Research Facilities:

UHV growth chambers with three e-beam sources, two sputtering sources and a sample transfer chamber.

In-situ Structural analysis using RHEED

In-situ Magnetic and magneto-elastic properties measurements

Advanced photolithography (a mask aligner up to 3 inch wafers, a photoresist spinner, and a wet chemical workstation)

Advanced e-beam lithography

Focused Ion beam for lithography

Atomic force microscopy/magnetic force microscopy/scanning tunneling microscopy

Plasma Enhanced Chemical Vapour Deposition (PECVD)

A plasma reactive ion etcher (RIE)

Thermal Oxidation

Scanning Electron Microscope.

Ex-situ and in-situ MOKE for magnetic characterisation

Magneto-resistance, I-V characterisation and spin dependant transport measurements

A well equipped class 100 clean room for device fabrications and testing

Facilities in central laboratory of research council, Daresbury Synchrotron Radiation Laboratory and Diamond Laboratory

Technical support:

The group research has strong technical supports from both the mechanical and electronic workshops in the department for instrumental development and construction. Senior experimental officers and technical staffs within the group support the running of the laboratory.