◆ Graphene and 2D material-based next-generation optoelectronic devices

• Graphene and TMDs (e.g. MoS₂, WSe₂, ReS₂)-based high-performance photodetectors

• Pseudo-Landau-quantized graphene-based optoelectronics

◆ Polymer-based ReRAM for neuromorphic devices

• Bio-inspired synaptic and neural devices fabricated based on salmon sperm DNA electrolyte

• MNIST simulation for synaptic device network

◆ Process technology for 2D material-based applications

• Sub-µm scale dry/wet transfer technique for 2D heterostructure

• Polymer-based doping technique for high-performance 2D applications

• Nanoscale structured substrate-based 2D strain platform for >100 T pseudo-magnetic fields

◆ Process technologies

• E-beam lithography, photo-lithography, maskless lithography

• E-beam evaporation, thermal evaporation, RF/DC magnetron sputtering

• Reactive ion etching, inductively coupled plasma etching

• Rapid thermal annealing, wire bonding

• Probe station, optical setup with Laser beam path on an optical table

◆ Characterization tools

• Photoluminescence, FT-IR, femtosecond pump-probe measurement (4-300 K)

• Photocurrent measurement with optical parametric amplifier (4-300 K)

• I-V and C-V measurement with probe station

• I-V measurement with pulse generator for neuromorphic device

• SEM, AFM, surface profiler

◆ Other expertise

• Matlab, AutoCAD Mask design, KLayout, LEdit

• 3DS MAX, Photoshop, Adobe Illustrator for paper schematics or journal cover images