Negative electron-beam resist hard mask ion beam etching process

for the fabrication of nanoscale magnetic tunnel junctions

Sung-woo Chun, Daehong Kim, Jihun Kwon, Bongho Kim, Hyungyu Lee, and Seung-Beck Lee

Journal of Vacuum Science & Technology B,Volume 30, No. 6, pp. 06FA01-1~06FA01-5, 2012.12

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