Growth and Fabrication equipment

Ultra-high Vacuum Multi Target Sputter deposition system

  • Custom designed system that can achieve base pressures in the range of 2e-9 mbar aand lower

  • 5 different materials can be grown without breaking vacuum

  • Fitted with a residual gas analyzer to monitor low level impurities at base pressure

  • Has RF and DC power supplies to enable growth of metallic as well as insulating materials

  • Reactive sputtering with Nitrogen and Oxygen

High vacuum integrated Argon ion miller and sputter deposition chamber

  • Custom designed system that can achieve base pressures in the range of 5*10^-8 mbar

  • RF powered Argon ion miller

  • 3 magnetrons for depositing various materials

  • Load lock chamber for quick process turnaround

Measurement equipment

Liquid Helium Dip probe

  • Custom designed dipstick for measuring in a liquid helium dewar

  • Fitted with 2 solenoid magnets for applying in plane and out of plane magnetic fields

Electronics, measurement software

  • Keithley SMUs and DMMs

  • NI PXIe SMUs, PXIe Analog input, output modules

  • DSP 7265 lockin amplifier

  • QCodes for data acquisition and organization