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中田 百科 (Hyakka Nakada)
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中田 百科 (Hyakka Nakada)
  • Home
  • CV
  • Book
  • Publication
  • Talk
  • Patent
  • Blog
  • Hobby
  • More
    • Home
    • CV
    • Book
    • Publication
    • Talk
    • Patent
    • Blog
    • Hobby

Preprint

  • H. Nakada and M. Kubota, What Shape Is Optimal for Masks in Text Removal?, arXiv:2511.22499, 2025.

  • Y. Seki, H. Nakada, and S. Tanaka, Initialization Method for Factorization Machine Based on Low-Rank Approximation for Constructing a Corrected Approximate Ising Model, arXiv:2410.12747, 2024.

Reviewed Journal

  • H. Nakada and S. Tanaka, Factorization Machine from a Random Matrix Theory Perspective, Journal of the Physical Society of Japan, vol. 95, no. 6, pp. 064003, 2026.

  • H. Nakada, K. Tanahashi, and S. Tanaka, Quick design of feasible tensor networks for constrained combinatorial optimization, Quantum, vol. 9, pp. 1799, 2025.

  • H. Nakada and S. Tanaka, Systematic and Efficient Construction of Quadratic Unconstrained Binary Optimization Forms for High-order and Dense Interactions, Journal of the Physical Society of Japan, vol. 94, no. 9, pp. 094801, 2025.

  • H. Nakada, K. Tanahashi, and S. Tanaka, Inductive Construction of Variational Quantum Circuit for Constrained Combinatorial Optimization, IEEE Access, vol. 13, pp. 73096-73108, 2025.

  • 木村 友則, 川中 啓嗣, 中田 百科, 保田 雄亮, 朴 勝煥, 機械学習による付加製造条件の適正化, 溶接学会誌, 92 巻 6 号 p. 403-408, 2023年7月.

  • T. Dobashi, H. Nakada, Y. Okuyama, and T. Ohmori, Feature Parameter Design Using Cross-sectional SEM for Machine Learning-based Optimization in Plasma Etching, Microscopy and Microanalysis, vol. 26, issue S2, Aug. 2020.

Reviewed Proceedings

  • H. Nakada and Y. Tanaka, Robustness of Structured Data Extraction from Perspectively Distorted Documents using Multi-Modal Large Language Models, The 10th International Conference on Intelligent Informatics and BioMedical Sciences (ICIIBMS), Okinawa, Japan, Dec. 2025.

  • H. Nakada, T. Dobashi, Y. Okuyama, and T. Ohmori, Learning Data Collection for Profile Prediction in Si Etching with Self-Aligned Quadruple Patterning, The 41st International Symposium on Dry Process (DPS), Hiroshima, Japan, Nov. 2019.

  • T. Ohmori, H. Nakada, M. Ishikawa, and M. Kurihara, Prediction and Optimization of Etching Profile Using Machine Learning, The 39th International Symposium on Dry Process (DPS), Tokyo, Japan, Nov. 2017.

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