Facilities

TF-FAB: Advanced Thin Film Sputtering Fabrication Facility 

• Our national facility for thin film fabrication. dedicated page here

E-beam/thermal evaporator 

• Moorfield Nanotechnology 080 multipocket ebeam (6x7cc) and 2 x thermal everaporation sources

• Load lock with plasma etch, 6'' substrate and heating up to 500C

Thermal evaporator

• Leybold Univex 250 with 2x TE sources

• 4'' substrates and heating up to 900C

Magnetron Sputtering #1

• Moorfield Nanotechnology 125 dual chamber system

• Each chamber has 4 magentorns and 3 power suppy

• Load lock, 6'' substrate and heating up to 500C

Magnetron Sputtering #2

• Moorfield Nanotechnology NanoPVD

• 2x magnetron, 1x RF, 1x DC, susbtrate heater (500C), 4'' substrate holder.

Atomic Layer Deposition 

• Forge Nano THEIA 

• Thermal and plasma ALD

Rapid thermal evaporation furnaces

• MTI Corporation  OTF-1200X-4-RTP

Photonic curing

• Nova Centrix PulseForge 1300 

Tube furnaces for annealing and reactive recrystallisation processes