28. 제 19회 반도체 학술대회

Ion beam etching of sub-30nm scale perpendicular-MTJ for reducing by-product and damage of sidewall, Daehong Kim, Bongho Kim, Sungwoo Chun, JihunKwon, Seonjun Choi and Seung-Beck Lee, 제 19회 반도체 학술대회, Feb 5, Korea University , Korea