Applied Nanotechnology Laboratory
Laboratory Capabilities
Silica Nanosprings Reactor
An atmospheric Chemical Vapor Deposition reactor, designed and built at Miami University to grow silica nanosprings. Maximum deposition area: 30x10x2cm
Atomic Layer Deposition (ALD)
A custom design chamber that accommodate 3D substrates as well as planar up to 100mm in diameter and 150mm height. The ALD was designed and built MME students as part of their capstone project in 2017. Currently the system can deposit TiO2, ZnO and SiO2 from liquid precursors. The ALD controller is a Siemens S7-1214 PLC with a custom program which allow us to combine multiple precursor and create multilayered materials.
Sputtering
Compact sputtering deposition system used to deposit a thin layer of metals using a 50.8mm circular ONYX DC Magnetron gun and an AE MDX500 power supply .
Maximum sample size 12.5 x 12.5 cm.
Plasma Asher
Oxygen and argon plasma for surface cleaning, and activation. A modified PlasmaPreen to accommodate 30 x 5cm x 4cm samples.
Small Equipment
- 5 Place Balance
- Sonicator
- Osciloscope with frequency generator and FFT
- Hotplates
- Vacuum bagging for composite materials