Research Interest:

Synthesis and characterization : Xerogel, Aerogel films, Hybrid and porogen based low-k films,

SiO₂, CdS, ZnO, TiO₂, CdMnS NPs/films.

Processing : Surface modification, SHI/UV irradiation.

Fabrication : MIS/MOS devices.

Intellectual Property Rights, Meditation.