Xudong Zheng,* , Jiangtao Wang,* , Jianfeng Jiang, Tianyi Zhang , Jiadi Zhu , Tong Dang, Peng Wu, Ang-Yu Lu, Ding-Rui Chen, Tilo H. Yang, Xinyuan Zhang , Kenan Zhang, Kyung Yeol Ma, Zhien Wang, Aijia Yao, Haomin Liu, Yi Wan , Ya-Ping Hsieh, Vladimir Bulović, Tomás Palacios, Jing Kong. Electrostatic repulsion-based transfer of 2D van der Waals materials Nature (2025)(Accepted)
Ding-Rui Chen*, Jeyavelan Muthu, Jui-Teng Chang, Po-Han Lin, Yu-Xiang Chen, Farheen Khurshid, Hao-Ting Chin, Jing Kong, Mario Hofmann, and Ya-Ping Hsieh* Breaking electrochemical scaling laws in atomically engineered van-der-Waals stack multisite edge catalysts Nano Letters (2025) (DOI: 10.1021/acs.nanolett.5c03027)
Jui-Teng Chang, Yu-Xiang Chen, Hao-Ting Chin, Ding-Rui Chen, Jian-Jhang Lee, Chia-Yi Wu, Yi-Chia Chou, Mario Hofmann, and Ya-Ping Hsieh* 2D Atomic Templating for the large-scale synthesis of metastable CuInS2 and its heterojunctions ACS Applied Materials & Interfaces (2025) (DOI: 10.1021/acsami.5c07759)
Y.-X. Chen, J.-J. Lee, D.-R. Chen, Y.-C. Lin, H.-T. Chin, X.-Y. Huang, S.-K. Chiu, C.-C. Ting, M. Hofmannand Y.-P. Hsieh*, Electron Cloaking in MoS2 for High-Performance Optoelectronics. Nano Letters 25, 9463 (2025). (DOI:10.1021/acs.nanolett.5c02169)
Yu-Chi Yao,, Bo-Yi Wu, Hao-Ting China, Zhi-Long Yen, Chu-Chi Ting, Mario Hofmann
Jian-Jhang Lee, Yi-Hung Chu, Zhi-Long Yen, Jeyavelan Muthu, Chu-Chi Ting, Ssu-Yen Huang, Mario Hofmann and Ya-Ping Hsieh*. Vacancy-plane-mediated exfoliation of sub-monolayer 2D pyrrhotiteVacancy-plane-mediated exfoliation of sub-monolayer 2D pyrrhotite Nanoscale Advances 5, 4074 (2023) DOI: 10.1039/D3NA00263B. [Selected
Jeyavelan Muthu, Farheen Khurshid, Hao-Ting Chin, Yu-Chi Yao, Ya-Ping Hsieh*, Mario Hofmann*. The HER performance of 2D materials is underestimated without morphology correction Chemical Engineering Journal 465, 142852. (2023) (IF:16.7)
Ding-Rui Chen*, Jeyavelan Muthu, Jui-Teng Chang, Po-Han Lin, Yu-Xiang Chen, Farheen Khurshid, Hao-Ting Chin, Jing Kong, Mario Hofmann, and Ya-Ping Hsieh* Breaking electrochemical scaling laws in atomically engineered van-der-Waals stack multisite edge catalysts Nano Letters (2025) (DOI: 10.1021/acs.nanolett.5c03027)
Jui-Teng Chang, Yu-Xiang Chen, Hao-Ting Chin, Ding-Rui Chen, Jian-Jhang Lee, Chia-Yi Wu, Yi-Chia Chou, Mario Hofmann, and Ya-Ping Hsieh* 2D Atomic Templating for the large-scale synthesis of metastable CuInS2 and its heterojunctions ACS Applied Materials & Interfaces (2025) (DOI: 10.1021/acsami.5c07759)
Y.-X. Chen, J.-J. Lee, D.-R. Chen, Y.-C. Lin, H.-T. Chin, X.-Y. Huang, S.-K. Chiu, C.-C. Ting, M. Hofmannand Y.-P. Hsieh*, Electron Cloaking in MoS2 for High-Performance Optoelectronics. Nano Letters 25, 9463 (2025). (DOI:10.1021/acs.nanolett.5c02169)
Yu-Chi Yao,, Bo-Yi Wu, Hao-Ting China, Zhi-Long Yen, Chu-Chi Ting, Mario Hofmann
Jian-Jhang Lee, Yi-Hung Chu, Zhi-Long Yen, Jeyavelan Muthu, Chu-Chi Ting, Ssu-Yen Huang, Mario Hofmann and Ya-Ping Hsieh*. Vacancy-plane-mediated exfoliation of sub-monolayer 2D pyrrhotiteVacancy-plane-mediated exfoliation of sub-monolayer 2D pyrrhotite Nanoscale Advances 5, 4074 (2023) DOI: 10.1039/D3NA00263B. [Selected
Jeyavelan Muthu, Farheen Khurshid, Hao-Ting Chin, Yu-Chi Yao, Ya-Ping Hsieh*, Mario Hofmann*. The HER performance of 2D materials is underestimated without morphology correction Chemical Engineering Journal 465, 142852. (2023) (IF:16.7)