膠體與界面科學實驗室(CISL)成立於1996年8月,本實驗室主要研究領域為界面活性劑、高分子物理、膠體粒子、軟物質、半導體清潔製程等基礎研究。本實驗室做研究的方法為理論、實驗與模擬三方面,藉由這三方面的方法能更深入的探討研究。也藉由這樣的研究來訓練研究生思考的能力。近年來由於奈米科技的發展,膠體與界面的研究開始蓬勃發展,而且應用極為廣泛。例如藥物載體、化妝保養品、半導體清潔、液晶等等。
Colloid and Interface Science Laboratory (CISL) was established in 1996 as Dr.Tsao occupies an assistant professor in the department of Chemical and Material Engineering. The laboratory was initially located in Engineering Building 4 Room E3- 401, but was relocated to Room E3- 219 in 2005, and gradually developed into a complete laboratory. CISL has now become a developed laboratory in the fields of colloid and interface science.
CISL now has two group in different researchable methods, including Computer Simulation and Experimental Observation. Furthermore, our central processing units and instruments are ceaselessly improved, and help us gain an excellent reputation for research and academic thesis.
The common thread of our studies is the colloid and interface phenomena. We investigate the systems such as polymeric micelles, polyelectrolytes, and liposomes, which are of scientific interest as well as important to biotechnology and other chemical processing. In our laboratory, the tools of experiment, analytical theory, molecular simulation are used to relate the macroscopic transport and thermodynamic behaviors of the system to the basic physical and chemical interactions between the elementary molecules or particles.
Micelles
Polyelectrolyte
Liposomes
At present, our interests are focused mainly on the transport properties of polyelectrolytes, such as electrophoretic mobility and electric conductivity; physical stability of liposome systems, which are thermodynamically unstable; and morphology of polymeric micelles, which offers tremendous promise for advanced applications, such as nanomaterial synthesis, potential delivery vehicles for pharmaceuticals, and gene therapy agent.
Molecular cluster
Electric conductivity
Due to the rapid bloom of semiconductor industry in Taiwan, we also study the post chemical mechanical polishing cleaning. The wettability of aqueous droplets on hydrophobic substrates influences the efficiency of the cleaning operation. The process involves the wetting phenomena and therefore intrigues us to study the wetting phenomena associated with superhydrophobic surfaces.
Chemical-mechanical planarization
Cleaning mechanism