Nanoscribe PPGT2
About ERAU's Nanoscribe Printer
Embry-Riddle's Nanoscribe Photonic Professional GT2 system is equipped with 4 different objective lenses (10x, 20x, 25x, 63x). The highest resolution and smallest feature size that our PPGT2 system can achieve using the 63x objective is ~200nm. We are able to print an area of ~4cm × 4cm with a max height ~8mm. Current research with the PPGT2 system is on micro-electromechanical array actuators, micro-electromechanical sensors, micro-fluidic chips, metamaterials, and micro-optic components.
Please contact us at daewon.kim at erau.edu if you would like more information.
How can the PPGT2 system get to sub-micron resolution?
The Nanoscribe PPGT2 system uses what is known as 2-Photon Polymerization to achieve sub-micron resolution and feature sizes. The system uses a 780nm femtosecond laser, which when passed through the objective lenses, focuses the beam to a point. At this point, the frequency doubles and the wavelength halves, causing the point to be in the UV spectrum, where our photoresists polymerize.
Can the PPGT2 system print with custom resins?
Yes! However, custom resins will need to be kept off of our Objective lenses, meaning no DiLL (Dip-in Laser Lithography). We would print through our borosilicate glass substrates using oil immersion or through air. With oil immersion, there would be a limit on the overall height of the printed part as well as smallest feature sizes and quality as you would be printing through oil, glass, and already polymerized resin. With air, you are limited to 2.5D Lithography.
Is the PPGT2 system in a cleanroom environment?
No. Our PPGT2 system is not in a cleanroom environment.
Will someone print for me or will I have to do it all myself?
Due to the complexity of the printing process and fragility of the Objectives, glassware, hardware, and printed samples, trained personnel will work personally with you to print your samples/ structures to your desired specifications.
Can the PPGT2 system print larger than the objective's print field?
Yes, with limitations. The PPGT2 system can print larger than the objective print field, however, doing so would mean that the printed part would have to be split up into smaller blocks and "stitched" together. The edges where two blocks meet can have a ridge/ indent and won't be perfectly smooth. This might be fine for most prints, but some might need this to be avoided, like for micro-optics. Ridges in a micro-optic design could be detrimental to a working micro-optic print.
Objective Print Fields
63x Objective
25x Objective
20x Objective
10x Objective
63x Objective
Working Distance: 360µm*
Printing Ø 200µm
Block Max: 141µm × 141µm
Voxel Ø: ~0.2µm
Aspect Ratio: 3.5
25x Objective
Working Distance: 380µm***
Printing Ø 400µm
Block Max: 282µm × 282µm
Voxel Ø: ~0.6µm
Aspect Ratio: 6
20x Objective
Working Distance: 2100µm
Printing Ø 600µm
Block Max: 424µm × 424µm
Voxel Ø: ~1µm
Apsect Ratio: N/A
10x Objective
Working Distance: 700µm
Printing Ø 1000µm
Block Max: 707µm × 707µm
Voxel Ø: ~1.2µm
Aspect Ratio: 10
Photoresists In Stock
IP-Dip (3D SF, 63x, FuSi, Si)
IP-Dip2 (3D SF, 63x, FuSi, Si)
IP-L 780 (3D SF Oil, 63x, BoSi)
IP-S (3D MF, 25x, ITO, Si)
IP-Visio (3D MF, 25x, ITO)
IP-n162 (3D MF, 25x, FuSi)
IP-PDMS (3D MF, 25x)
IP-Q (3D LF, 10x, Si)
AZ 1512 (2D ML, 20x, FuSi, Si)
Substrates In Stock
1" ITO-Coated Glass squares
1" Fused Silica Glass squares
1" Borosilicate Glass wafers
1" Silicon squares
2" Silicon wafers
4" Silicon wafers
SF: Small FeaturesMF: Medium FeaturesLF: Large FeaturesML: Maskless Lithography
Relevant Chemicals
Isopropanol, ≥99.9%
Acetone, ≥99.5%
PGMEA, ≥99.5%
3-(Trimethoxysilyl)propyl methacrylate, 98%
Carl Zeiss™ Immersol™ 518 F
Deionized Water