Research Publications

1 Journal of Nanoscience and Technology

A. E. Mali, S. V. Borse and A. S. Gaikwad. "Optimization of Growth Parameters for Deposition of Cd_1-xMn_xS (x=0.4) Nanocrystalline Thin Films by Chemical Bath Deposition Technique ", Journal of Nanoscience and Technology (JACS Directory), 5(4), 773 (2019).

2 Silicon

Anil S. Gaikwad, Yogesh S. Mhaisagar, Swati A. Gupta, Bhavana N. Joshi, Kandasami Asokan and Ashok M. Mahajan, “Amorphisation of SiO₂ thin films by using 200MeV Ag¹⁵⁺ions”, Silicon (Springer), 11(2), 1017 (2018).

3 Materials Science: Materials in Electronics

Swati A. Gupta, Anil S. Gaikwad and Ashok M. Mahajan “Tween-80 based ultra low-k (ULK) mesoporous films”, Materials Science: Materials in Electronics, 28(19), 14763 (2017) IF- 2.324.

4 Materials Research Express

Anil S. Gaikwad, Swati A. Gupta and Ashok M. Mahajan “Influence of HF acid catalyst concentration on properties of aerogel low-k thin films”, Materials Research Express (IOP), 3, 086403 (2016) IF-1.151.

5 Invertis Journal of Science & Technology

Anil Gaikwad, Yogesh Mhaisagar and Ashok Mahajan “Synthesis and characterization of silica aerogel thin films”, Invertis Journal of Science & Technology, 9(1), 54-61 (2016).

6 Indian Journal of Pure & Applied Physics

Yogesh S. Mhaisagar, Anil S. Gaikwad, Anil G. Khairnar and Ashok M. Mahajan “Enhancement in mechanical properties of silica low-k thin films by using wet chemical technique”, Indian Journal of Pure & Applied Physics, 54, 439-442 (2016) IF – 0.521.

7 Silicon

Namrata B. Pawar , Yogesh S. Mhaisagar, Anil S. Gaikwad and Ashok M. Mahajan “Influence of solvent variation on Tween-80 porogen based low-k thin films” Silicon (Springer) 9(3), 439-446 (2016) IF – 1.246.

Book Chapter

1. Anil Gaikwad, Yogesh Mhaisagar, Jigar Bhavsar, Ashok Mahajan, “Effect of supercritical drying on sol-gel deposited silica aerogel thin films at different temperatures”, chapter published in Physics of Semiconductor Devices (Springer International Publishing) 2014. (DOI: 10.1007/978-3-319-03002-9_4).

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Research Publications

1 Journal of Nanoscience and Technology

A. E. Mali, S. V. Borse and A. S. Gaikwad. "Optimization of Growth Parameters for Deposition of Cd_1-xMn_xS (x=0.4) Nanocrystalline Thin Films by Chemical Bath Deposition Technique ", Journal of Nanoscience and Technology (JACS Directory), 5(4), 773 (2019).

2 Silicon

Anil S. Gaikwad, Yogesh S. Mhaisagar, Swati A. Gupta, Bhavana N. Joshi, Kandasami Asokan and Ashok M. Mahajan, “Amorphisation of SiO₂ thin films by using 200MeV Ag¹⁵⁺ions”, Silicon (Springer), 11(2), 1017 (2018).

3 Materials Science: Materials in Electronics

Swati A. Gupta, Anil S. Gaikwad and Ashok M. Mahajan “Tween-80 based ultra low-k (ULK) mesoporous films”, Materials Science: Materials in Electronics, 28(19), 14763 (2017) IF- 2.324.

4 Materials Research Express

Anil S. Gaikwad, Swati A. Gupta and Ashok M. Mahajan “Influence of HF acid catalyst concentration on properties of aerogel low-k thin films”, Materials Research Express (IOP), 3, 086403 (2016) IF-1.151.

5 Invertis Journal of Science & Technology

Anil Gaikwad, Yogesh Mhaisagar and Ashok Mahajan “Synthesis and characterization of silica aerogel thin films”, Invertis Journal of Science & Technology, 9(1), 54-61 (2016).

6 Indian Journal of Pure & Applied Physics

Yogesh S. Mhaisagar, Anil S. Gaikwad, Anil G. Khairnar and Ashok M. Mahajan “Enhancement in mechanical properties of silica low-k thin films by using wet chemical technique”, Indian Journal of Pure & Applied Physics, 54, 439-442 (2016) IF – 0.521.

7 Silicon

Namrata B. Pawar , Yogesh S. Mhaisagar, Anil S. Gaikwad and Ashok M. Mahajan “Influence of solvent variation on Tween-80 porogen based low-k thin films” Silicon (Springer) 9(3), 439-446 (2016) IF – 1.246.

Book Chapter

If you follow the Rules, then Rules can follows you

Dr. Anil Gaikwad

Research Publications

1 Journal of Nanoscience and Technology

A. E. Mali, S. V. Borse and A. S. Gaikwad. "Optimization of Growth Parameters for Deposition of Cd1-xMnxS (x=0.4) Nanocrystalline Thin Films by Chemical Bath Deposition Technique ", Journal of Nanoscience and Technology (JACS Directory), 5(4), 773 (2019).

2 Silicon

Anil S. Gaikwad, Yogesh S. Mhaisagar, Swati A. Gupta, Bhavana N. Joshi, Kandasami Asokan and Ashok M. Mahajan, “Amorphisation of SiO2 thin films by using 200MeV Ag15+ ions”, Silicon (Springer), 11(2), 1017 (2018).

3 Materials Science: Materials in Electronics

Swati A. Gupta, Anil S. Gaikwad and Ashok M. Mahajan “Tween-80 based ultra low-k (ULK) mesoporous films”, Materials Science: Materials in Electronics, 28(19), 14763 (2017) IF- 2.324.

4 Materials Research Express

Anil S. Gaikwad, Swati A. Gupta and Ashok M. Mahajan “Influence of HF acid catalyst concentration on properties of aerogel low-k thin films”, Materials Research Express (IOP), 3, 086403 (2016) IF-1.151.

5 Invertis Journal of Science & Technology

Anil Gaikwad, Yogesh Mhaisagar and Ashok Mahajan “Synthesis and characterization of silica aerogel thin films”, Invertis Journal of Science & Technology, 9(1), 54-61 (2016).

6 Indian Journal of Pure & Applied Physics

Yogesh S. Mhaisagar, Anil S. Gaikwad, Anil G. Khairnar and Ashok M. Mahajan “Enhancement in mechanical properties of silica low-k thin films by using wet chemical technique”, Indian Journal of Pure & Applied Physics, 54, 439-442 (2016) IF – 0.521.

7 Silicon

Namrata B. Pawar , Yogesh S. Mhaisagar, Anil S. Gaikwad and Ashok M. Mahajan “Influence of solvent variation on Tween-80 porogen based low-k thin films” Silicon (Springer) 9(3), 439-446 (2016) IF – 1.246.

Book Chapter

If you follow the Rules, then Rules can follows you

Dr. Anil Gaikwad

A. E. Mali, S. V. Borse and A. S. Gaikwad. "Optimization of Growth Parameters for Deposition of Cd_1-xMn_xS (x=0.4) Nanocrystalline Thin Films by Chemical Bath Deposition Technique ", Journal of Nanoscience and Technology (JACS Directory), 5(4), 773 (2019).

Anil S. Gaikwad, Yogesh S. Mhaisagar, Swati A. Gupta, Bhavana N. Joshi, Kandasami Asokan and Ashok M. Mahajan, “Amorphisation of SiO₂ thin films by using 200MeV Ag¹⁵⁺ions”, Silicon (Springer), 11(2), 1017 (2018).