Directed self-assembly(DSA)

Directed Self Assembly (DSA) is one of the leading candidates for next generation lithography for the semiconductor and data storage industries. DSA combines top down and bottom up patterning to provide both sub-10 nm nanostructures and controlled placement. The feature sizes are determined by chemistry through the lengths of the molecules. The placement is determined by a template fabricated by conventional lithography methods. The template epitaxially guides the self assembly of the block copolymer. The spacing of the template is an integer multiple of the natural spacing of the block copolymer. The smaller pitch block copolymer essentially fills in the gaps between the template guides, multiplying the frequency of the conventional pattern. This project focuses on key materials by design issues for developing new block copolymers with even smaller natural spacings that meet the industry criteria of low defectivity, small spacing, etch selectivity, and ease of DSA. We combine molecular simulations with new X-ray scattering methods to validate the simulations on new materials systems and to extend the amount of information that can be extracted from the X-ray measurements.

Representative results

Further reading

9. Myunghwan Byun†, Tae Wan Park†, Woon Ik Park* ,"Hierarchically ordered hybrid nanostructures via spontaneous self-assembly of block copolymer blends", Thin Solid Films,137928, 2020. >Link

8. Hyunsung Jung†, Won Ho Shin†, Tae Wan Park, Young Joong Choi, Young Joon Yoon, Sung Heum Park, Jae-Hong Lim, Jung-Dae Kwon, Jung Woo Lee, Se-Hun Kwon, Gi Hun Seong*, Kwang Ho Kim*, Woon Ik Park *, "Hierarchical multi-level block copolymer patterns by multiple self-assembly ", Nanoscale, 11 (17), 8433-8441, 2019. >Link

7. Woon Ik Park†, Young Joong Choi†, Jong Min Yuk, Hyeon Kook Seo, Kwang Ho Kim*, "Enhanced self-assembly of block copolymers by surface modification of a guiding template ", Polymer Journal, 50 (2), 221-229, 2018. >Link

6. Myung Jin Kim†, Woon Ik Park†, Young Joong Choi, Yun Kyung Jung, Kwang Ho Kim*, "Ultra-rapid pattern formation of block copolymers with a high-χ parameter in immersion annealing induced by a homopolymer", RSC advances, 6, (25), 21105-21110, 2016. > Link

5. Woon Ik Park†, Young Joong Choi†, Je Moon Yun, Suck Won Hong, Yeon Sik Jung, Kwang Ho Kim*, "Enhancing the directed self-assembly kinetics of block copolymers using binary solvent mixtures ", ACS applied materials & interfaces, 7 (46), 25843-25850, 2015. >Link

4. Woon Ik Park†, Jong Min Kim, Jae Won Jeong, Yoon Hyoung Hur, Young Joong Choi, Se-Hun Kwon, Seungbum Hong, You Yin*, Yeon Sik Jung*, Kwang Ho Kim* , "Hierarchically self-assembled block copolymer blends for templating hollow phase-change nanostructures with an extremely low switching current ", Chemistry of Materials, 27 (7), 2673-2677, 2015. >Link

3. Woon Ik Park†, Sheng Tong, Yuzi Liu, Il Woong Jung, Andreas Roelofs, Seungbum Hong*, "Tunable and rapid self-assembly of block copolymers using mixed solvent vapors ", Nanoscale, 6, 15216–15221, 2014. >Link

2. Woon Ik Park†, Byoung Kuk You, Beom Ho Mun, Hyeon Kook Seo, Jeong Yong Lee, Sumio Hosaka, You Yin, CA Ross, Keon Jae Lee*, Yeon Sik Jung* , "Self-assembled incorporation of modulated block copolymer nanostructures in phase-change memory for switching power reduction ", ACS Nano, 7 (3), 2651-2658, 2013. >Link

1. Woon Ik Park†, Jong Moon Yoon, Moonkyu Park, Jinsup Lee, Sung Kyu Kim, Jae Won Jeong, Kyungho Kim, Hu Young Jeong, Seokwoo Jeon, Kwang Soo No, Jeong Yong Lee, Yeon Sik Jung*, " Self-assembly-induced formation of high-density silicon oxide memristor nanostructures on graphene and metal electrodes ", Nano Letters, 12 (3), 1235-1240, 2012. >Link