Block copolymer self-assembly
Directed self-assembly via
warm solvent annealing
Directed self-assembly via
warm solvent annealing
Next generation lithography with
Sub-10 nm resolution
Next generation lithography with
Sub-10 nm resolution
Further reading
“Eliminating the Trade-Off between the Throughput and Pattern Quality of Sub-15 nm Directed Self-Assembly via Warm Solvent Annealing”
Advanced Functional Materials, 2015, 25, 2, 306-315 Jong Min Kim et al.
“Block Copolymer with an Extremely High Block-to-Block Interaction for a Significant Reduction of Line-Edge Fluctuations in Self-Assembled Patterns”
Chemistry of Materials, 2016, 28, 5680-5688 Jong Min Kim et al.