interactions between adsorbates

The Journal of Physical Chemistry C, 2014, 118 (41), 23811-23820 

http://doi.org/10.1021/jp507349k 


7. B. Shong, K.T. Wong, S.F. Bent*

Strong carbon-surface dative bond formation by tert-butyl isocyanide on the Ge(100)-2 × 1 surface

Journal of the American Chemical Society, 2014, 136 (16), 5848-5851 

http://doi.org/10.1021/ja500742a 


6. K.T. Wong, B. Shong, W. Sun, S.F. Bent*

Adsorption of trimethyl phosphite at the Ge(100)-2×1 surface by nucleophilic reaction

The Journal of Physical Chemistry C, 2013, 117 (50), 26628-26635 

http://doi.org/10.1021/jp408538e 


5. B. Shong, S.F. Bent*

One-Dimensional Pattern Formation of Adsorbed Molecules on the Ge(100)-2 × 1 Surface Driven by Nearest-Neighbor Effects

The Journal of Physical Chemistry C, 2013, 117 (2), 949-955 

http://doi.org/10.1021/jp3078503 


4. S.M. Geyer, R. Methaapanon, B. Shong, P.A. Pianetta, S.F. Bent*

In vacuo photoemission studies of platinum atomic layer deposition using synchrotron radiation

The Journal of Physical Chemistry Letters, 2013, 4 (1), 176-179 

http://doi.org/10.1021/jz301475z 


3. A.A. Peterson, L.C. Grabow, T.P. Brennan, B. Shong, C. Ooi, D.M. Wu, C.W. Li, A. Kushwaha, A.J. Medford, F. Mbuga, L. Li, J.K. Nørskov*

Finite-size effects in O and CO adsorption for the late transition metals

Topics in Catalysis, 2012, 55 (19-20), 1276-1282 

http://doi.org/10.1007/s11244-012-9908-x 


2. B. Shong, S.F. Bent*

Transition in the molecular orientation of phenol adsorbates on the Ge(100)-2 × 1 surface

The Journal of Physical Chemistry C, 2012, 116 (14), 7925-7930 

http://doi.org/10.1021/jp3009767 


1. B. Shong, K.T. Wong, S.F. Bent*

Reaction of hydroquinone and p-benzoquinone with the Ge(100)-2 × 1 surface

The Journal of Physical Chemistry C, 2012, 116 (7), 4705-4713 

http://doi.org/10.1021/jp210804v