Pulsed Laser Deposition Chamber #1 with High Pressure RHEED

Base pressure: <1.0×10-7 Torr 

Mass Flow Controllers (MFC) : Ar, O2  gas line

Deposition temperature : up to 850 °C 

Multiple Target Carousel Unit (up to 4 targets)

Pulsed Laser Deposition Chamber #2

Base pressure: <1.0×10-7 Torr 

Mass Flow Controllers (MFC) : Ar, O2  gas line

Deposition temperature : up to 850 °C 

Multiple Target Carousel Unit (up to 4 targets)

Model : Excimer Laser (COMpex 205F)

Wavelength : 248 nm

Pulse Energy : 750 mJ

max. Repetition Rate : 50 Hz

Pulse Duration (FWHM) : 20 ns

Model : Hall Effect Measurement System (HMS-5000)

Magnetic Field : 0.55 Tesla

Temperature : 80 K ~ 350 K

Measurable sample size : 5x5 mm ~ 20x20 mm, thickness is 2 mm or less

Model : Atomic Force Microscopy (Park Systems: NX-10)

Mode : Contact mode/Non-contact mode/Tapping mode

Model : Programmable High-Temp. Muffle furnaces (FSC-02)

Temperature Range : 500 ~ 1450 °C 

Capacity : 1.9 Lit