X.-Y. Li, F.-H. Lu*, Effects of nitrogen doping on electrical, optical, and photocatalytic behavior of air-based sputtered zirconia thin films, Ceram. Int. 52 (2026) 35460-35470.
W.-S. Huang, X.-X. Yang, F.-H. Lu*, Evolution of structure and functional properties for (Ti,Zr)-N-O thin films deposited by air-based reactive sputtering, J. Alloys Compd. 1071 (2026) 188832.
G.-S. Wang, X.-X. Yang, F.-H. Lu*, Enhancement of Photoelectrochemical Responses via Annealing of Air-based Sputtered TiN Films in Controlled Atmospheres, J. Eur. Ceram. Soc. 46 (2026) 117817.
X.-Y. Li, F.-H. Lu*, Effects of sputtering power and air/Ar ratio on the structural, electrical, and optical properties of Zr-N-O thin films deposited by air-based reactive sputtering, J. Alloys Compd. 1044 (2025) 184562.
Y.-C. Zhuang, F.-H. Lu*, Air-based sputtering deposition of N-doped Ti3O5 thin films for visible-light photocatalysts, Ceram. Int. 51 (2025) 58153-58162.
X.-X. Yang, F.-H. Lu*, Development of Ti-N-O-based multilayer low-emissivity coatings through air-based sputtering technique, Appl. Surf. Sci. Adv. 30 (2025) 100902.
Y.-T. Chien, X.-X. Yang, F.-H. Lu*, High photoelectrochemical response of SrTiO3/TiO2/TiN films synthesized via hydrothermal-galvanic couple method with reductive annealing" Commun. Mater. 6 (2025) 230.
C.-Y. Lee, X.-X. Yang, F.-H. Lu*, Synthesis of preferred-oriented BaTiO3 thin films via hydrothermal-galvanic method on TiN-coated substrates for photoelectrochemical, dielectric, and piezoelectric evaluations, Ceram. Int. 51 (2025) 30225-30232.
M.-Y. Lin, X.-X. Yang, F.-H. Lu*, Crystal and band structures of N-doped Ti3O5 coatings: Experiments and first-principles calculations, Thin Solid Films 660 (2024) 140484.
P.-H. Li, X.-X. Yang, F.-H. Lu*, Air-Based Sputtering Deposition of TiN(O)/a-TiNxOy Multilayer Films for Enhanced Mechanical Properties and Corrosion Resistance, Surf. Coat. Technol. 481 (2024) 30668.
X.-X. Yang, F.-H. Lu*, Enhancement of photoelectrochemical performance for nitrogen-doped titanium dioxide-based thin films produced by a facile air-based sputtering deposition, Ceram. Int. 50 (2024) 7817-7826.
C.-T. Tsai, Y.-C. Chen, H.-M. Tsai, F.-H. Lu, Photoresponse of solution-processed transparent heterojunction ultraviolet photodetectors composed of n-type ZTO and p-type NiO-based semiconductor thin films, Mater. Chem. Phys. 295 (2023) 127143.
X.-X. Yang, F.-H. Lu*, Air-based sputtering deposition of titanium oxynitride-based single, gradient, and multi-layer thin films for photoelectrochemical applications, Ceram. Int. 49 (2023) 15891-15899.
H.-P. Fan, X.-X. Yang, F.-H. Lu*, Air-based deposition of titanium‑aluminum oxynitride thin films by reactive magnetron sputtering, Surf. Coat. Technol. 436 (2022) 128287.
Y.-Z. Zheng, H.-P. Teng, F.-H. Lu*, A facile synthesis of Al-doped BaTiO3 thin films by a hydrothermal-galvanic couple method on TiAlN film electrodes, Surf. Coat. Technol. 434 (2022) 128163.
H.-P. Teng, T.-J. Huang, F.-H. Lu*, Synthesis of crystalline BaZrO3 thin films over preferred-oriented ZrN by a hydrothermal-galvanic couple method for photoelectrochemical evaluations, Mater. Today Commun. 33 (2022) 104761.
P.-H. Chan, H.-P. Teng, H.-S. Chan, F.-H. Lu*, A facile control of epitaxial-like barium strontium titanate thin films with various Ba/Sr ratios synthesized by a hydrothermal-galvanic couple method, Ceram. Int. 47 (2021) 13715-13721.
H. Li, S.-H. Yuan, T.-M. Huang, H.-J. Chen, F.-H. Lu, D.-S. Wuu*, Impact of thermal-induced sapphire substrate erosion on material and photodetector characteristics of sputtered Ga2O3 films, J. Alloys Compd. 823 (2020) 153755.
H.-P. Teng, F.-H. Lu*, Production of Ba(Zr,Ti)O3 coatings on ternary (Ti,Zr)N thin film electrodes by plasma electrolyte oxidation, Surf. Coat. Technol. 385 (2020) 125440.
G.-W. Lin, Y.-H. Huang, W.J. Tseng, F.-H. Lu*, Production of N-doped anatase TiO2 on TiN-coated Ti substrates by plasma electrolytic oxidation for visible-light photocatalysts, Ceram. Int. 45 (2019) 22506-22512.
P.-J. Tsai, K.-L. Chung, C.-J. Yang, H.-T. Lee, F.-H. Lu*, Synthesis of Cu-Co bimetallic nanaoparticles using TiN-coated electrotrodes for glucose-sensing applciations, J. Alloys Compd. 785 (2019) 191-199. (SCI)
H.-P. Teng, C.-C. Lin, F.-H. Lu*, A facile growth control of perovskite SrTiO3 thin films by tailoring surface morphologies of TiN seeding layers in the hydrothermal-galvanic couple synthesis, Thin Solid Films, 669 (2019) 220-226.
G.-W. Lin, J.-S. Chen, W.J. Tseng, F.-H. Lu*, Formation of anatase TiO2 coatings by plasma electrolytic oxidation for photocatalytic applications, Surf. Coat. Technol. 357 (2019) 28-35.
Y.-C. Liou, F.-H Lu*, Air-based sputtering deposition of TiNxOy films for solar selective absorber coatings applications, Thin Solid Films 660 (2018) 733-740.
H.-P. Teng, H.-Y. Lin, Y.-H. Huang, F.-H Lu*, Formation of strontium -substituted hydroxyapatite coatings on bulk Ti and TiN-coated substrates by plasma electrolytic oxidation, Surf. Coat. Technol. 350 (2018) 1112-1119.
K.-L. Chuang, M.-T. Tsai, F.-H Lu*, Morphology control of conductive TiN films produced by air-based magnetron sputtering, Surf. Coat. Technol. 350 (2018) 1091-1097.
Y.-H. Mao, C.-Y. Chen, J.-X. Fu, T.-Y. Lai, F.-H Lu*, Y.-C. Tsai*, Electrodeposition of nickel-copper on titanium nitride for methanol electrooxidation, Surf. Coat. Technol. 350 (2018) 949-953.
C.-Y. Yu, P.-J. Tsai, F.-H. Lu*, Electrochemical synthesis of Ni nanoparticles over tailored TiN thin film electrodes for glucose sensing,” Ceram. Int., 43, (2017) S807-813.
H.-P. Teng, H.-W. Hsu, F.-H. Lu*, Formation of BaxSr1-xTiO3 films on TiN-coated substrates by plasma electrolytic oxidation, Ceram. Int., 43, (2017) S584-590.
P.-H. Chan, H.-S. Chan, F.-H. Lu*, A facile method to control grain sizes of barium strontium titanate films on TiN/Si in the hydrothermal–galvanic couple synthesis, Ceram. Int. 43 (2017) S578-583.
H.-P. Teng, H.-H. Wu, F.-H. Lu*, Synthesis and formation mechanisms of BaZrO3 thin films prepared on ZrN-coated substrates by a low temperature hydrothermal–galvanic couple method, Thin Solid Films 618 (2016) 224-230.
F.-H. Lu*, S.-Y. Chang, Y.-Y. Chang, P.-Y. Chen, H.-H. Huang, Y.-L. Kuo, J.-W. Lee, F.-B. Wu, Preface: The Biennial TACT International Thin Films Conference (TACT 2015), Surf. Coat. Technol. 303 (2016) 1-2.
H.-P. Teng, C.-J. Yang, J.-F. Lin, Y.-H. Huang, F.-H. Lu*, A simple method to functionalize the surface of plasma electrolytic oxidation produced TiO2 coatings for growing hydroxyapatite, Electrochim. Acta, 193 (2016) 216-224.
C.-H. Hsiao, H.-P. Teng, F.-H. Lu*, Formation of zirconia coatings on ZrN-coated substrates by plasma electrolytic oxidation, Surf. Coat. Technol. 269 (2015) 295-301.
W.-Y. Tsai, C.-J. Yang, J.-L. Zeng, F.-H. Lu*, Synthesis and characterization of barium titanate films on Ti-coated Si substrates by plasma electrolytic oxidation," Surf. Coat. Technol. 259 (2014) 297-301.
Y.-H. Tsai, Y.-C. Chieh, F.-H. Lu*, Influence of Sr+2 concentrations on growth of SrTiO3 thin films synthesized by hydrothermal–galvanic couple method, Thin Solid Films 570 (2014) 479-485.
H.-F. Ting, C.-M. Chen, F.-H. Lu, S.-Y. Suen*, Adsorption and photodegradation of methylene blue using a bulk Ti material with porous titania layer prepared by chemical oxidation, J. Taiwan Inst. Chem. Eng. 45(2) (2014) 617-624.
H.-M. Wu, K.-J. Lin, Y.-H. Yu, C.-Y. Ho, M.-H. Wei, F.-H. Lu, W.-J. Tseng, Effect of pH on film structure and electrical property of PMMA–Au composite particles prepared by redox transmetalation, Appl. Surf. Sci. 289 (2014) 524–528.
C.-J. Yang, F.-H. Lu*, Shape and size control of Cu nanoparticles by tailoring the surface morphologies of TiN-coated electrodes for biosensing applications, Langmuir 29 (2013) 16025-16033.
C.-J. Yang, L.-S. Chao, F.-H. Lu*, Synthesis and electrochemical behaviors of nano-network NaHTi3O7 thin films on Ti/Si prepared by a hydrothermal-galvanic couple method, Surf. Coat. Technol. 231 (2013) 521-525.
J.-L. Tseng, H.-P. Teng, F.-H. Lu*, Electrochemical deposition of barium titanate thin films on TiN/Si substrates, Surf. Coat. Technol. 231 (2013) 297-300.
C.-J. Yang, D.-Y. Tsai, P.-H. Chan, C.-T. Wu, F.-H. Lu*, Hydrothermal- galvanic couple synthesis of directionally oriented BaTiO3 thin films on TiN-coated substrate, Thin Sold Films 542 (2013) 108-113.
K.-J. Lin, H.-M. Wu, Y.-H. Yu, C.-Y. Ho, F.-H. Lu, W. J. Tseng, Preparation of PMMA-Ni core-shell composite particles by electroless plating on polyelectrolyte- modified PMMA beads, Appl. Surf. Sci. 282 (2013) 741-745.
Li-Ren Yao, F.-H. Lu*, Low vacuum deposition of aluminum nitride thin films by sputtering, Int. J. Appl. Ceram. Technol. 10(1) (2013) 51-59.
C.-Y. Hong, H.-P. Teng, F.-H. Lu*, Effects of KMnO4-added electrolytes on alumina coatings prepared by plasma electrolytic oxidation, J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 26(3) (2012) 141-146.
M.-H. Chan, F.-H. Lu*, Air-based deposition and processing windows of sputtered TiN, TiNxOy, and N-doped TiOx thin films, Surf. Coat. Technol. 210 (2012) 135-141.
J.-L. Zeng, H.-P. Teng, C.-J. Yang, F.-H. Lu*, Synthesis and corrosion resistance of barium titanate films on Ti underlayers by plasma electrolytic oxidation, J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 26(2) (2012) 99-106.
F.-H. Lu*, Deposition and characteristics of conductive nitride thin films prepared by physical deposition technique using air as a reactive gas, Eng. Sci. Technol. Bull., NSC (工程科技通訊, in Chinese), hard copy: 127 (2012) 23-26.
M.-H. Chan, F.-H. Lu*, Air-based deposition of conductive nitride thin films by sputtering, J. Electrochem. Soc., 158(6) (2011) P75-P80.
B.-J. Wei, Y.-L. Cheng, F.-H. Lu, T.-J. Chiu, H.-C. Shih, Comparative study of low dielectric constant material deposited using different precursors, J. Vac. Sci. Technol. A. 29(4) (2011) 041507-1-7.
Y.-C. Chieh, F.-H. Lu*, Monte Carlo Simulation of Atom Diffusion via Vacancies in Nanofilms with a Model Simple Cubic Lattice System, J. Nanosci. Nanotechnol. 11(3) (2011) 2376-2383.
C.-H. Hsu, H.-P. Teng, F.-H. Lu*, Effects of addition of Al(NO3)3 to electrolytes on alumina coatings by plasma electrolytic oxidation, Surf. Coat. Technol. 205 (2011) 3677-3682.
F.-H. Lu*, Synthesis of nano-structured anodic oxide films on conductive nitride seeding layers, Eng. Sci. Technol. Bull., NSC (工程科技通訊, in Chinese), hard copy: 109, (2010) p. 63, pp. 159-161 (full text); E-paper: 112.
M.-H. Chan, P.-L. Wu, F.-H. Lu*, Prepartion of ZrNxOy fillms by magnetron sputtering using air as a reactive gas, Thin Solid Films, 518(24) (2010) 7300-7303.
P.-H. Chan, K.-H. Lee, F.-H. Lu*, Synthesis of perovskite oxide films on TiN/Si by a low temperature hydrothermal-electrochemical method, J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 24(2) (2010) 121-128.
P.-H. Chan, F.-H. Lu*, Low-temperature hydrothermal synthesis and the growth kinetics of BaTiO3 films on TiN/Si, Ti/Si, and bulk-Ti substrates, J. Electrochem. Soc. 57(6) (2010) G130-G135.
M.-H. Chan, F.-H. Lu*, Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures, Thin Solid Films,518(5) (2009) 1369-1372.
F.-H. Lu*, B.-F. Jiang, J.-L. Lo, M.-H. Chan, Influences of oxygen impurity contained in nitrogen on the reaction of titanium with nitrogen, J. Mater. Res. 24(7) (2009) 2400-2408.
C.-D. Lu, L.-S. Chang, Y.-F. Lu, F.-H. Lu, The growth of interfacial compounds between titanium dioxide and bismuth oxide, Ceram. Int. 35(7) (2009) 2699-2704.
M.-H. Chan, F.-H. Lu*, X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures, Thin Solid Film, 517(17) (2009) 5006-5009.
P.-H. Chan, F.-H. Lu*, Low-temperature hydrothermal–galvanic couple synthesis of BaTiO3 thin films on Ti-coated silicon substrate, Thin Solid Films 517(17) (2009) 4782-4785.
Y.-C. Chieh, C.-C. Chang, Y.-L. Lai, F.-H. Lu*, Kinetic studies on electrochemical stripping of CrN films, Surf. Coat. Technol. 203 (2009) 1709-1714.
M.-H. Chan, F.-H. Lu*, Preparation of titanium oxynitride thin films by reactive sputtering using air/Ar mixtures, Surf. Coat. Technol. 203 (2008) 614-618.
H.-P. Teng, Y.-C. Chieh, F.-H. Lu*, Synthesis of BaZrO3 films on ZrN-coated Si by a novel low temperature hydrothermal-galvanic couple method, J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 22(2) (2008) 73-82.
B.J. Wei, Y.L. Cheng, Y.L. Wang, F.H. Lu, H.C. Shih, Dielectric properties of high-density-plasma fluorinated-silicate glass by doping nitrogen,J. Vac. Sci. Technol. A. 26(3) (2008) 481-484.
F.-H. Lu*, H.-D. Tsai, Y.-C. Chieh, Plasma oxidation of Al thin films on Si substrates, Thin Solid Films 516/8 (2008) 1876-1881.
Y.-C. Chieh, F.-H. Lu*, Monte Carlo simulation of atoms diffusion via vacancies in fcc-structured nanofilms, J. Phys. Chem. Solids, 69/2-3 (2008) 315-319.
C.-Y. Lin, F.-H. Lu*, Oxidation behavior of AlN films at high temperature under controlled atmosphere, J. Eur. Ceram. Soc. 28/3 (2008) 691-698.
H.-P. Teng, Y.-C. Chieh, F.-H. Lu*, Synthesis of BaZrO3 films on ZrN-coated Si by a novel low temperature hydrothermal-galvanic couple method, J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 22(2) (2008) 73-82.
P.-H. Chan, Y.-C. Chieh, F.-H. Lu*, Preparation of BaTiO3 on Ti/Si and bulk-Ti by a novel low temperature hydrothermal-galvanic couple method, J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 21(4) (2007) 291-298.
H.-P. Teng, Y.-C. Chieh, F.-H. Lu*, Preparation of BaZrO3 films by physical vapor deposition and a novel hydrothermal duplex technique, Thin Solid Films, 516(2-4) (2007) 364-368.
H.-Y. Chen, J.-H. Chen, F.-H. Lu*, Evaluation of Poisson’s ratio and Young’s modulus of nitride films by combining X-ray diffraction and laser curvature techniques, Thin Solid Films 516(2-4) (2007) 345-348.
M.-H. Chan, W.-Y. Ho, D.-Y. Wang, F.-H. Lu*, Characterization of Cr-doped TiO2 thin films prepared by cathodic arc plasma deposition, Surf. Coat. Technol. 202(4-7) (2007) 962-966.
C.-J. Wu, W.-C. Hsu, C.-T. Wang, K.-C. Lin, C.-H. Huang, F.-H. Lu*, Synthesis and applications of nanoporous anodic aluminum oxide, Bull. Chinese Ceram. Soc. (陶業季刊, in Chinese) 26(4) (2007) 32-36.
Y.-C. Chieh, P.-H. Chan, H.-P. Teng, C.-C. Yu, F.-H. Lu*, Prepation of functional oxide films by a novel hydrothermal-galvanic couple method, Bull. Chinese Ceram. Soc. (陶業季刊, in Chinese) 26(4) (2007) 8-15.
Y.-C. Chieh, C.-C. Yu, F.-H. Lu*, Epitaxial growth of BaTiO3 films on TiN/Si substrates by a hydrothermal-galvanic couple method, Appl. Phys. Lett. 90 (2007) 032904-032906.
H.-Y. Chen, F.-H. Lu,Oxidation behavior of chromium nitride films, Thin Solid Films 515(4) (2006) 2179-2184. (SCI)
Y.–C. Chieh, W.-Z. Lo, F.-H. Lu*, Microstructure evolution of ZrN films annealed in vacuum, Surf. Coat. Technol. 200(10) (2006) 3336-3340.
H.-H. Huang, S.-J. Pan, F.-H. Lu, Surface electrochemical impedance in situ monitoring of cell-cultured titanium with a nano-network surface layer, Scripta Mater. 53 (2005) 1037-1042.
Y.-S. Ho, F.-S. Huang, F.-H. Lu, Influences of oxygen impurity contained in nitrogen gas on the reactions of chromium with nitrogen, J. Mater. Res. 20(10) (2005) 2745-2753.
H.-Y. Chen, F.-H. Lu, Oxidation behavior of titanium nitride films, J. Vac. Sci. Technol. A. 23(4) (2005) 1006-1009.
C.-T. Wu, F.-H. Lu, Synthesis of barium titanate films by plasma electrolytic oxidation at room electrolyte temperature, Surf. Coat. Technol. 199/2-3 (2005) 225-230.
W.-Z. Lo, P.-S. Chan, F.-H. Lu*, Degradation of ZrN films Annealed in Forming gas,” J. Chinese Corrosion Engineering (防蝕工程, in Chinese) 18(4) (2004) 415-422.
F.-H. Lu*, W.-Z. Lo, Degradation of ZrN films at High Temperature under Controlled Atmosphere, J. Vac. Sci. Technol. A. 22(5) (2004) 2071-2076.
H.-H. Huang, S.-J. Pan, Y.-L. Lai, T.-H. Lee, C.-C. Chen, F.-H. Lu, Osteoblast-like Cell Initial Adhesion onto a Network-Structured Titanium Oxide Layer, Scripta Mater. 51 (2004) 1017-1021.
H.-Y. Chen, C.-J. Tsai, F.-H. Lu*, The Young’s Modulus of Chromium Nitride Films, Surf. Coat. Technol. 184 (2004) 69-73.
S. Han, H.-Y. Chen, K.-L. Chang, K.-W. Weng, D.-Y. Wang, F.-H. Lu, H.C. Shih, Effects of MEVVA-Implanted Chromium on the Structure and Properties of CrN Film, Thin Solid Films 447-448 (2004) 425-429.
S. Han, H.-Y. Chen, Z.-C. Chang, J.-H. Lin, C.-J. Yang, F.-H. Lu, F.-S. Shieu, H.C. Shih, Effect of Metal Vapor Vacuum Arc Cr-Implanted Interlayers on the Microstructure of CrN Film on Silicon, Thin Solid Films 436 (2003) 238-243.
H.-Y. Chen, F.-H. Lu*, Stress Relaxation-Induced Phase Transformation in Chromium Nitride Films, J. Mater. Lett. 22 (2003) 817-819.
H.-Y. Chen, F.-H. Lu*, Phase Transformation in Chromium Nitride Films,” J. Vac. Sci. Technol. A 21 (2003) 695-700.
F.-H. Lu*, H.-Y. Chen, C.-H. Hung, Degradation of CrN Films at High Temperature under Controlled Atmosphere, J. Vac. Sci. Technol. A. 21 (2003) 671-675.
C.-T. Wu, F.-H. Lu*, Corrosion Resistance of BaTiO3 Films Prepared by Plasma Electrolytic Oxidation, Surf. Coat. Technol. 166 (2003) 31-36.
H.-Y. Chen, F.-H. Lu*, Phase Transformation in CrN Films, J. Mater. Sci. Engr. (材料科學與工程, in Chinese) 34 (2002) 246-250.
F.-H. Lu*, J.-L. Lo, The Influences of Oxygen Impurity Contained in Nitrogen Gas on the Annealing of Titanium Nitride, J. Eur. Ceram. Soc. 22 (20020 1367-1374.
F.-H. Lu*, C.-T. Wu, C.-Y. Hung, Barium Titanate Films Synthesized by an Anodic Oxidation-Based Electrochemical Method," Surf. Coat. Technol. 153 (2002) 276-283.
C.-T. Wu, F.-H. Lu*. Electrochemical Deposition of Barium Titanate Films Using a Wide Electrolytic Voltage Range, Thin Solid Films 398-399 (2001) 621-625.
F.-H. Lu*, H.-Y. Chen, Phase Changes of CrN Films Annealed at High Temperature under Controlled Atmosphere, Thin Solid Films 398-399 (2001) 368-373.
S. Han, J.H. Lin, D.Y. Wang, F.-H. Lu. H.C. Shih, The Corrosion Resistance of the Chromium Nitride on Low Alloy Steels by Cathodic Arc Deposition, J. Vac. Sci. Technol. A 19 (2001) 1442-1446.
F.-H. Lu*, C.-T. Wu, C.-Y. Hong, Electrochemical Deposition of Barium Titanate Films by Anodic Oxidation, Journal of Engineering, NCHU, 12 (2001) 119-125.
F.-H. Lu*, F.-X. Fang, Y.-S. Chen, Eutectic Reaction between Copper Oxide and Titanium Dioxide, J. Eur. Ceram. Soc. 21 (2001) 1093-1099.
Z.C. Chang, F.-H. Lu, F.S. Shieu, Characterization of the Microstructure and Phase Formation in the Au-In System Using Transmission Electron Microscopy, Mater. Chem. Phys. 70 (2001) 137-143.
S. Han, J.H. Lin, X.J. Guo, S.H. Tsai.Y.O. Su, J.H. Huang, F.-H. Lu, H.C. Shih The Effect of Cr Interlayer on the Microstructure of CrN Coatings on Steel, Thin Solid Films 377-378 (2000) 578-584.
S. Han, J.H. Lin, S.H. Tsai, S.C. Chung, D.Y. Wang, F.-H. Lu, H.C. Shih,nCorrosion and Tribological Studies of Chromium Nitride Coated on Steel Through an Interlayer of Chromium, Surf. Coat. Technol. 133-134 (2000) 460-465.
F.-H. Lu*, S.-P. Feng, H.-Y. Chen, J.-K. Li, The Degradation of TiN Films on Cu Substrates at High Temperature under Controlled Atmosphere, Thin Solid Films 375 (2000) 123-127.
F.-H. Lu*, H.-Y. Chen, Characterization of Titanium Nitride Films Deposited by Cathodic Arc Plasma Technique on Copper Substrates, Surf. Coat. Technol. 130 (2000) 290-296.
F.-H. Lu*, H.-Y. Chen, XPS Analyses of TiN Films on Cu Substrates after Annealing in the Controlled Atmosphere, Thin Solid Films, 355-356 (1999) 374-379.
F.-H. Lu*, Monte Carlo Simulation on the Cation Diffusion via Vacancies in Simple Spinels, Comput. Mater. Sci. 14 (1999) 48-55.
F.-H. Lu*, Monte Carlo Simulation on the Cation Diffusion in Simple Spinels, Journal of Engineering, NCHU, 9(1) (1998) 1-8.
F.-H. Lu*, Loss Minimization through Recombination Center Identification in Solar Cells, Phys. Stat. Sol. (b) 194 (1996) 91-100.
F.-H. Lu, R. Dieckmann, Point Defects in Oxide Spinel Solid Solutions of the Type (Co,Fe,Mn)3-δ04 at 1200oC, J. Phys. Chem. Solids 56(5) (1995) 725-733.
F.-H. Lu, M.L. Newhouse, R. Dieckmann, Oxygen Activity Dependent Dissolution of Nickle from Nickel Oxide into Platinum, J. Phys. Chem. Solids 56(5) (1995) 715-724.
F.-H. Lu, M.L. Newhouse, R. Dieckmann, J. Xue, Platinum - A Non-Inert Material Reacting with Oxides, Solid State Ionics 75 (1995) 187-192.
F.-H. Lu, P. Franke, C.S. Nichols, R. Dieckmann, Monte Carlo Simulation of Cation Diffusion via Vacancies in Quasibinary Spinel Solid Solutions Involving Multiple Types of Cation-Vacancy Exchanges, J. Appl. Phys. 76(2) (1994) 848-857.
F.-H. Lu, P. Franke, C.S. Nichols, R. Dieckmann, Monte Carlo Simulation of Cation Transport via Vacancies in Spinel Solid Solutions: One Type of Cation Exchange Prevails, J. Appl. Phys. 75(2) (1994) 819-826.
F.-H. Lu, R. Dieckmann, Point Defects and Cation Tracer Diffusion in (CoxMn1-x)3-δ04 Spinels, Solid State lonics 67 (1993) 145-155.
F.-H. Lu, S. Tinkler, R. Dieckmann, Point Defects and Cation Tracer Diffusion in (CoxFe1-x)3-δ04 Spinels, Solid State Ionics 62 (1993) 39-52.
F.-H. Lu, R. Dieckmann, Point Defects and Cation Tracer Diffusion in (Co,Fe,Mn)3-δ04 Spinels: II. Mixed Spinels (CoxFezMn2z)3-δ04," Solid State Ionics, 59, 71-82.
F.-H. Lu, R. Dieckmann, Point Defects and Cation Tracer Diffusion in (Co,Fe,Mn)3-δ04 Spinels: I. Mixed Spinels (CoxFe2yMny)3-δ04, Solid State Ionics, 53-56 (1992) 90-302.
F.-H. Lu, R. Dieckmann, Non-stoichiometry and Cation Tracer Diffusion in Cobalt-Iron-Manganese Oxide Spinels, Ceramic Transactions 24 (1991) 185-192.