Research Areas

Atomic Craft & Engineering Laboratory @ Hanyang University

Atomic Craft & Engineering

Our current research interests and topics are mostly focused on understanding and controlling surface-driven reaction chemistry, and practically applying this knowledge to a range of problems in semiconductor processing, micro- and nanoelectronics, nanotechnology, and sustainable and renewable energy.

Herein, we employ Atomic Craft & Engineering technologies, where Area-Selective Deposition can be enabled by suitable combination of Surface-Inhibitory molecules, Atomic Layer Deposition and Atomic Layer Etching to place or remove atom-by-atom onto desired region, eventually allowing formation of atomic-scale building blocks.

Current research topics in ACEL involve...

  • Atomic Layer Deposition for next-generation metals (Mo, Ru, Pt etc) and dielectrics (high-k, low-k, ferroelectric, functional coating)

  • Area Selective Deposition for next-generation bottom-up patterning: DoD, MoM, MoD, DoM

  • Atomic Layer Etching for various metal/dielectric materials

  • CVD/ALD/MLD for next-generation inorganic EUV resist materials