Facilities

In-situ real-time characterization facility for thin films and multilayers

Visit the CSR web portal to USE this facility: https://www.csruserportal.com/Intro/csrIndoreFacilities#gallery-14

For discussion, E-mail to < dkumar@csr.res.in >

important points

·  Base pressure in the system ~2x10-10 mbar

·  Magnetic field for MOKE measurements; up to ~2500 Oe

·  Sample temperature ranging from ~50K to 1200K, which can be precisely controlled during all in-situ measurements

·  Ion gun at an oblique angle for sample cleaning

·  Residual gas analyzer (RGA) to monitor residual gasses present before and during the deposition

·  Mass flow controller to create partial pressure of the gases such as O2 N2 Ar etc.

Visit the CSR web portal to USE this facility: https://www.csruserportal.com/

For discussion, E-mail to < dkumar@csr.res.in > <dileep.esrf@gmail.com>

important points

·  Base pressure of the chamber ~ 5x10-8 mbar

·  3 kW electron gun with three crucibles 

·  At a time, only one material can be evaporated 

·  Wedge sample can be made by moving a mask during deposition

·  Oblique angle deposition or glancing angle deposition  is possible along with normal deposition

.  Material Cu, Fe, Co, Ni, Ag, and Pd are available; other materials required to be arranged