Research Areas
Atomic Craft & Engineering Laboratory @ Hanyang University
Atomic Craft & Engineering
Our current research interests and topics are mostly focused on understanding and controlling surface-driven reaction chemistry, and practically applying this knowledge to a range of problems in semiconductor processing, micro- and nanoelectronics, nanotechnology, and sustainable and renewable energy.
Herein, we employ Atomic Craft & Engineering technologies, where Area-Selective Deposition can be enabled by suitable combination of Surface-Inhibitory molecules, Atomic Layer Deposition and Atomic Layer Etching to place or remove atom-by-atom onto desired region, eventually allowing formation of atomic-scale building blocks.
Current research topics in ACEL involve...
Atomic Layer Deposition for next-generation metals (Mo, Ru, Pt etc) and dielectrics (high-k, low-k, ferroelectric, functional coating)
Area Selective Deposition for next-generation bottom-up patterning: DoD, MoM, MoD, DoM
Atomic Layer Etching for various metal/dielectric materials
CVD/ALD/MLD for next-generation inorganic EUV resist materials