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Machine Learning Research for Semiconductor Manufacturing & Design @ IMEC
Machine Learning Research for Semiconductor Manufacturing & Design @ IMEC
Advanced Pattering - Machine Learning (AP-ML) is a research team within the Advanced Patterning group at the Interuniversity Microelectronics Center (IMEC) in Leuven, Belgium. We research novel machine learning-based methods and applications towards improving productivity and efficiency in various semiconductor manufacturing processes including defect inspection, process window analysis, and more.
Our current research projects focus on:
Advanced node semiconductor defect inspection and metrology
Overlay analysis and optimization
Process Window analysis
Automatic layout generation
Semiconductor process optimization
For career opportunities or general queries, please contact:
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