Research Expertise

Semiconductor Device Fabrication and Electrical Characterization:

• Deposition of Metal Thin films using DC and RF magnetic sputtering.

• Solution Processed Thin films deposition using dip coating and spin coating technique.

• Fabrication of Metal-Insulator-metal (MIM) on plan substrate and on patterned substrate for crossbar array.

• Deposition of oxide thin films in the range of few nanometers using RF Sputtering.

• Thin film deposition techniques using Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD) and

Atomic Layer Deposition (ALD).

•Rapid thermal annealing

• UV photolithography using the positive and negative Photoresists.

• Structure Analysis of Device Using TEM, SEM, EDX, AFM & alpha step.

• Electrical Characterization of metal/insulator/metal device using HP semiconductor analyzer 4156B.

• Electrical Characterization of Neuromorphic devices using Keithley 4200 analyzer, for the transient and quasi-static I-V measurement

•Engineering of digital switching based RRAM for neuromorphic application

• Expert of TEM Lamella preparation using FIB