Improved Field-Effect Mobility through Metal Capping Layer Oxidation
in Top-Gate a-IGZO TFTs with High-k Gate Insulator

 Kyubin Hwang, JiyoungBang, HyeonjeongSun,YoungsooNoh, SeungminChoi, Hyowon Kim,

Seungjae Lee, Yeoeun Yun and Seung-Beck Lee

KISM, November 12-14, 2024, PARADISE & Grand Josun HOTEL, (Busan)