Deposit thin films such as indium tin oxide (ITO) by using radio frequency (RF) sputtering, aluminum (Al), molybdenum (Mo) by using direct current (DC) magnetron sputtering, and silver (Ag) by thermal evaporation techniques by using physical vapor deposition system (PVD 75) from Kurt J. Lesker.
Fabricate thin films such as titanium dioxide (TiO2) by using chemical bath deposition (CBD), spin coating, and doctor blading.
Rapidly heat samples to high temperatures in a vacuum atmosphere by MTI Rapid Thermal Processing System.
Fabricate thin films such as perovskite, P3HT, and Spiro-MeOTAD by spin coating techniques using Laurell WS-650 spin processor.
Fabricate planar perovskite solar cells on top of fluorine-doped tin oxide (FTO) coated glass.
Electronic Material Processing (EE 5318’s Lab): wafer preparations, cleaning, wet oxidation, photolithography, wet etching, diffusion, and ion implantation.