Patents

[2025]

• G S Yun, J Lee, H G Kang, K-S Kim, D Na, S Shim and S Y Jeong, "PLASMA APPARATUS" US Patent 19/019823, filed January 14, 2025

[2024]

• G S Yun, J Yoo, H Jin and T Kim, “Plasma apparatus plasma system and method for generating plasma”, Korea Patent 10-2024-0073673, filed June 5, 2024 

• G S Yun, S Lee, J Choi, D N Shin, and J Yoo, “Nitrogen oxide treatment apparatus”, Korea Patent 10-2024-0071085, filed May 30, 2024 

• G S Yun, J Lee, H G Kang, K-S Kim, D Na, S Shim and S Y Jeong, "PLASMA APPARATUS" Korea Patent 10-2024-0073673, filed July 30, 2024

[2022]

• G S Yun, J K Lee, J Lee, S T Lee, W Nam and W S Kim, “Method for expanding sheath and bulk of plasma by using double radio frequency”, US Patent 16/770,043, registered May 10, 2022

• G S Yun, J Lee, J Yoo, H Jin, D Lee and T Kim, “Apparatus and method for activating chemical reaction using expanded plasma by dual high-frequency”, PCT/KR2022/015459, filed October 13, 2022 

[2021]

• G S Yun and J Lee, “In-situ tunable resonator with high quality factor”, Korean Patent 10-2021-0151956, filed November 8, 2021

• G S Yun, W J Nam, J Lee, S Y Jeong and J K Lee, “Apparatus and method for arc discharge using the microwave plasma”, Korean Patent 10-2216854, registered February 10, 2021

• G S Yun, J Yoo, J Lee and S Y Jeong, “Method of plasma redox reaction assisted by laser heating”, PCT/KR2020/011748, filed September 2, 2021

• G S Yun, J Yoo, J Lee and S Y Jeong, “Method of plasma redox reaction assisted by laser heating”, Korean Patent 10-2251801, registered May 7, 2021

• G S Yun, M U Lee, W Nam. J K Lee, S Y Jeong, "Radical species of plasma generation method using pulsed power", Korean Patent 10-2258361, registered May 25, 2021

• G S Yun, J Lee, J Yoo, H Jin, D Lee and T Kim, “Apparatus and method for activating chemical reaction using expanded plasma by dual high-frequency”, Korea Patent 10-2021-0181529, filed December 17, 2021

[2020]

• G S Yun,W J Nam, J Lee, S Y Jeong and J K Lee, “Apparatusandmethod for arc discharge using the microwave plasma”, PCT/KR2020/012486, filed September 16, 2020

• G S Yun, J K Lee, J Lee, S T Lee, W Nam and W S Kim, “Methodfor expanding sheath and bulk of plasma by using double radio frequency”, US Patent 16/770,043, filed June 4, 2020

[2019]

[2018]

• G S Yun, J K Lee, J Lee, S T Lee, W Nam and W S Kim, “Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias”, PCT/KR2018/009898, filed August 28, 2018

[2017]

• G S Yun, J K Lee, J Lee, S T Lee and W Nam, “Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias”, Korean Patent 10-2017-0165416, filed December 4, 2017