Research Facilities

E-Beam Evaporation System for Metal and Oxides Deposition (Shared Facility)

Work station for computational work 

Muffle Furnace (Temperature beyond 1200 degree) 

Vacuum Oven (up to 400 degree) 

AC Motor Spin coater (up to 10000 rpm) 

Weighing Machine Balancer 

Ultrasonicator 

Magnetic Stirrer (Hot Plate) 

Deionized (DI) Water System 

Vibration-free Optical Bench with the Following Facilities:

Vacuum-equipped temperature-dependent current-voltage measurement probe station

In-house high-density Memory Chip and Wafer-level Electrical Characterization Facilities 

ArC ONE Memory measurement system

Optoelectronic Characterization Facility with Different Light Sources 

ArC ONE Memory Measurement System

ArC ONE Memory Measurement Tool Integration with Wafer-level Measurement System

User-friendly Testing Interface with ArC ONE Tool

Established testing Protocols for High-density Crossbar Array Measurement 

Autolab for CV, EIS and AC Analysis Facility