Plasma Etcher Equipment
We study plasma sources and process monitoring devices for the fabrication of future semiconductor chips.
AI and deep learning algorithms for the prediction of plasma process are also focused on.
# Monitoring of plasma characteristics using OES and VI sensor
# Simulation of plasma/electromagnetic characteristics of semiconductor manufacturing equipment
(using COMSOL, HFSS)
Electron Density
Electric Potential
Atmospheric/Liquid Plasma System
We develop devices that can generate plasma in atmospheric or liquid environments for material treatment and synthesis.
We apply monitoring and control systems to these plasma devices to sustain plasma quality.
Industrial Equipment
We support the development of key technologies for industrial equipment such as metal 3D printers and nano powder synthesis equipment, including monitoring, process optimization, and analysis.