Research Fields

Atomic Layer Deposition (ALD) is a technique employed to synthesize ultra-thin films at the atomic scale through chemical adsorption. As semiconductor devices are scaled down and nanotechnology advances, ALD has become an integral method for precisely manipulating the atoms. Therefore, it is crucial to design and develop new materials by utilizing novel precursors and reactants that are tailored to the specific reaction pathways involved. So, we are focusing on the development of ALD process using the new precursor and alternative reactants.  

Coating powder particles using ALD or chemical vapor deposition (CVD) technology offers a precise and uniform coating on powder particles with diverse sizes and surface characteristics. With the advancement of nanoscale powder particles, controlling the nanosized materials has become a popular approach to enhance energy efficiency by boosting chemical reactivity for energy generation or other application as well. The distinctive and excellent uniformity characteristics of ALD or CVD make it the exceptionally efficient methods for coating the surfaces of nano-sized particles or forming heteroatomic materials. So, we are interesting in the powder coating by ALD with the modified reactor towards the commercialization for various applications. 

Alternative to the coal and petroleum oil, the utilization of renewable energy sources on a large scale necessitates an efficient system for energy conversion and storage. This requirement serves as a significant driving force behind various innovations in energy conversion and storage technologies. Notably, there has been substantial attention given to systems such as electrolysis-based hydrogen production, fuel cells for converting hydrogen into electricity, and lithium-ion battery or supercapacitor for storing energy. In these fields, ALD can design the catalysts or a part of stacks. We are interesting in the advanced technology of electrolysis, fuel cell and battery using ALD or deposition technology. 

ALD is a key tool in fabricating the semiconductor devices. In detail, ALD can be applied in to the high-k dielectrics, low-k materials, metal gates, diffusion barrier, display, and solar cells. We have the experiences that studied the above specific fields.  We are focusing on the advanced study of  high-k dielectrics, low-k materials, metal gates, diffusion barrier, display, and solar cells using ALD technology (or other deposition technologies).