Highly Aligned Nanopattern in Large Area for Nano-Lithography (고정렬 대면적 나노리소그래피)
Sub-10 nm Ultra-Fine Pattern for Nano-Lithography (Sub-10 nm 초미세 패턴 기반 나노리소그래피)
Nano-Lithography for 2D Semiconductor Materials (2차원 반도체 소재 나노리소그래피)
AJOU UNIVERSITY, 206, World cup-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do 16499, Korea
E-mail: janghwankim@ajou.ac.kr
Phone: +82-031-219-3228