Research

Research

The research of the Kim group focuses on understanding the fundamental physics of semiconductors and translating this knowledge into practical opto-electronic systems through advanced semiconductor fabrication processes. A major objective is the realization of edge-level sensing platforms, such as CMOS-based spectrometer systems, that integrate compact device architectures with high-performance optical functionality.

In parallel, the group conducts research on advanced metrology and inspection (MI) science for semiconductor devices and multifunctional nanomaterials. Our work addresses the development and application of novel measurement technologies capable of characterizing complex materials and device structures across a wide range of scales, from microchips to low-dimensional nanomaterials including quantum dots, transition metal dichalcogenides (TMDCs), and nanowires. Metrology and inspection play a critical role throughout the semiconductor fabrication process by enabling precise monitoring and control of key parameters that determine device performance, reliability, and manufacturing yield.

To address these challenges, we develop advanced optical measurement techniques such as hyperspectral phase microscopy (HPM), an extension of phase shift interferometry (PSI), and integrate multidisciplinary approaches combining semiconductor device physics, photonics, artificial intelligence (AI) algorithms, and quantum mechanics. Through these efforts, our research aims to establish next-generation metrology platforms and optoelectronic sensing technologies for semiconductor manufacturing and nanoscale material systems.