Functional Ceramics
Thin film process
Nanomaterials
Energy Materials
Catalyst
2. Equipment
RF Magnetron Sputtering
Ambient controllable furnace
Spin coater
Clean Bench
Source meter Agilent U2722A
Data logger
Gas chromatography (TCD)
Temperature programmable reduction
High Voltage Generator (30 kV)
Rotational collector
Furnace
Ball miller
Press
Balance
3D printer PRUSA i3
3. Facility
TEM JEOL-2100F
FESEM HITACHI S-4800
XRF BRUKER S3
XRD BRUKER D2
XRD Panalytical Empyrian III
AA HITACH
FT-IR THERMO
UV SHIMAZU U2600
AC impedance
AFM Bruker Inova