Facilities
Embedded Files
Sputtering System
M/N: The1-MSS3 (더원과학)
Deposition materials : Metals & Oxides films
Deposition: deposition by spittering fun 3" (3 guns)
Throughpit: up to 4" substrate x 1 sheet / batch
Vacuum: Ultimate pressure 5.0 x 10-6 Torr
Base pressure 3.0 x 10-5 TorrSubstrate rotation
Temperature rage: 300 - 700 K
Direct laser Lithography
Direct laser Lithography
M/N: Dilase 250 (Kloe)
Resolution: 1µm
Wavelength: 365nm +/- 5nm
Power density: 35mW/cm² +/- 10%
Substrate warm-up during exposure: < 1°C
Exposure cycle: between 1s and 1h
Number of programmable cycles: 10
BOX Furnace
BOX Furnace
Working Temp : Max 900 C
Quartz Tube with Gas Mask
MOKE (Magneto-Optical Kerr Effect microscopy)
MOKE (Magneto-Optical Kerr Effect microscopy)
M/N: Durham Magneto Optics NanoMOKE3 (Quantum Design)
Maximum field strength: 1.2 T
Temperature: RT
Probe station
Probe station
M/N: CRX-VF (Lakeshore)
Maximum field strength: 2.5 T
Temperature range: 4 K – 500 K
Single-Axis Tesla Meter
Single-Axis Tesla Meter
Model F41 (Lakeshore)
Axial probe
Transverse probe
Electromagnet system
Electromagnet system
Max field 5000 Oe
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