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Devices and Thin film fabrication facility
DC 4 target sputtering system with ultra high vaccum
Thermal evaporator
RF Sputtering
Quantum/spintronic device electrical characterization
Oxford optial cryostat with temperature range 1.6 - 300 K and upto magnetic field of 7T
I - V measurement setup
Semiconductor characterization system with probe station
CCR with 10 - 450 K
Digital microscope
Magnetic characterization
Vibrating sample magnetometer
Vibrating sample magnetometer
Cantilever beam magnetometer
Cantilever beam magnetometer
Thermal/Optical characterization
DSC/TGA
UV - Vis NIR Spectrophotometer
Alloy preparation and annealing facilities
Arc Furnace
Ball mill
Chemical vapor deposition
Furnace - 1400 degrees
Experimental results validation with simulations
Work station for simulations.
Micromagnetic simulations for magnetization dynamics using Mumax 3 and OOMMF
Neural network simulations for image and pattern recognition
Other central facilities
X - ray diffraction
Scanning probe microscope
Field emission scanning electron microscope
Transmission electron microscope
Any other
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