Lab Infrastructure

Micro-fab

We fabricate electronic and optoelectronic devices based on two-dimensional materials using a combination of conventional microfabrication and custom-developed rapid-prototyping strategies. Our facilities support patterning, metallization, and device integration on both rigid and flexible substrates, enabling the transition from exploratory concepts to functional devices with minimal turnaround time.

Alongside standard lithographic techniques, we implement alternative mask generation approaches based on infrared fiber-laser micromachining and precision vinyl cutting. These tools allow the rapid fabrication of shadow masks and stencils for resist-free patterning, facilitating low-cost device prototyping and iterative design cycles.

Our micro-fabrication workflow is complemented by thin-film deposition systems, maskless photolithography, and digital manufacturing platforms, including high-resolution 3D printing. This integrated toolset supports flexible, scalable, and highly adaptable fabrication routes tailored to emerging two-dimensional material technologies.

Characterization

We perform optical characterization of two-dimensional materials using custom-configured micro-reflectance platforms that enable quantitative spectroscopy with high spatial resolution.

Our instrumentation includes multiple microscope-based micro-reflectance systems built on Nikon and Motic platforms, allowing both transmission and reflection measurements under controlled experimental conditions. These setups are used to probe thickness, optical contrast, excitonic features and spatial inhomogeneity in layered materials and heterostructures.

Several systems are specifically designed for in-situ and operando experiments, enabling optical measurements under applied strain and simultaneous electrical bias. These configurations allow us to directly monitor the evolution of optical properties while mechanically tuning or electrically driving devices, providing insight into coupled electromechanical and optoelectronic phenomena in two-dimensional materials.

Assembly

We assemble van der Waals heterostructures and integrated devices using precision deterministic transfer techniques that enable the controlled positioning of individual two-dimensional material flakes with micrometric accuracy. Our laboratory operates two home-built deterministic transfer platforms designed for high flexibility and reproducibility in manual and semi-automated assembly workflows.

To extend these capabilities to air-sensitive materials and interfaces, we also perform deterministic transfer inside an inert-atmosphere anaerobic gloveless chamber. This environment enables contamination-free handling and stacking of oxygen- or moisture-sensitive materials, as well as the fabrication of high-quality heterostructures under controlled conditions.

Optoelectronics

We perform electrical and optoelectronic characterization of devices based on two-dimensional materials across a wide range of environmental and temperature conditions. Our facilities include home-built probe stations for room-temperature measurements in air, a high-vacuum probe station, and a closed-cycle Lakeshore cryogenic probe station operating down to 8 K. Spatially resolved measurements are enabled by a scanning photocurrent mapping system, allowing micrometer-scale visualization of local photoresponse under controlled illumination.

Optical excitation is provided through a flexible set of multimode fiber-coupled light sources, including high-power LEDs, diode lasers, broadband xenon lamps with monochromators, and a supercontinuum laser with tunable wavelength selection. This combination enables comprehensive studies of spectral response and light–matter interaction in nanoscale devices.