Aerosol Deposition for Thin-Film Processing
Aerosol Deposition for Thin-Film Processing
The fabrication of ceramic components or coatings often requires high sintering temperatures above 1000 degrees Celsius.
By utilizing the Aerosol Deposition method, it is possible to produce highly dense ceramic coatings directly from an initial bulk powder without any high temperature step on any substrate material.
For the expansion of our AD research, follow-up research has been configured as follows:
Epitaxial growth for Power Semiconductor
Electromagnetic shielding thin film coating
And Also, even further research for various applications is planned, including UVC photodetector, Flexible display.
Related Articles
X. Dong#, B. Lee#, A. Ghulam, J. Akedo, H. K. Yu*, J.-Y. Choi* and J.-H. Park*, Dielectric properties of lead zirconate titanate/Au composite film prepared by aerosol deposition, Materials Chemistry and Physics, 284, 126078 (2022) doi.org/10.1016/j.matchemphys.2022.126078
H. K. Yu#, S. Oh#, K. H. Choi, J. Jeon, X. Dong, S. H. Lee, J.-Y. Choi*, J. Akedo* and J.-H. Park*, Al2O3 coated glass by aerosol deposition with excellent mechanical properties for mobile electronic displays, Ceramics International, 47, 30531 (2021) doi.org/10.1016/j.ceramint.2021.07.231