Facilities

Four Probe Controlled Environment Chamber

Our lab has the four probes controlled environment chamber in which users can perform DC and AC characterizations of the device in the controlled gas concentration, humidity, and temperature inside the chamber. The controlled environment chamber has connected with four gas cylinders using four mass control flow meters (MFC). We can simultaneously perform AC and DC characterization of the device in the presence of four gases, including CO, CO2, SO2, NO2, H2S, H2, NH3, etc. The four probes are currently connected to the Keysight 2612A Source Meter for measurement of current-voltage (I-V) characteristics.

2. Chemical Vapor Deposition for 2-D MoS2 Growth

Our lab has a chemical vapor deposition system with three-zone furnaces for up to 1100 o C operation. The CVD is optimized to produce high-quality 2-D thin film, including MoS2 and WS2. In the CVD system, the substrate is exposed to one or more precursors in the controlled pressure and temperature that react on the substrate surface to produce the desired thin film.

3. High Precision Ink Dispensing System

Our lab is equipped with a Nordson ink dispensing system with UV curing capability, enabling the precise deposition of conductive inks, adhesives, and other materials. This system ensures excellent control over ink flow, making it ideal for creating fine electrode patterns and electrical contacts in electronic devices and sensor applications.

4. Small Equipment Available:

A. NEYA Centrifuge with controlled temperature

B. Spin Coater along with the heater

C. Ultrasonic Bath

D. Magnetic Stirrer with the hot plate

E. Digital Balance

F. Zetasizer

G. Muffle furnace

H. Vaccum Oven

3. Software Available:

A. Synopsis 3-D TCAD Academic Bundle (VLSI Group license)

B. Quantumwise Atomstick Toolkit (VLSI Group license)

C. COMSOL Multiphysics (Institute license)

D. Matlab (Institute license)

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