Facilities
当研究分野が所有する装置群
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Standard thin film growth and crystallographic characterization
Standard thin film growth and crystallographic characterization
薄膜作製および評価に使用する装置
Pulsed laser deposition (A) (Pascal)
Pulsed laser deposition (B) (Pascal)
Pulsed laser deposition (C) (Pascal)
Pulsed laser deposition (D) (Hybridge)
High-resolution X-ray diffraction (HR-XRD) (ATX-G | Rigaku Co.)
Reflection high-energy electron diffraction (RHEED) (3)
Topographic AFM (Nano Cute | Hitachi)
Scanning Probing Microscopy (MFP-3D Origin | Oxford)
UV-vis-NIR spectroscopy (SolidSpec-3700 | Shimazu)
FT-IR (IRPrestige-21 | Shimazu)
Electric furnace (several)
EB evaporator (Eiko)
Oxide TFTs
Oxide TFTs
酸化物薄膜トランジスタの評価に使用する装置
Semiconductor device analyzer (B1500A | Agirent)
High-temperature probing station (OYM | OYAMA)
Low-temperature probing station (GRAIL | Nagase Techno-Engineering)
Hall effect measurement system (homemade)
Thermal transistors
Thermal transistors
熱トランジスタ特性を計測するための装置
Time-domain thermoreflectance (TDTR) (PicoTR | NETZSCH Japan)
Differential Scanning Calorimetry (DSC) (NEXTA DSC200 | Hitachi)
DC Sputtering (Hybridge)
TDTR simulator (3) (NETZSCH Japan)
Solar cells
Solar cells
薄膜太陽電池の作製と評価に使用する装置
Spin coater (ACT-300AⅡ | Active)
UV ozone cleaner (ASM401oz | ASUMI GIKEN)
Au coater (IB-3 | Eiko)
Solar cell measurement system
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