Publications

*equal contribution

#correspondence

Manuscript submitted/under revision

2024

36. Double-Side Doped 2D TMD FET Channel


K. Lee*, B. S. Y. Kim*, M. S. Choi, N. Ali, H. Shin, D. Yue, G.-H. Kim, J. Hone, W. J. Yoo

ACS Applied Electronic Materials, 6(5), 3894-3900 (2024)

35. Plasma and Gas based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications

C. Kim*, M. Kim*, S. Kim, M. Kang, M. S. Choi#, H.-U. Kim#

Advanced Electronic Materials, 10(6), 2300835 (2024)

34. Investigating the impact of oxygen surface plasma treatments on the structural and electrical properties of graphene

W. Lee, S. Kim, T. Lee, Y. Hwang, S. Lee, Y. Hassan, A. V. Hoang, E.-T. Kim, M. S. Choi#

Applied Science and Convergence Technology, 33, 7-12 (2024)

33. Analysis of p-type doping in graphene induced by monolayer oxidized TMDs

T. Huynh*, T. D. Ngo*, H. Choi, M. S. Choi, W. Lee, T. D. Nguyen, T. T. Tran, K. Lee, J. Y. Hwang, J. Kim, W. J. Yoo

ACS Applied Materials & Interfaces, 16, 3694 (2024)

2023

32. Self-Aligned Top-Gate Structure in High-Performance 2D p-FETs via van der Waals Integration and Contact Spacer Doping

T. D. Ngo, T. Huynh, T. Taniguchi, K. Watanabe, M. S. Choi#, W. J. Yoo#

Nano Letters, 23, 11345-11352 (2023) 

31. Machine Learning-based Prediction of Atomic Layer Control for MoS2 via Reactive Ion Etcher

C. Kim, S. Lee, M. Kim, M. S. Choi, T. Kim, H.-U. Kim

Applied Science and Convergence Technology, 32, 106-109 (2023) 

Featured as the cover article and the best paper 

30. Modulation of Contact Resistance of Dual-Gated MoS2 FETs Using Fermi-Level Pinning-Free Antimony Semi-Metal Contacts

T. D. Ngo, T. Huynh, H. Jung, F. Ali, J. Jeon, M. S. Choi#, W. J. Yoo#

Advanced Science, 10, 2301400 (2023)

29. Ambipolar charge-transfer graphene plasmonic cavities 

B. S. Y. Kim*, A. Sternbach*, M. S. Choi*, Z. Sun, F. L. Ruta, Y. Shao, A. McLeod, L. Xiong, Y. Dong, T. S. Chung, A. Rajendran, S. Liu, A. Nipane, S. H. Chae, A. Zangiabadi, X. Xu, A. J. Millis, P. J. Schuck, C. R. Dean, J. C. Hone, D. N. Basov

Nature Materials, 22, 838-843 (2023) [arxiv link]

28. Boosting hole migration through oxygen species–functionalized graphene interlayer for PEDOT:PSS-based optoelectronic devices with enhanced efficiency and long-term durability

U. Baeck, N. D. Nguyen, M. S. Choi, J. Kim, J. Y. Lee, Y.-S. Kim, J. K. Kim

Applied Surface Science, 615, 156383 (2023)

27. Effects of oxygen plasma treatment on Fermi-level pinning and tunneling at the metal interface of WSe2 FETs

K. Lee, T. D. Ngo, S. Lee, H. Shin, M. S. Choi, J. Hone, W. J. Yoo

Advanced Electronic Materials, 9, 2200955 (2023)

2022

26. Self-Powered 2D MoS2/WOx/WSe2 Heterojunction Photodetector Realized by Oxygen Plasma Treatment

H. Shin, M. Taqi, F. Ali, S. Lee, M. S. Choi, C. Kim, B.-H. Lee, X. Liu, J. Sun, B. Oh, W. J. Yoo 

Advanced Materials Interfaces, 9, 2201785 (2022)

25. Selective electron beam patterning of oxygen doped WSe2 for seamless lateral junction transistors

T. D. Ngo*, M. S. Choi*, M. Lee, F. Ali, Y. Hassan, N. Ali, S. Liu, C. Lee, J. Hone, W. J. Yoo 

Advanced Science, 9, 2202465 (2022)

24. Recent progress in 1D contacts for 2D material-based devices

M. S. Choi*, N. Ali*, T. D. Ngo, H. Choi, B. Oh, H. Yang, W. J. Yoo 

Advanced Materials, 34, 2202408 (2022)

23. Fermi-level pinning dependent 2D semiconductor devices: challenges and prospects

X. Liu*, M. S. Choi*, E. Hwang, W. J. Yoo, J. Sun 

Advanced Materials, 34, 218425 (2022)

22. Anomalously persistent p-type behavior of WSe2 field-effect transistors by oxidized edge-induced Fermi-level pinning

T. D. Ngo*, M. S. Choi*, M. Lee, F. Ali, W. J. Yoo 

 Journal of Materials Chemistry C, 10, 846-853 (2022)

2021

21. High carrier mobility in graphene doped using a monolayer of tungsten oxyselenide

M. S. Choi*, A. Nipane*, B. S. Y. Kim*, M. E. Ziffer, I. Datta, A. Borah, Y. Jung, B. Kim, D. Rhodes, A. Jindal, Z. A. Lamport, M. Lee, A. Zangiabadi, Maya N. Nair, T. Taniguchi, K. Watanabe, I. Kymissis, A. N. Pasupathy, M. Lipson, X. Zhu, W. J. Yoo, J. Hone, J. T. Teherani

Nature Electronics, 4, 731-739 (2021)  Featured as the cover article

20. Analytical measurements of contact resistivity in two-dimensional WSe2 field-effect transistors

I. Moon*, M. S. Choi*, S. Lee, A. Nipane, J. Hone, W. J. Yoo 

2D Materials, 8, 045019 (2021)

19. Chemical dopant-free doping by annealing and electron beam irradiation on 2D materials

M. S. Choi*, M. Lee*, T. D. Ngo, J. Hone, W. J. Yoo 

Advanced Electronic Materials, 7, 2100449 (2021)  Featured as the frontispiece

18. Low-resistance p-type ohmic contacts to ultra-thin WSe2 by using a monolayer dopant

A. Borah, A. Nipane, M. S. Choi, J. Hone, J. T. Teherani 

ACS Applied Electronic Materials, 3, 2941-2947 (2021)

17. Damage-free atomic layer etch of WSe2: A platform for fabricating clean 2D devices

A. Nipane*, M. S. Choi*, P. J. Sebastian, K. Yao, A. Borah, P. Deshmukh, Y. Jung, B. Kim, A. Rajendran, K. W.C. Kwock, A. Zangiabadi, P. J. Schuck, V. M. Menon, W. J. Yoo, J. Hone, J. T. Teherani

ACS Applied Materials and Interfaces, 13, 1930-1942 (2021)

16. Electrical characterization of 2D materials-based field-effect transistors 

S. B. Mitta*, M. S. Choi*, A. Nipane*, F. Ali, C. Kim, J. T. Teherani, J. Hone, W. J. Yoo

2D Materials, 8, 012002 (2021)

~2019

15. Transferred via contacts as a platform for ideal two-dimensional transistors

Y. Jung*, M. S. Choi*, A. Nipane, A. Borah, B. Kim, A. Zangiabadi, T. Taniguchi, K. Watanabe, W. J. Yoo, J. Hone, J. T. Teherani

Nature Electronics, 2(5), 187-194 (2019)  Featured as the cover article

14. Homogeneous molybdenum disulfide tunnel diode formed via chemical doping

X. Liu*, D. Qu*, M. S. Choi, C. Lee, H. Kim, W. J. Yoo

Applied Physics Letters, 112(18), 183103 (2018)

13. Electrically Driven Reversible Phase Changes in Layered In2Se3 Crystalline Film

M. S. Choi*, B. Cheong*, C. H. Ra*, S. Lee, J. Bae, S. Lee, G. Lee, C. Yang, J. Hone, W. J. Yoo

Advanced Materials, 29(42) 1703568 (2017)

12. Fermi level pinning at electrical metal contacts of monolayer molybdenum dichalcogenides

C. Kim*, I. Moon*, D. Lee, M. S. Choi, F. Ahmed, S. Nam, Y. Cho, H. Shin, S. Park, W. J. Yoo

ACS Nano, 11(2), 1588-1596 (2017)

11. High Electric Field Carrier Transport and Power Dissipation in Multilayer Black Phosphorus Field Effect Transistor with Dielectric Engineering

F. Ahmed, Y. D. Kim, M. S. Choi, X. Liu, D. Qu, Z. Yang, J. Hu, I. P. Herman, J. Hone, W. J. Yoo

Advanced Functional Materials, 27(4), 1604025 (2017)

10. Effects of plasma treatment on surface properties of ultrathin layered MoS2

S. Kim*, M. S. Choi*, D. Qu, C. H. Ra, X. Liu, M. Kim, Y. J. Song, W. J. Yoo

2D materials, 3(3), 035002 (2016)

9. Effects of Plasma Treatment on Contact Resistance and Sheet Resistance of Graphene FET

C. H. Ra, M. S. Choi, D. Lee, W. J. Yoo

Journal of Korean Institute of Surface Engineering, 49(2), 152-158 (2016)

8. Passivated ambipolar black phosphorus transistors

D. Yue, D. Lee, Y. D. Jang, M. S. Choi, H. J. Nam, D. Jung, W. J. Yoo

Nanoscale, 8(25), 12773-12779 (2016)

7. Carrier transport at the metal-MoS2 interface

F. Ahmed, M. S. Choi, X. Liu, W. J. Yoo

Nanoscale, 7(20), 9222-9228 (2015)

6. Lateral MoS2 p-n Junction Formed by Chemical Doping for Use in High-Performance Optoelectronics

M. S. Choi, D. Qu, D. Lee, X. Liu, K. Watanabe, T. Taniguchi, W. J. Yoo

ACS Nano, 8(9), 9332-9340 (2014)

5. Metal-semiconductor barrier modulation for high photoresponse in transition metal dichalcogenide field effect transistors

H. Li, D. Lee, M. S. Choi, D. Qu, X. Liu, C. H. Ra, W. J. Yoo

Scientific Reports, 4, 4041 (2014)

4. High performance vertical tunneling diodes using graphene/hexagonal boron nitride/graphene hetero-structure

S. H. Lee*, M. S. Choi*, J. Lee, C. H. Ra, X. Liu, E. Hwang, J. H. Choi, J. Zhong, W. Chen, W. J. Yoo

Applied Physics Letters, 104(5), 053103 (2014)

3. Flexible and transparent MoS2 field-effect transistors on hexagonal boron nitride-graphene heterostructures

G. Lee*, Y. Yu*, X. Cui, N. Petrone, C. Lee, M. S. Choi, D. Lee, C. Lee, W. J. Yoo, K. Watanabe, T. Taniguchi, C. Nuckolls, P. Kim, J. Hone

ACS Nano, 7(8), 7931-7936 (2013)  Featured as the cover article

2. Controlled charge trapping by molybdenum disulphide and graphene in ultrathin heterostructured memory devices

M. S. Choi*, G. Lee*, Y. Yu*, D. Lee, S. H. Lee, P. Kim, J. Hone, W. J. Yoo

Nature communications, 4, 1624 (2013)

1. Plasma treatments to improve metal contacts in graphene field effect transistor

M. S. Choi, S. H. Lee, W. J. Yoo

Journal of Applied Physics, 110(7), 073305 (2011)

patents